JP2004531068A5 - - Google Patents
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- JP2004531068A5 JP2004531068A5 JP2003502929A JP2003502929A JP2004531068A5 JP 2004531068 A5 JP2004531068 A5 JP 2004531068A5 JP 2003502929 A JP2003502929 A JP 2003502929A JP 2003502929 A JP2003502929 A JP 2003502929A JP 2004531068 A5 JP2004531068 A5 JP 2004531068A5
- Authority
- JP
- Japan
- Prior art keywords
- laser
- pulse
- laser system
- high voltage
- narrowband
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004020 conductor Substances 0.000 claims 12
- 230000003287 optical effect Effects 0.000 claims 5
- 238000004804 winding Methods 0.000 claims 4
- 230000010287 polarization Effects 0.000 claims 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 2
- 230000003321 amplification Effects 0.000 claims 2
- 229910052731 fluorine Inorganic materials 0.000 claims 2
- 239000011737 fluorine Substances 0.000 claims 2
- 238000003199 nucleic acid amplification method Methods 0.000 claims 2
- 230000005855 radiation Effects 0.000 claims 2
- 238000011144 upstream manufacturing Methods 0.000 claims 2
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 claims 1
- 230000006835 compression Effects 0.000 claims 1
- 238000007906 compression Methods 0.000 claims 1
- 230000000779 depleting effect Effects 0.000 claims 1
- 238000002347 injection Methods 0.000 claims 1
- 239000007924 injection Substances 0.000 claims 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/829,475 US6765945B2 (en) | 1999-09-27 | 2001-04-09 | Injection seeded F2 laser with pre-injection filter |
| US09/848,043 US6549551B2 (en) | 1999-09-27 | 2001-05-03 | Injection seeded laser with precise timing control |
| US09/855,310 US6556600B2 (en) | 1999-09-27 | 2001-05-14 | Injection seeded F2 laser with centerline wavelength control |
| US09/879,311 US6590922B2 (en) | 1999-09-27 | 2001-06-12 | Injection seeded F2 laser with line selection and discrimination |
| PCT/US2002/021867 WO2002099938A1 (en) | 2001-04-09 | 2002-04-03 | Injection seeded f2 laser with line selection and discrimination |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004531068A JP2004531068A (ja) | 2004-10-07 |
| JP2004531068A5 true JP2004531068A5 (https=) | 2005-12-22 |
| JP4071709B2 JP4071709B2 (ja) | 2008-04-02 |
Family
ID=27505876
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003502929A Expired - Fee Related JP4071709B2 (ja) | 2001-04-09 | 2002-04-03 | ライン選択及び弁別を用いる注入シード方式f2レーザ |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6590922B2 (https=) |
| EP (1) | EP1378037A4 (https=) |
| JP (1) | JP4071709B2 (https=) |
| WO (1) | WO2002099938A1 (https=) |
Families Citing this family (52)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6819698B1 (en) * | 1999-02-26 | 2004-11-16 | Lambda Physik Ag | Energy monitor for F2 molecular fluorine laser and method of energy stabilization |
| US6625191B2 (en) * | 1999-12-10 | 2003-09-23 | Cymer, Inc. | Very narrow band, two chamber, high rep rate gas discharge laser system |
| US6765945B2 (en) * | 1999-09-27 | 2004-07-20 | Cymer, Inc. | Injection seeded F2 laser with pre-injection filter |
| US6834069B1 (en) | 1999-12-15 | 2004-12-21 | Lambda Physik Ag | Molecular fluorine laser with intracavity polarization enhancer |
| US6763048B2 (en) | 2000-06-19 | 2004-07-13 | Lambda Physik Ag | Line narrowing of molecular fluorine laser emission |
| US6738406B2 (en) * | 2000-06-19 | 2004-05-18 | Lambda Physik Ag | Precision measurement of wavelengths emitted by a molecular fluorine laser at 157nm |
| JP4877692B2 (ja) * | 2001-03-21 | 2012-02-15 | 株式会社小松製作所 | 注入同期式又はmopa方式のレーザ装置 |
| US7372056B2 (en) | 2005-06-29 | 2008-05-13 | Cymer, Inc. | LPP EUV plasma source material target delivery system |
| US20050259709A1 (en) | 2002-05-07 | 2005-11-24 | Cymer, Inc. | Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate |
| US7439530B2 (en) | 2005-06-29 | 2008-10-21 | Cymer, Inc. | LPP EUV light source drive laser system |
| US7598509B2 (en) * | 2004-11-01 | 2009-10-06 | Cymer, Inc. | Laser produced plasma EUV light source |
| US7465946B2 (en) * | 2004-03-10 | 2008-12-16 | Cymer, Inc. | Alternative fuels for EUV light source |
| US7378673B2 (en) | 2005-02-25 | 2008-05-27 | Cymer, Inc. | Source material dispenser for EUV light source |
| US7830934B2 (en) * | 2001-08-29 | 2010-11-09 | Cymer, Inc. | Multi-chamber gas discharge laser bandwidth control through discharge timing |
| JP3888673B2 (ja) * | 2001-12-28 | 2007-03-07 | ウシオ電機株式会社 | 露光用フッ素分子レーザシステム |
| US20030219094A1 (en) * | 2002-05-21 | 2003-11-27 | Basting Dirk L. | Excimer or molecular fluorine laser system with multiple discharge units |
| US20040202220A1 (en) * | 2002-11-05 | 2004-10-14 | Gongxue Hua | Master oscillator-power amplifier excimer laser system |
| US7308013B2 (en) | 2002-11-05 | 2007-12-11 | Lambda Physik Ag | Excimer or molecular fluorine laser system with precision timing |
| US7088450B2 (en) * | 2003-04-03 | 2006-08-08 | Coherent, Inc. | Method and apparatus for measuring amplified stimulated emission in the output of a master oscillator power amplifier system |
| US7217941B2 (en) | 2003-04-08 | 2007-05-15 | Cymer, Inc. | Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source |
| US7277188B2 (en) | 2003-04-29 | 2007-10-02 | Cymer, Inc. | Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate |
| US7366213B2 (en) * | 2003-05-19 | 2008-04-29 | Lambda Physik Ag | MOPA excimer or molecular fluorine laser system with improved synchronization |
| US7196342B2 (en) | 2004-03-10 | 2007-03-27 | Cymer, Inc. | Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source |
| US7355191B2 (en) | 2004-11-01 | 2008-04-08 | Cymer, Inc. | Systems and methods for cleaning a chamber window of an EUV light source |
| US7482609B2 (en) | 2005-02-28 | 2009-01-27 | Cymer, Inc. | LPP EUV light source drive laser system |
| US7365349B2 (en) | 2005-06-27 | 2008-04-29 | Cymer, Inc. | EUV light source collector lifetime improvements |
| US7180083B2 (en) | 2005-06-27 | 2007-02-20 | Cymer, Inc. | EUV light source collector erosion mitigation |
| US7141806B1 (en) | 2005-06-27 | 2006-11-28 | Cymer, Inc. | EUV light source collector erosion mitigation |
| US7394083B2 (en) | 2005-07-08 | 2008-07-01 | Cymer, Inc. | Systems and methods for EUV light source metrology |
| JP5202315B2 (ja) * | 2005-08-09 | 2013-06-05 | サイマー インコーポレイテッド | 放電タイミングによる多室ガス放電レーザの帯域幅制御 |
| US7317179B2 (en) | 2005-10-28 | 2008-01-08 | Cymer, Inc. | Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate |
| US7679029B2 (en) | 2005-10-28 | 2010-03-16 | Cymer, Inc. | Systems and methods to shape laser light as a line beam for interaction with a substrate having surface variations |
| US20090296758A1 (en) * | 2005-11-01 | 2009-12-03 | Cymer, Inc. | Laser system |
| KR101194231B1 (ko) * | 2005-11-01 | 2012-10-29 | 사이머 인코포레이티드 | 레이저 시스템 |
| US7643529B2 (en) | 2005-11-01 | 2010-01-05 | Cymer, Inc. | Laser system |
| US7630424B2 (en) * | 2005-11-01 | 2009-12-08 | Cymer, Inc. | Laser system |
| US7999915B2 (en) * | 2005-11-01 | 2011-08-16 | Cymer, Inc. | Laser system |
| US7920616B2 (en) * | 2005-11-01 | 2011-04-05 | Cymer, Inc. | Laser system |
| US7715459B2 (en) * | 2005-11-01 | 2010-05-11 | Cymer, Inc. | Laser system |
| US7778302B2 (en) * | 2005-11-01 | 2010-08-17 | Cymer, Inc. | Laser system |
| US7746913B2 (en) | 2005-11-01 | 2010-06-29 | Cymer, Inc. | Laser system |
| US7885309B2 (en) | 2005-11-01 | 2011-02-08 | Cymer, Inc. | Laser system |
| US20090296755A1 (en) * | 2005-11-01 | 2009-12-03 | Cymer, Inc. | Laser system |
| US7453077B2 (en) | 2005-11-05 | 2008-11-18 | Cymer, Inc. | EUV light source |
| US8427769B1 (en) * | 2011-12-14 | 2013-04-23 | Raytheon Company | Multi-stage Lyot filter and method |
| US20140056321A1 (en) * | 2012-08-22 | 2014-02-27 | Xiaoyuan Peng | Optical amplifier and process |
| US9478931B2 (en) | 2013-02-04 | 2016-10-25 | Nlight Photonics Corporation | Method for actively controlling the optical output of a seed laser |
| US9263855B2 (en) * | 2013-03-15 | 2016-02-16 | Nlight Photonics Corporation | Injection locking of gain switched diodes for spectral narrowing and jitter stabilization |
| US10096965B2 (en) | 2014-03-13 | 2018-10-09 | Nlight, Inc. | Algorithms for rapid gating of seed suspendable pulsed fiber laser amplifiers |
| US9806488B2 (en) | 2015-06-30 | 2017-10-31 | Nlight, Inc. | Adaptive boost control for gating picosecond pulsed fiber lasers |
| US9945730B2 (en) * | 2016-09-02 | 2018-04-17 | Cymer, Llc | Adjusting an amount of coherence of a light beam |
| US12586978B2 (en) * | 2019-05-22 | 2026-03-24 | Cymer, Llc | Apparatus for and method of generating multiple laser beams |
Family Cites Families (44)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3593189A (en) | 1969-02-27 | 1971-07-13 | Gen Telephone & Elect | Frequency stabilization system |
| US4534035A (en) | 1983-08-09 | 1985-08-06 | Northrop Corporation | Tandem electric discharges for exciting lasers |
| US4697270A (en) | 1986-08-27 | 1987-09-29 | The United States Of America As Represented By The United States Department Of Energy | Copper vapor laser acoustic thermometry system |
| US4940331A (en) | 1986-09-24 | 1990-07-10 | The United States Of America As Represented By The United States Department Of Energy | Heterodyne laser instantaneous frequency measurement system |
| US4798467A (en) | 1986-09-24 | 1989-01-17 | The United States Department Of Energy | Heterodyne laser instantaneous frequency measurement system |
| US4817101A (en) | 1986-09-26 | 1989-03-28 | The United States Of America As Represented By The United States Department Of Energy | Heterodyne laser spectroscopy system |
| US4959840A (en) | 1988-01-15 | 1990-09-25 | Cymer Laser Technologies | Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser |
| IT1231783B (it) | 1989-05-12 | 1992-01-14 | Enea | Testa laser per eccitazione a scarica trasversa con tre elettrodi |
| IL91240A (en) | 1989-08-07 | 1994-07-31 | Quick Tech Ltd | Pulsed laser apparatus and systems and techniques for its operation |
| US5025445A (en) | 1989-11-22 | 1991-06-18 | Cymer Laser Technologies | System for, and method of, regulating the wavelength of a light beam |
| US5095492A (en) | 1990-07-17 | 1992-03-10 | Cymer Laser Technologies | Spectral narrowing technique |
| US5691989A (en) | 1991-07-26 | 1997-11-25 | Accuwave Corporation | Wavelength stabilized laser sources using feedback from volume holograms |
| US5142166A (en) | 1991-10-16 | 1992-08-25 | Science Research Laboratory, Inc. | High voltage pulsed power source |
| US5371587A (en) | 1992-05-06 | 1994-12-06 | The Boeing Company | Chirped synthetic wavelength laser radar |
| JP3155837B2 (ja) | 1992-09-14 | 2001-04-16 | 株式会社東芝 | 光伝送装置 |
| US5450207A (en) | 1993-07-16 | 1995-09-12 | Cymer Laser Technologies | Method and apparatus for calibrating a laser wavelength control mechanism |
| US5420877A (en) | 1993-07-16 | 1995-05-30 | Cymer Laser Technologies | Temperature compensation method and apparatus for wave meters and tunable lasers controlled thereby |
| US5612967A (en) | 1994-01-04 | 1997-03-18 | Lai; Shui T. | Two dimensional scan amplifier laser |
| US6420819B1 (en) | 1994-01-27 | 2002-07-16 | Active Control Experts, Inc. | Packaged strain actuator |
| US5802084A (en) | 1994-11-14 | 1998-09-01 | The Regents Of The University Of California | Generation of high power optical pulses using flared mode-locked semiconductor lasers and optical amplifiers |
| JPH08172233A (ja) | 1994-12-15 | 1996-07-02 | Anritsu Corp | 可変波長光源装置 |
| CA2186899C (en) | 1995-02-17 | 2010-04-20 | Daniel L. Birx | Pulse power generating circuit with energy recovery |
| US5706301A (en) | 1995-08-16 | 1998-01-06 | Telefonaktiebolaget L M Ericsson | Laser wavelength control system |
| US6109574A (en) | 1996-01-05 | 2000-08-29 | Cymer, Inc. | Gas laser chamber/optics support structure |
| US6128323A (en) | 1997-04-23 | 2000-10-03 | Cymer, Inc. | Reliable modular production quality narrow-band high REP rate excimer laser |
| US5848089A (en) | 1997-07-11 | 1998-12-08 | Cymer, Inc. | Excimer laser with magnetic bearings supporting fan |
| US5991324A (en) | 1998-03-11 | 1999-11-23 | Cymer, Inc. | Reliable. modular, production quality narrow-band KRF excimer laser |
| US5982800A (en) | 1997-04-23 | 1999-11-09 | Cymer, Inc. | Narrow band excimer laser |
| US5856991A (en) | 1997-06-04 | 1999-01-05 | Cymer, Inc. | Very narrow band laser |
| US6192064B1 (en) | 1997-07-01 | 2001-02-20 | Cymer, Inc. | Narrow band laser with fine wavelength control |
| US6018537A (en) * | 1997-07-18 | 2000-01-25 | Cymer, Inc. | Reliable, modular, production quality narrow-band high rep rate F2 laser |
| US5852621A (en) | 1997-07-21 | 1998-12-22 | Cymer, Inc. | Pulse laser with pulse energy trimmer |
| US6078599A (en) | 1997-07-22 | 2000-06-20 | Cymer, Inc. | Wavelength shift correction technique for a laser |
| US5870420A (en) | 1997-08-18 | 1999-02-09 | Cymer, Inc. | Cross-flow blower with braces |
| DE19750320C1 (de) | 1997-11-13 | 1999-04-01 | Max Planck Gesellschaft | Verfahren und Vorrichtung zur Lichtpulsverstärkung |
| US6151346A (en) | 1997-12-15 | 2000-11-21 | Cymer, Inc. | High pulse rate pulse power system with fast rise time and low current |
| US5978405A (en) | 1998-03-06 | 1999-11-02 | Cymer, Inc. | Laser chamber with minimized acoustic and shock wave disturbances |
| US6016325A (en) | 1998-04-27 | 2000-01-18 | Cymer, Inc. | Magnetic modulator voltage and temperature timing compensation circuit |
| US6154470A (en) | 1999-02-10 | 2000-11-28 | Lamba Physik Gmbh | Molecular fluorine (F2) laser with narrow spectral linewidth |
| US6393040B1 (en) | 1999-02-24 | 2002-05-21 | Lambda Physik Ag | Molecular fluorine (F2) excimer laser with reduced coherence length |
| US6026103A (en) | 1999-04-13 | 2000-02-15 | Cymer, Inc. | Gas discharge laser with roller bearings and stable magnetic axial positioning |
| US6034978A (en) | 1999-05-12 | 2000-03-07 | Cymer, Inc. | Gas discharge laser with gas temperature control |
| US6359922B1 (en) | 1999-10-20 | 2002-03-19 | Cymer, Inc. | Single chamber gas discharge laser with line narrowed seed beam |
| US6392743B1 (en) | 2000-02-29 | 2002-05-21 | Cymer, Inc. | Control technique for microlithography lasers |
-
2001
- 2001-06-12 US US09/879,311 patent/US6590922B2/en not_active Expired - Fee Related
-
2002
- 2002-04-03 EP EP02756431A patent/EP1378037A4/en not_active Withdrawn
- 2002-04-03 WO PCT/US2002/021867 patent/WO2002099938A1/en not_active Ceased
- 2002-04-03 JP JP2003502929A patent/JP4071709B2/ja not_active Expired - Fee Related
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