KR101083903B1 - Ｍｅｍｓ 장치용 기판과 그 형성 방법 및 유체 분사 장치 - Google Patents

Ｍｅｍｓ 장치용 기판과 그 형성 방법 및 유체 분사 장치 Download PDF

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Publication number
KR101083903B1
KR101083903B1 KR1020040015821A KR20040015821A KR101083903B1 KR 101083903 B1 KR101083903 B1 KR 101083903B1 KR 1020040015821 A KR1020040015821 A KR 1020040015821A KR 20040015821 A KR20040015821 A KR 20040015821A KR 101083903 B1 KR101083903 B1 KR 101083903B1
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KR
South Korea
Prior art keywords
substrate
strain gauge
mems device
angle
opening
Prior art date
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Expired - Fee Related
Application number
KR1020040015821A
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English (en)
Korean (ko)
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KR20040081312A (ko
Inventor
니켈에릭리
Original Assignee
휴렛-팩커드 디벨롭먼트 컴퍼니, 엘.피.
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Publication of KR20040081312A publication Critical patent/KR20040081312A/ko
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Publication of KR101083903B1 publication Critical patent/KR101083903B1/ko
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    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05F—SYSTEMS FOR REGULATING ELECTRIC OR MAGNETIC VARIABLES
    • G05F3/00—Non-retroactive systems for regulating electric variables by using an uncontrolled element, or an uncontrolled combination of elements, such element or such combination having self-regulating properties
    • G05F3/02—Regulating voltage or current
    • G05F3/08—Regulating voltage or current wherein the variable is DC
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/14—Structure thereof only for on-demand ink jet heads
    • B41J2/14016—Structure of bubble jet print heads
    • B41J2/14153—Structures including a sensor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/14—Structure thereof only for on-demand ink jet heads
    • B41J2/14201—Structure of print heads with piezoelectric elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00—Measuring force or stress, in general
    • G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
    • G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
    • G01L1/2206—Special supports with preselected places to mount the resistance strain gauges; Mounting of supports
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00—Measuring force or stress, in general
    • G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
    • G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
    • G01L1/2287—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges constructional details of the strain gauges
    • G01L1/2293—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges constructional details of the strain gauges of the semi-conductor type
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
    • H02M1/00—Details of apparatus for conversion
    • H02M1/0045—Converters combining the concepts of switch-mode regulation and linear regulation, e.g. linear pre-regulator to switching converter, linear and switching converter in parallel, same converter or same transistor operating either in linear or switching mode

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Electromagnetism (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Automation & Control Theory (AREA)
  • Micromachines (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
KR1020040015821A 2003-03-10 2004-03-09 Ｍｅｍｓ 장치용 기판과 그 형성 방법 및 유체 분사 장치 Expired - Fee Related KR101083903B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/384,887 US6739199B1 (en) 2003-03-10 2003-03-10 Substrate and method of forming substrate for MEMS device with strain gage
US10/384,887 2003-03-10

Publications (2)

Publication Number Publication Date
KR20040081312A KR20040081312A (ko) 2004-09-21
KR101083903B1 true KR101083903B1 (ko) 2011-11-15

Family

ID=32312413

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020040015821A Expired - Fee Related KR101083903B1 (ko) 2003-03-10 2004-03-09 Ｍｅｍｓ 장치용 기판과 그 형성 방법 및 유체 분사 장치

Country Status (5)

Country Link
US (1) US6739199B1 (enExample)
EP (1) EP1457766B1 (enExample)
JP (2) JP4146812B2 (enExample)
KR (1) KR101083903B1 (enExample)
TW (1) TWI306831B (enExample)

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JP2004358799A (ja) * 2003-06-04 2004-12-24 Canon Inc キャリッジ駆動制御方法
US6988412B1 (en) * 2004-11-30 2006-01-24 Endevco Corporation Piezoresistive strain concentrator
WO2008048212A2 (en) * 2005-07-07 2008-04-24 The Regents Of The University Of California Infrared sensor systems and devices
CN101657747B (zh) * 2006-12-05 2014-12-10 维斯普瑞公司 带有开槽金属的基板及相关方法
JP5026144B2 (ja) * 2007-05-18 2012-09-12 日本電信電話株式会社 記憶素子
KR100917649B1 (ko) * 2007-11-12 2009-09-17 주식회사 이오테크닉스 플렉시블 기판의 평탄화 방법 및 평탄화 장치
WO2010089234A1 (en) * 2009-02-03 2010-08-12 Oce-Technologies B.V. A print head and a method for measuring on the print head
US7938016B2 (en) * 2009-03-20 2011-05-10 Freescale Semiconductor, Inc. Multiple layer strain gauge
KR101656915B1 (ko) * 2010-05-27 2016-09-12 휴렛-팩커드 디벨롭먼트 컴퍼니, 엘.피. 인쇄헤드와 그에 관련된 방법 및 시스템
GB201117343D0 (en) * 2011-10-07 2011-11-23 Airbus Uk Ltd Method and apparatus for measuring residual stresses in a component
DE102012208492A1 (de) * 2012-05-22 2013-11-28 Continental Teves Ag & Co. Ohg Dehnmessstreifenanordnung
US8857271B2 (en) * 2012-07-24 2014-10-14 The Boeing Company Wraparound strain gage assembly for brake rod
JP6987497B2 (ja) * 2016-01-08 2022-01-05 キヤノン株式会社 液体吐出モジュールおよび液体吐出ヘッド
WO2018199910A1 (en) * 2017-04-24 2018-11-01 Hewlett-Packard Development Company, L.P. Fluid back pressure sensing with a strain sensor
CN110446612B (zh) * 2017-04-24 2020-10-16 惠普发展公司，有限责任合伙企业 包括应变计传感器的流体喷射管芯
WO2018199888A1 (en) * 2017-04-24 2018-11-01 Hewlett-Packard Development Company, L.P. Fluid ejection dies including strain gauge sensors
EP3562678B1 (en) * 2017-04-24 2024-10-23 Hewlett-Packard Development Company, L.P. Fluid ejection dies including strain gauge sensors
CN107329615B (zh) * 2017-06-30 2020-06-16 上海天马微电子有限公司 显示面板及显示装置
EP3609710B1 (en) * 2017-07-18 2022-11-09 Hewlett-Packard Development Company, L.P. Dies including strain gauge sensors and temperature sensors
CN108731858B (zh) * 2018-06-01 2019-07-30 中国石油大学(华东) 一种mems压力传感器及其制作方法
CN113795386B (zh) * 2019-05-15 2023-09-01 惠普发展公司，有限责任合伙企业 包括应变仪传感器的集成电路
CZ308886B6 (cs) * 2019-10-11 2021-08-04 4Dot Mechatronic Systems S.R.O. Snímač přetvoření a sestava pro měření přetvoření obsahující tento snímač
US11630018B2 (en) * 2021-03-18 2023-04-18 Becs Technology, Inc. Calibrated load cell
EP4155488A1 (en) * 2021-09-23 2023-03-29 U-Shin Italia S.p.A. Detection device and detection system for activating at least on function of an apparatus, and apparatus comprising the detection system

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US4771638A (en) 1985-09-30 1988-09-20 Kabushiki Kaisha Toyota Chuo Kenkyusho Semiconductor pressure sensor
US6001666A (en) 1996-03-28 1999-12-14 Commissariat A L'energie Atomique Manufacturing process of strain gauge sensor using the piezoresistive effect

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JPS59217375A (ja) 1983-05-26 1984-12-07 Toyota Central Res & Dev Lab Inc 半導体機械−電気変換装置
US4658233A (en) 1984-03-16 1987-04-14 Fuji Electric Corporate Research & Development Ltd. Strain gauge
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JPH09232595A (ja) 1996-02-26 1997-09-05 Denso Corp 圧力検出装置
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Publication number Priority date Publication date Assignee Title
US4771638A (en) 1985-09-30 1988-09-20 Kabushiki Kaisha Toyota Chuo Kenkyusho Semiconductor pressure sensor
US6001666A (en) 1996-03-28 1999-12-14 Commissariat A L'energie Atomique Manufacturing process of strain gauge sensor using the piezoresistive effect

Also Published As

Publication number Publication date
JP2004271527A (ja) 2004-09-30
TWI306831B (en) 2009-03-01
JP2008275630A (ja) 2008-11-13
TW200417503A (en) 2004-09-16
US6739199B1 (en) 2004-05-25
EP1457766A1 (en) 2004-09-15
JP4146812B2 (ja) 2008-09-10
KR20040081312A (ko) 2004-09-21
EP1457766B1 (en) 2013-05-08

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