CN100538523C - 在浸润光刻系统中监视及控制成像的方法 - Google Patents

在浸润光刻系统中监视及控制成像的方法 Download PDF

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Publication number
CN100538523C
CN100538523C CNB2004800195324A CN200480019532A CN100538523C CN 100538523 C CN100538523 C CN 100538523C CN B2004800195324 A CNB2004800195324 A CN B2004800195324A CN 200480019532 A CN200480019532 A CN 200480019532A CN 100538523 C CN100538523 C CN 100538523C
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China
Prior art keywords
refractive index
medium
volume
wafer
immersion
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Expired - Lifetime
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Chinese (zh)
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CN1820229A (zh
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H·J·利维森
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GlobalFoundries US Inc
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Advanced Micro Devices Inc
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CNB2004800195324A 2003-07-25 2004-07-23 在浸润光刻系统中监视及控制成像的方法 Expired - Lifetime CN100538523C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/628,021 US7006209B2 (en) 2003-07-25 2003-07-25 Method and apparatus for monitoring and controlling imaging in immersion lithography systems
US10/628,021 2003-07-25

Publications (2)

Publication Number Publication Date
CN1820229A CN1820229A (zh) 2006-08-16
CN100538523C true CN100538523C (zh) 2009-09-09

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CNB2004800195324A Expired - Lifetime CN100538523C (zh) 2003-07-25 2004-07-23 在浸润光刻系统中监视及控制成像的方法

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US (1) US7006209B2 (https=)
EP (1) EP1652008B1 (https=)
JP (1) JP4465356B2 (https=)
KR (1) KR101071966B1 (https=)
CN (1) CN100538523C (https=)
TW (1) TWI372947B (https=)
WO (1) WO2005013008A2 (https=)

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US20050018208A1 (en) 2005-01-27
WO2005013008A3 (en) 2005-11-10
TW200510965A (en) 2005-03-16
JP2007500449A (ja) 2007-01-11
WO2005013008A2 (en) 2005-02-10
CN1820229A (zh) 2006-08-16
JP4465356B2 (ja) 2010-05-19
EP1652008B1 (en) 2011-06-08
KR20060058684A (ko) 2006-05-30
US7006209B2 (en) 2006-02-28
EP1652008A2 (en) 2006-05-03
KR101071966B1 (ko) 2011-10-11
TWI372947B (en) 2012-09-21

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