JP4071709B2 - ライン選択及び弁別を用いる注入シード方式ｆ２レーザ - Google Patents

ライン選択及び弁別を用いる注入シード方式ｆ２レーザ Download PDF

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Publication number
JP4071709B2
JP4071709B2 JP2003502929A JP2003502929A JP4071709B2 JP 4071709 B2 JP4071709 B2 JP 4071709B2 JP 2003502929 A JP2003502929 A JP 2003502929A JP 2003502929 A JP2003502929 A JP 2003502929A JP 4071709 B2 JP4071709 B2 JP 4071709B2
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Prior art keywords
laser
pulse
laser system
high voltage
seed
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Expired - Fee Related
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Japanese (ja)
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JP2004531068A (ja
JP2004531068A5 (https=
Inventor
エクハード ディ オンケルス
リチャード エル サンドストロム
リチャード エム ネス
ウィリアム エヌ パートロ
アレクサンダー アイ エルショフ
チョンフン オー
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Cymer Inc
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Cymer Inc
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Priority claimed from US09/829,475 external-priority patent/US6765945B2/en
Priority claimed from US09/848,043 external-priority patent/US6549551B2/en
Priority claimed from US09/855,310 external-priority patent/US6556600B2/en
Application filed by Cymer Inc filed Critical Cymer Inc
Publication of JP2004531068A publication Critical patent/JP2004531068A/ja
Publication of JP2004531068A5 publication Critical patent/JP2004531068A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
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    • H01S3/09705—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser with particular means for stabilising the discharge
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    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
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    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/10084—Frequency control by seeding
    • H01S3/10092—Coherent seed, e.g. injection locking
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    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
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    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
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    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2366—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media comprising a gas as the active medium
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    • H01S3/08009—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection using a diffraction grating
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    • H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
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    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
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    • H01S3/09702—Details of the driver electronics and electric discharge circuits
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    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/139—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
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    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
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    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/2207—Noble gas ions, e.g. Ar+>, Kr+>
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    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
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    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
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    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H01S3/2258—F2, i.e. molecular fluoride is comprised for lasing around 157 nm
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    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)
JP2003502929A 2001-04-09 2002-04-03 ライン選択及び弁別を用いる注入シード方式ｆ２レーザ Expired - Fee Related JP4071709B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US09/829,475 US6765945B2 (en) 1999-09-27 2001-04-09 Injection seeded F2 laser with pre-injection filter
US09/848,043 US6549551B2 (en) 1999-09-27 2001-05-03 Injection seeded laser with precise timing control
US09/855,310 US6556600B2 (en) 1999-09-27 2001-05-14 Injection seeded F2 laser with centerline wavelength control
US09/879,311 US6590922B2 (en) 1999-09-27 2001-06-12 Injection seeded F2 laser with line selection and discrimination
PCT/US2002/021867 WO2002099938A1 (en) 2001-04-09 2002-04-03 Injection seeded f2 laser with line selection and discrimination

Publications (3)

Publication Number Publication Date
JP2004531068A JP2004531068A (ja) 2004-10-07
JP2004531068A5 JP2004531068A5 (https=) 2005-12-22
JP4071709B2 true JP4071709B2 (ja) 2008-04-02

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JP2003502929A Expired - Fee Related JP4071709B2 (ja) 2001-04-09 2002-04-03 ライン選択及び弁別を用いる注入シード方式ｆ２レーザ

Country Status (4)

Country Link
US (1) US6590922B2 (https=)
EP (1) EP1378037A4 (https=)
JP (1) JP4071709B2 (https=)
WO (1) WO2002099938A1 (https=)

Families Citing this family (52)

* Cited by examiner, † Cited by third party
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US6819698B1 (en) * 1999-02-26 2004-11-16 Lambda Physik Ag Energy monitor for F2 molecular fluorine laser and method of energy stabilization
US6625191B2 (en) * 1999-12-10 2003-09-23 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6765945B2 (en) * 1999-09-27 2004-07-20 Cymer, Inc. Injection seeded F2 laser with pre-injection filter
US6834069B1 (en) 1999-12-15 2004-12-21 Lambda Physik Ag Molecular fluorine laser with intracavity polarization enhancer
US6763048B2 (en) 2000-06-19 2004-07-13 Lambda Physik Ag Line narrowing of molecular fluorine laser emission
US6738406B2 (en) * 2000-06-19 2004-05-18 Lambda Physik Ag Precision measurement of wavelengths emitted by a molecular fluorine laser at 157nm
JP4877692B2 (ja) * 2001-03-21 2012-02-15 株式会社小松製作所 注入同期式又はｍｏｐａ方式のレーザ装置
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US6590922B2 (en) 2003-07-08
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