KR101071966B1 - 이머젼 리소그래피 시스템들에서 이미징의 모니터링 및제어 방법 - Google Patents

이머젼 리소그래피 시스템들에서 이미징의 모니터링 및제어 방법 Download PDF

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Publication number
KR101071966B1
KR101071966B1 KR1020067001296A KR20067001296A KR101071966B1 KR 101071966 B1 KR101071966 B1 KR 101071966B1 KR 1020067001296 A KR1020067001296 A KR 1020067001296A KR 20067001296 A KR20067001296 A KR 20067001296A KR 101071966 B1 KR101071966 B1 KR 101071966B1
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South Korea
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immersion medium
refractive index
immersion
wafer
exposure pattern
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KR20060058684A (ko
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해리 제이. 레빈슨
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글로벌파운드리즈 인크.
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020067001296A 2003-07-25 2004-07-23 이머젼 리소그래피 시스템들에서 이미징의 모니터링 및제어 방법 Expired - Fee Related KR101071966B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/628,021 2003-07-25
US10/628,021 US7006209B2 (en) 2003-07-25 2003-07-25 Method and apparatus for monitoring and controlling imaging in immersion lithography systems

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KR20060058684A KR20060058684A (ko) 2006-05-30
KR101071966B1 true KR101071966B1 (ko) 2011-10-11

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US (1) US7006209B2 (https=)
EP (1) EP1652008B1 (https=)
JP (1) JP4465356B2 (https=)
KR (1) KR101071966B1 (https=)
CN (1) CN100538523C (https=)
TW (1) TWI372947B (https=)
WO (1) WO2005013008A2 (https=)

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JP4465356B2 (ja) 2010-05-19
EP1652008B1 (en) 2011-06-08
US7006209B2 (en) 2006-02-28
TW200510965A (en) 2005-03-16
JP2007500449A (ja) 2007-01-11
WO2005013008A2 (en) 2005-02-10
CN100538523C (zh) 2009-09-09
US20050018208A1 (en) 2005-01-27
EP1652008A2 (en) 2006-05-03

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