KR101043397B1 - 티에프티 엘시디 제조 공정의 칼라 레지스트 제거용박리액 조성물 - Google Patents

티에프티 엘시디 제조 공정의 칼라 레지스트 제거용박리액 조성물 Download PDF

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Publication number
KR101043397B1
KR101043397B1 KR1020030046979A KR20030046979A KR101043397B1 KR 101043397 B1 KR101043397 B1 KR 101043397B1 KR 1020030046979 A KR1020030046979 A KR 1020030046979A KR 20030046979 A KR20030046979 A KR 20030046979A KR 101043397 B1 KR101043397 B1 KR 101043397B1
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KR
South Korea
Prior art keywords
weight
color resist
parts
ether
amine
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KR1020030046979A
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English (en)
Korean (ko)
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KR20050006980A (ko
Inventor
윤석일
김성배
Original Assignee
주식회사 동진쎄미켐
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Application filed by 주식회사 동진쎄미켐 filed Critical 주식회사 동진쎄미켐
Priority to KR1020030046979A priority Critical patent/KR101043397B1/ko
Priority to TW093119125A priority patent/TWI350949B/zh
Priority to JP2004203078A priority patent/JP4395020B2/ja
Priority to CN2004100624001A priority patent/CN1577112B/zh
Publication of KR20050006980A publication Critical patent/KR20050006980A/ko
Application granted granted Critical
Publication of KR101043397B1 publication Critical patent/KR101043397B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133707—Structures for producing distorted electric fields, e.g. bumps, protrusions, recesses, slits in pixel electrodes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Filters (AREA)
KR1020030046979A 2003-07-10 2003-07-10 티에프티 엘시디 제조 공정의 칼라 레지스트 제거용박리액 조성물 KR101043397B1 (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020030046979A KR101043397B1 (ko) 2003-07-10 2003-07-10 티에프티 엘시디 제조 공정의 칼라 레지스트 제거용박리액 조성물
TW093119125A TWI350949B (en) 2003-07-10 2004-06-29 Stripping composition for removing color resist of tft-lcd manufacturing process
JP2004203078A JP4395020B2 (ja) 2003-07-10 2004-07-09 レジスト除去用剥離液組成物
CN2004100624001A CN1577112B (zh) 2003-07-10 2004-07-09 去除tft-lcd制造工艺中彩色抗蚀剂的剥离组合物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020030046979A KR101043397B1 (ko) 2003-07-10 2003-07-10 티에프티 엘시디 제조 공정의 칼라 레지스트 제거용박리액 조성물

Publications (2)

Publication Number Publication Date
KR20050006980A KR20050006980A (ko) 2005-01-17
KR101043397B1 true KR101043397B1 (ko) 2011-06-22

Family

ID=34214642

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020030046979A KR101043397B1 (ko) 2003-07-10 2003-07-10 티에프티 엘시디 제조 공정의 칼라 레지스트 제거용박리액 조성물

Country Status (4)

Country Link
JP (1) JP4395020B2 (zh)
KR (1) KR101043397B1 (zh)
CN (1) CN1577112B (zh)
TW (1) TWI350949B (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140113114A (ko) 2013-03-15 2014-09-24 동우 화인켐 주식회사 칼라 레지스트 및 유기계 절연막 제거용 세정제 조성물
KR20140139745A (ko) 2013-05-28 2014-12-08 동우 화인켐 주식회사 칼라 레지스트 및 유기계 절연막 박리액 조성물

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JP4906516B2 (ja) * 2006-01-11 2012-03-28 東進セミケム株式会社 Ｔｆｔ−ｌｃｄ用カラーレジスト剥離液組成物
KR101328097B1 (ko) * 2006-01-11 2013-11-13 주식회사 동진쎄미켐 티에프티 엘시디용 칼라 레지스트 박리액 조성물
KR100793241B1 (ko) 2006-06-19 2008-01-10 삼성전자주식회사 실리콘 고분자 및 포토레지스트 제거용 조성물, 이를이용한 막 제거 방법 및 패턴 형성 방법
KR100842853B1 (ko) * 2006-09-27 2008-07-02 주식회사 대원에프엔씨 포토레지스트 및 열경화된 오버코트 제거용 수계 박리액조성물
CN101187788A (zh) * 2006-11-17 2008-05-28 安集微电子（上海）有限公司 低蚀刻性较厚光刻胶清洗液
CN101201557A (zh) * 2006-12-15 2008-06-18 安集微电子（上海）有限公司 清洗厚膜光刻胶的清洗剂
KR101333779B1 (ko) * 2007-08-20 2013-11-29 주식회사 동진쎄미켐 티에프티 엘시디용 칼라 레지스트 박리액 조성물
KR101488265B1 (ko) 2007-09-28 2015-02-02 삼성디스플레이 주식회사 박리 조성물 및 박리 방법
JP5306755B2 (ja) * 2008-09-16 2013-10-02 ＡｚエレクトロニックマテリアルズＩｐ株式会社 基板処理液およびそれを用いたレジスト基板処理方法
MY158776A (en) 2009-05-07 2016-11-15 Basf Se Resist stripping compositions and methods for manufacturing electrical devices
KR20110018775A (ko) 2009-08-18 2011-02-24 삼성전자주식회사 컬러 필터 박리용 조성물 및 이를 이용한 컬러 필터 재생 방법
CN102163011A (zh) * 2011-04-29 2011-08-24 西安东旺精细化学有限公司 一种光致抗蚀剂的剥离液组合物
KR102040064B1 (ko) 2012-12-24 2019-11-04 동우 화인켐 주식회사 칼라레지스트 박리액 조성물
KR102009532B1 (ko) * 2013-08-26 2019-08-09 동우 화인켐 주식회사 레지스트 박리액 조성물
KR102009533B1 (ko) * 2013-09-06 2019-08-09 동우 화인켐 주식회사 레지스트 박리액 조성물 및 이를 이용한 평판표시장치의 제조방법
JP2015011356A (ja) * 2014-07-18 2015-01-19 パナソニックＩｐマネジメント株式会社 フォトレジスト用剥離液
KR20160017477A (ko) 2014-08-06 2016-02-16 동우 화인켐 주식회사 세정제 조성물
CN105368611B (zh) * 2014-08-06 2018-12-07 东友精细化工有限公司 清洁组合物
KR20160018210A (ko) 2014-08-08 2016-02-17 동우 화인켐 주식회사 세정제 조성물
US10072237B2 (en) * 2015-08-05 2018-09-11 Versum Materials Us, Llc Photoresist cleaning composition used in photolithography and a method for treating substrate therewith
CN105388713A (zh) * 2015-12-16 2016-03-09 无锡吉进环保科技有限公司 一种薄膜液晶显示器中的铝膜水系光阻剥离液
KR20170086965A (ko) * 2016-01-19 2017-07-27 동우 화인켐 주식회사 컬러 레지스트 또는 유기막 박리액 조성물
CN106873236B (zh) 2017-04-11 2019-11-29 惠科股份有限公司 显示面板的制造方法和显示面板
KR101972212B1 (ko) * 2017-04-27 2019-04-25 한양대학교 에리카산학협력단 Euv 마스크 세정 용액 및 그 세정 방법
US10800898B2 (en) * 2018-04-30 2020-10-13 Skc Inc. Method for reproducing polyester container and reproduced polyester chip prepared therefrom
JP7458927B2 (ja) 2020-07-28 2024-04-01 東京応化工業株式会社 処理液および基板の処理方法
CN113296374A (zh) * 2021-05-25 2021-08-24 深圳深骏微电子材料有限公司 一种彩色滤光片的返工液

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0728254A (ja) * 1993-07-08 1995-01-31 Kanto Chem Co Inc レジスト用剥離液

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Publication number Priority date Publication date Assignee Title
JP3738996B2 (ja) * 2002-10-10 2006-01-25 東京応化工業株式会社 ホトリソグラフィー用洗浄液および基板の処理方法
JP4282054B2 (ja) * 2002-09-09 2009-06-17 東京応化工業株式会社 デュアルダマシン構造形成プロセスに用いられる洗浄液および基板の処理方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0728254A (ja) * 1993-07-08 1995-01-31 Kanto Chem Co Inc レジスト用剥離液

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140113114A (ko) 2013-03-15 2014-09-24 동우 화인켐 주식회사 칼라 레지스트 및 유기계 절연막 제거용 세정제 조성물
KR20140139745A (ko) 2013-05-28 2014-12-08 동우 화인켐 주식회사 칼라 레지스트 및 유기계 절연막 박리액 조성물

Also Published As

Publication number Publication date
TW200506552A (en) 2005-02-16
JP2005031682A (ja) 2005-02-03
TWI350949B (en) 2011-10-21
CN1577112A (zh) 2005-02-09
KR20050006980A (ko) 2005-01-17
JP4395020B2 (ja) 2010-01-06
CN1577112B (zh) 2011-08-17

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