KR100863976B1 - 파장이 제어되는 주입 시딩된 ｆ2 레이저 - Google Patents

파장이 제어되는 주입 시딩된 ｆ2 레이저 Download PDF

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KR100863976B1
KR100863976B1 KR1020037013203A KR20037013203A KR100863976B1 KR 100863976 B1 KR100863976 B1 KR 100863976B1 KR 1020037013203 A KR1020037013203 A KR 1020037013203A KR 20037013203 A KR20037013203 A KR 20037013203A KR 100863976 B1 KR100863976 B1 KR 100863976B1
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South Korea
Prior art keywords
laser
pulse
discharge
transformer
laser system
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KR20030088128A (ko
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샌드스트롬리차드엘.
네스리차드엠.
파틀로윌리엄엔.
얼쇼프알렉산더아이.
온켈스에케하드디.
오중훈
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사이머 인코포레이티드
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Priority claimed from US09/829,475 external-priority patent/US6765945B2/en
Priority claimed from US09/848,043 external-priority patent/US6549551B2/en
Priority claimed from US09/854,097 external-priority patent/US6757316B2/en
Application filed by 사이머 인코포레이티드 filed Critical 사이머 인코포레이티드
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    • H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
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    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
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    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H01S3/2251—ArF, i.e. argon fluoride is comprised for lasing around 193 nm
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H01S3/2256—KrF, i.e. krypton fluoride is comprised for lasing around 248 nm
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H01S3/2258—F2, i.e. molecular fluoride is comprised for lasing around 157 nm
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)
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Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
US09/829,475 US6765945B2 (en) 1999-09-27 2001-04-09 Injection seeded F2 laser with pre-injection filter
US09/829,475 2001-04-09
US09/848,043 US6549551B2 (en) 1999-09-27 2001-05-03 Injection seeded laser with precise timing control
US09/848,043 2001-05-03
US09/854,097 US6757316B2 (en) 1999-12-27 2001-05-11 Four KHz gas discharge laser
US09/854,097 2001-05-11
US09/855,310 2001-05-14
US09/855,310 US6556600B2 (en) 1999-09-27 2001-05-14 Injection seeded F2 laser with centerline wavelength control
PCT/US2002/009625 WO2002082601A1 (en) 2001-04-09 2002-03-29 Injection seeded f2 laser with wavelength control

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KR100863976B1 true KR100863976B1 (ko) 2008-10-16

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US6556600B2 (en) 2003-04-29
JP2004524707A (ja) 2004-08-12
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TW535338B (en) 2003-06-01
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