JP2004524707A5 - - Google Patents

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Publication number
JP2004524707A5
JP2004524707A5 JP2002580451A JP2002580451A JP2004524707A5 JP 2004524707 A5 JP2004524707 A5 JP 2004524707A5 JP 2002580451 A JP2002580451 A JP 2002580451A JP 2002580451 A JP2002580451 A JP 2002580451A JP 2004524707 A5 JP2004524707 A5 JP 2004524707A5
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JP
Japan
Prior art keywords
laser
pulse
high voltage
discharge
cores
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002580451A
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English (en)
Japanese (ja)
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JP2004524707A (ja
Filing date
Publication date
Priority claimed from US09/829,475 external-priority patent/US6765945B2/en
Priority claimed from US09/848,043 external-priority patent/US6549551B2/en
Priority claimed from US09/854,097 external-priority patent/US6757316B2/en
Priority claimed from US09/855,310 external-priority patent/US6556600B2/en
Application filed filed Critical
Publication of JP2004524707A publication Critical patent/JP2004524707A/ja
Publication of JP2004524707A5 publication Critical patent/JP2004524707A5/ja
Pending legal-status Critical Current

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JP2002580451A 2001-04-09 2002-03-29 波長制御を有する注入シード方式ｆ２レーザ Pending JP2004524707A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US09/829,475 US6765945B2 (en) 1999-09-27 2001-04-09 Injection seeded F2 laser with pre-injection filter
US09/848,043 US6549551B2 (en) 1999-09-27 2001-05-03 Injection seeded laser with precise timing control
US09/854,097 US6757316B2 (en) 1999-12-27 2001-05-11 Four KHz gas discharge laser
US09/855,310 US6556600B2 (en) 1999-09-27 2001-05-14 Injection seeded F2 laser with centerline wavelength control
PCT/US2002/009625 WO2002082601A1 (en) 2001-04-09 2002-03-29 Injection seeded f2 laser with wavelength control

Publications (2)

Publication Number Publication Date
JP2004524707A JP2004524707A (ja) 2004-08-12
JP2004524707A5 true JP2004524707A5 (https=) 2005-06-30

Family

ID=27505875

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002580451A Pending JP2004524707A (ja) 2001-04-09 2002-03-29 波長制御を有する注入シード方式ｆ２レーザ

Country Status (6)

Country Link
US (1) US6556600B2 (https=)
EP (1) EP1378038A4 (https=)
JP (1) JP2004524707A (https=)
KR (1) KR100863976B1 (https=)
TW (1) TW535338B (https=)
WO (1) WO2002082601A1 (https=)

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US7830934B2 (en) 2001-08-29 2010-11-09 Cymer, Inc. Multi-chamber gas discharge laser bandwidth control through discharge timing
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US7277188B2 (en) * 2003-04-29 2007-10-02 Cymer, Inc. Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
US7366213B2 (en) * 2003-05-19 2008-04-29 Lambda Physik Ag MOPA excimer or molecular fluorine laser system with improved synchronization
US7209507B2 (en) * 2003-07-30 2007-04-24 Cymer, Inc. Method and apparatus for controlling the output of a gas discharge MOPA laser system
US7277464B2 (en) * 2003-12-18 2007-10-02 Cymer, Inc. Method and apparatus for controlling the output of a gas discharge laser system
US7006547B2 (en) * 2004-03-31 2006-02-28 Cymer, Inc. Very high repetition rate narrow band gas discharge laser system
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JP5312567B2 (ja) * 2011-12-26 2013-10-09 株式会社小松製作所 狭帯域化レーザ装置
RU2536095C1 (ru) * 2013-05-31 2014-12-20 Российская Федерация, от имени которой выступает Государственная корпорация по атомной энергии "Росатом" - Госкорпорация "Росатом" Система восстановления состава и давления газа в лазере
US9634455B1 (en) * 2016-02-16 2017-04-25 Cymer, Llc Gas optimization in a gas discharge light source
CN113439371B (zh) * 2019-03-26 2023-12-08 国立大学法人长冈技术科学大学 高电压脉冲产生装置、气体激光装置和电子器件的制造方法
WO2021091675A1 (en) * 2019-11-07 2021-05-14 Cymer, Llc Controlling a spectral property of an output light beam produced by an optical source
CN118455799B (zh) * 2024-07-12 2024-09-06 常州市海宝焊割有限公司 一种交换料台龙门切割机

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