KR101026954B1 - 감광성 수지 조성물 - Google Patents

감광성 수지 조성물 Download PDF

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Publication number
KR101026954B1
KR101026954B1 KR1020067001002A KR20067001002A KR101026954B1 KR 101026954 B1 KR101026954 B1 KR 101026954B1 KR 1020067001002 A KR1020067001002 A KR 1020067001002A KR 20067001002 A KR20067001002 A KR 20067001002A KR 101026954 B1 KR101026954 B1 KR 101026954B1
Authority
KR
South Korea
Prior art keywords
resin composition
photosensitive resin
photosensitive
alkali
formula
Prior art date
Application number
KR1020067001002A
Other languages
English (en)
Korean (ko)
Other versions
KR20060040686A (ko
Inventor
슈이치 다카하시
다쿠야 노구치
Original Assignee
에이제토 엘렉토로닉 마티리알즈 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 에이제토 엘렉토로닉 마티리알즈 가부시키가이샤 filed Critical 에이제토 엘렉토로닉 마티리알즈 가부시키가이샤
Publication of KR20060040686A publication Critical patent/KR20060040686A/ko
Application granted granted Critical
Publication of KR101026954B1 publication Critical patent/KR101026954B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
KR1020067001002A 2003-07-16 2004-06-04 감광성 수지 조성물 KR101026954B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003275413 2003-07-16
JPJP-P-2003-00275413 2003-07-16

Publications (2)

Publication Number Publication Date
KR20060040686A KR20060040686A (ko) 2006-05-10
KR101026954B1 true KR101026954B1 (ko) 2011-04-11

Family

ID=34074552

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020067001002A KR101026954B1 (ko) 2003-07-16 2004-06-04 감광성 수지 조성물

Country Status (5)

Country Link
JP (1) JP4455499B2 (ja)
KR (1) KR101026954B1 (ja)
CN (1) CN100535747C (ja)
TW (1) TWI329786B (ja)
WO (1) WO2005008337A1 (ja)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4753237B2 (ja) * 2005-07-25 2011-08-24 Ａｚエレクトロニックマテリアルズ株式会社 感光性樹脂組成物
JP5138174B2 (ja) * 2006-04-06 2013-02-06 東京応化工業株式会社 非化学増幅主鎖分解型ポジ型レジスト組成物
JP2008256974A (ja) * 2007-04-05 2008-10-23 Nissan Chem Ind Ltd ポジ型感光性樹脂組成物
JP5029836B2 (ja) * 2008-03-19 2012-09-19 Ｊｓｒ株式会社 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法
JP5293937B2 (ja) * 2008-05-22 2013-09-18 日産化学工業株式会社 感光性樹脂組成物
JP2011138116A (ja) * 2009-12-04 2011-07-14 Jsr Corp 感放射線性樹脂組成物、層間絶縁膜並びにそれらの形成方法
JP5691657B2 (ja) * 2011-03-04 2015-04-01 日油株式会社 感光性樹脂組成物およびその用途
JP2013130816A (ja) * 2011-12-22 2013-07-04 Nippon Zeon Co Ltd 永久膜用樹脂組成物及び電子部品
JP6467121B2 (ja) * 2013-02-20 2019-02-06 東京応化工業株式会社 相分離構造を含む構造体の製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000053712A (ja) 1998-08-05 2000-02-22 Mitsubishi Rayon Co Ltd メチルメタクリレート系重合体の製造方法およびプラスチック光ファイバの製造方法
JP2000112128A (ja) 1998-10-06 2000-04-21 Fuji Photo Film Co Ltd 感光性平版印刷版
JP2000250208A (ja) * 1999-03-03 2000-09-14 Jsr Corp 感放射線性樹脂組成物
WO2003029898A1 (fr) * 2001-09-27 2003-04-10 Clariant International Ltd. Composition de resine photosensible

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05297582A (ja) * 1992-04-23 1993-11-12 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JPH08301990A (ja) * 1995-05-09 1996-11-19 Nippon Kayaku Co Ltd 樹脂組成物、レジストインキ組成物及びその硬化物
JP3901266B2 (ja) * 1996-11-15 2007-04-04 東京応化工業株式会社 感光性樹脂組成物
JP3873263B2 (ja) * 1997-09-22 2007-01-24 Ｊｓｒ株式会社 感放射線性樹脂組成物、保護膜、層間絶縁膜およびこれらの膜の形成法
JP2000347397A (ja) * 1999-06-04 2000-12-15 Jsr Corp 感放射線性樹脂組成物およびその層間絶縁膜への使用
JP2002116536A (ja) * 2000-10-06 2002-04-19 Jsr Corp 感放射線性樹脂組成物、その硬化物および素子。

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000053712A (ja) 1998-08-05 2000-02-22 Mitsubishi Rayon Co Ltd メチルメタクリレート系重合体の製造方法およびプラスチック光ファイバの製造方法
JP2000112128A (ja) 1998-10-06 2000-04-21 Fuji Photo Film Co Ltd 感光性平版印刷版
JP2000250208A (ja) * 1999-03-03 2000-09-14 Jsr Corp 感放射線性樹脂組成物
WO2003029898A1 (fr) * 2001-09-27 2003-04-10 Clariant International Ltd. Composition de resine photosensible

Also Published As

Publication number Publication date
CN100535747C (zh) 2009-09-02
WO2005008337A1 (ja) 2005-01-27
CN1816775A (zh) 2006-08-09
JPWO2005008337A1 (ja) 2007-09-27
KR20060040686A (ko) 2006-05-10
TW200504462A (en) 2005-02-01
TWI329786B (en) 2010-09-01
JP4455499B2 (ja) 2010-04-21

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