KR101008741B1 - 폴리실록세인계 자외선 여과기를 함유하는 자외선 여과기의총량이 감소된 광보호 조성물 - Google Patents
폴리실록세인계 자외선 여과기를 함유하는 자외선 여과기의총량이 감소된 광보호 조성물 Download PDFInfo
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- A61K8/00—Cosmetics or similar toiletry preparations
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- A61K8/494—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing heterocyclic compounds with more than one nitrogen as the only hetero atom
- A61K8/496—Triazoles or their condensed derivatives, e.g. benzotriazoles
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- A61K2800/00—Properties of cosmetic compositions or active ingredients thereof or formulation aids used therein and process related aspects
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Abstract
Description
Claims (12)
- (a) 하나 이상의 폴리실록세인계 자외선 여과기,(b) 부피가 큰(입체적으로 요구되는) 치환체를 함유하는 발색단을 가진 하나 이상의 부가적인 자외선 여과기, 및(c) 성분 (a) 및 성분 (b)를 위한 담체를 포함하는 광보호 조성물로서, 4,4',4''-(1,3,5-트라이아진-2,4,6-트라이일트라이이미노)-트라이스-벤조산-트라이스(2-에틸헥실에스터)가 조성물내에 존재하지 않는, 광보호 조성물.
- 제 1 항에 있어서,폴리실록세인계 자외선 여과기가 하기 화학식 Ia 또는 화학식 Ib의 화합물인, 광보호 조성물:화학식 Ia화학식 Ib상기 식에서,X는 R 또는 A이고;R은 수소, C1-6-알킬 또는 페닐이고;A는 하기 화학식 Ⅱa, 화학식 Ⅱb 및 화학식 Ⅱc로 이루어진 군으로부터 선택되고:화학식 Ⅱa화학식 Ⅱb화학식 Ⅱc[상기 식에서,R1 및 R2는 각각 독립적으로 수소, 하이드록시, C1-6-알킬 또는 C1-6-알콕시이고;R3은 C1-6-알킬이고;R4는 수소 또는 C1-6-알킬이고;R5 및 R6은 각각 독립적으로 수소 또는 C1-6-알킬이고;n은 1 내지 6이다];r은 0 내지 250이고;s는 0 내지 20이고;r+s는 3 이상이고;t는 0 내지 10이고;v는 0 내지 10이고;v+t는 3 이상이되;s가 0일 때, 하나 이상의 X는 A이다.
- 제 2 항에 있어서,X가 메틸이고;A가 화학식 Ⅱa 또는 화학식 Ⅱb의 기이고;R이 메틸이고;R1 및 R2가 각각 수소이고;R3이 에틸이고;R4가 수소이고;R5 및 R6이 수소이고;r이 60의 통계학상 평균 값이고;s가 4의 통계학상 평균 값이고;n이 1인,광보호 조성물.
- 제 1 항 내지 제 3 항중 어느 한 항에 있어서,자외선 여과기의 부피가 큰(입체적으로 요구되는) 치환체가 다이에틸아미노, t-부틸, 1,1,3,3-다이메틸부틸, 캠퍼 또는 실릴 잔기인, 광보호 조성물.
- 제 1 항 내지 제 3 항중 어느 한 항에 있어서,부피가 큰 치환체를 함유하는 자외선 여과기가 2-(4-다이에틸아미노-2-하이드록시-벤조일)-벤조산 헥실에스터, 4-메틸 벤질리덴 캠퍼, 3-벤질리덴캠퍼, 부틸 메톡시다이벤조일메탄, 호모살레이트, 벤질리덴캠퍼 설폰산, 메틸렌 비스-벤조트라이아조테트라메틸부틸페놀 및 드로메트라이졸 트라이실록세인으로 이루어진 군으로부터 선택되는, 광보호 조성물.
- 제 1 항 내지 제 3 항중 어느 한 항에 있어서,(d) 부가적인 자외선 여과기를 추가로 포함하는 광보호 조성물로서, 이때 상기 부가적인 자외선 여과기가 페닐벤즈이미다졸 설폰산, 다이나트륨 페닐다이벤즈이미다졸 테트라설폰에이트, 벤조페논-3, 벤조페논-4, TiO2 및 ZnO로 이루어진 군으로부터 선택되는, 광보호 조성물.
- 제 6 항에 있어서,자외선 여과기(성분 (a))의 총량이 자외선 여과기(성분 (b)) 및 자외선 여과기(성분 (d))의 합계량 이하인, 광보호 조성물.
- 자외선 여과기의 총량에 대한 자외선차단 지수의 비율을 증가시키는 방법으로서,(a) 실온(25℃)에서 액체인 자외선 여과기의 양을 자외선 여과기의 총량이 감소될 정도까지 감소시키기 위해 폴리실록세인계 자외선 여과기를 첨가하는 단계, 및(b) 부피가 큰 치환체를 함유하는 자외선 여과기를 첨가하는 단계를 포함하는 방법.
- 제 8 항에 있어서,실온(25℃)에서 액체인 자외선 여과기가 옥토크릴렌, 에틸헥실 메톡시신나메이트, PEG-25 PABA, 아이소아밀 p-메톡시신나메이트 및 옥틸 다이메틸 PABA로 이루어진 군으로부터 선택되는, 방법.
- 제 8 항 또는 제 9 항에 있어서,부피가 큰 치환체를 함유하는 자외선 여과기가 2-(4-다이에틸아미노-2-하이드록시-벤조일)-벤조산 헥실에스터, 4-메틸 벤질리덴 캠퍼, 3-벤질리덴캠퍼, 부틸 메톡시다이벤조일메탄, 호모살레이트, 벤질리덴캠퍼 설폰산, 메틸렌 비스-벤조트라이아조테트라메틸부틸페놀 및 드로메트라이졸 트라이실록세인으로 이루어진 군으로부터 선택되는, 방법.
- 제 8 항 또는 제 9 항에 있어서,(c) 광보호 조성물의 자외선차단 지수를 증가시키기 위해 실온(25℃)에서 액체가 아닌 자외선 여과기를 첨가하는 단계를 추가로 포함하고, 이때 실온(25℃)에서 액체가 아닌 자외선 여과기가 페닐벤즈이미다졸 설폰산, 다이나트륨 페닐 다이벤즈이미다졸, 테트라설폰에이트 에틸헥실트라이아존, 다이에틸헥실 부타미도 트라이아존, 비스-에틸헥실옥시페놀 메톡시페닐 트라이아진, 벤조페논-3, 벤조페논-4, TiO2 및 ZnO로 이루어진 군으로부터 선택되는, 방법.
- 제 4 항에 있어서,자외선 여과기의 부피가 큰(입체적으로 요구되는) 치환체가 2-메틸-3-[1,3,3,3-테트라메틸-1-[(트라이메틸실릴)옥시]다이실록세인일]프로필- 또는 4-트라이스(트라이메틸실릴옥시실릴프로필옥시)인, 광보호 조성물.
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EP03025408 | 2003-11-05 | ||
EP03025408.0 | 2003-11-05 |
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US (2) | US20070189994A1 (ko) |
EP (1) | EP1682228B1 (ko) |
JP (1) | JP4829795B2 (ko) |
KR (1) | KR101008741B1 (ko) |
CN (1) | CN1874751A (ko) |
AT (1) | ATE450247T1 (ko) |
AU (1) | AU2004290493B2 (ko) |
DE (1) | DE602004024438D1 (ko) |
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DE102004052833A1 (de) * | 2004-10-28 | 2006-05-04 | Beiersdorf Ag | Sonnenschutzmittel |
FR2908991B1 (fr) | 2006-11-28 | 2009-01-23 | Oreal | Composition cosmetique contenant l'association d'une s-triazine siliciee substituee par deux groupements aminobenzoates ou aminobenzamide et un filtre uv du triazine lipophile non silicie |
FR2908987B1 (fr) * | 2006-11-28 | 2009-01-23 | Oreal | Composition photoprotectrice contenant un derive de 1,3,5-triazine photosensible, un derive du dibenzoylmethane, et un s-triazine siliciee et substituee par deux groupes aminobenzaotes ou aminobenzamides |
BRPI0809164B8 (pt) | 2007-03-22 | 2023-02-28 | Berg Llc | Composição para administração tópica e composição farmacêutica compreendendo a referida composição |
DE102008013804A1 (de) * | 2008-03-10 | 2009-09-17 | Beiersdorf Ag | Foundation mit UV-Filterkombination |
JP6058263B2 (ja) | 2008-04-11 | 2017-01-11 | バーグ リミテッド ライアビリティ カンパニー | 癌細胞においてアポトーシスを誘導する方法および使用 |
ES2531631T3 (es) * | 2008-05-16 | 2015-03-18 | Dsm Ip Assets B.V. | Composiciones de protección solar |
DE102008028665A1 (de) * | 2008-06-09 | 2009-12-17 | Beiersdorf Ag | Kosmetische Zubereitung mit Titandioxid in multimodaler Partikelgrößenverteilung |
FR2933614B1 (fr) * | 2008-07-10 | 2010-09-10 | Oreal | Kit de protection solaire. |
JP5469319B2 (ja) * | 2008-08-22 | 2014-04-16 | 株式会社 資生堂 | 日焼け止め化粧料 |
AU2010247750B2 (en) | 2009-05-11 | 2016-09-22 | Berg Llc | Methods for treatment of metabolic disorders using epimetabolic shifters, multidimensional intracellular molecules, or environmental influencers |
EA032941B1 (ru) | 2010-03-12 | 2019-08-30 | БЕРГ ЭлЭлСи | ЛЕКАРСТВЕННЫЕ ФОРМЫ КОЭНЗИМА Q10 (CoQ10) ДЛЯ ВНУТРИВЕННОГО ВВЕДЕНИЯ И ИХ ПРИМЕНЕНИЕ |
AU2012240222B2 (en) | 2011-04-04 | 2017-04-27 | Berg Llc | Methods of treating central nervous system tumors |
PE20140628A1 (es) | 2011-06-17 | 2014-05-30 | Berg Llc | Composiciones farmaceuticas inhalables |
SG10201903112WA (en) | 2013-04-08 | 2019-05-30 | Berg Llc | Treatment of cancer using coenzyme q10 combination therapies |
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EP3532165B1 (en) * | 2016-10-25 | 2021-02-24 | DSM IP Assets B.V. | Use of cationic polymer having quaternary ammonium groups for the protection of hair against uv damage |
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BR0307335B1 (pt) * | 2002-02-12 | 2014-01-07 | Composições protetoras contra UV-A, diidropiridinas e diidropiranos, bem como uso dos mesmos | |
US6485713B1 (en) * | 2002-03-05 | 2002-11-26 | The C. P. Hall Company | Sunscreen compositions and methods and materials for producing the same |
KR100929303B1 (ko) * | 2002-04-12 | 2009-11-27 | 디에스엠 아이피 어셋츠 비.브이. | 아미노 하이드록시벤조페논의 유기실리콘 유도체 및 이의 화장품 제조에서 uv-a 필터로서의 용도 |
-
2004
- 2004-10-28 WO PCT/EP2004/012194 patent/WO2005048960A1/en active Application Filing
- 2004-10-28 ES ES04818753T patent/ES2334797T3/es active Active
- 2004-10-28 US US10/578,792 patent/US20070189994A1/en not_active Abandoned
- 2004-10-28 KR KR1020067008708A patent/KR101008741B1/ko active IP Right Grant
- 2004-10-28 JP JP2006537190A patent/JP4829795B2/ja active Active
- 2004-10-28 AT AT04818753T patent/ATE450247T1/de not_active IP Right Cessation
- 2004-10-28 AU AU2004290493A patent/AU2004290493B2/en active Active
- 2004-10-28 DE DE602004024438T patent/DE602004024438D1/de active Active
- 2004-10-28 CN CNA2004800321740A patent/CN1874751A/zh active Pending
- 2004-10-28 EP EP04818753A patent/EP1682228B1/en active Active
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2015
- 2015-03-04 US US14/639,043 patent/US20150174045A1/en not_active Abandoned
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5403944A (en) * | 1991-05-10 | 1995-04-04 | Givaudan-Roure Corporation | Organosilicon compounds |
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EP1682228B1 (en) | 2009-12-02 |
AU2004290493A1 (en) | 2005-06-02 |
US20070189994A1 (en) | 2007-08-16 |
WO2005048960A1 (en) | 2005-06-02 |
EP1682228A1 (en) | 2006-07-26 |
ES2334797T3 (es) | 2010-03-16 |
JP2007509889A (ja) | 2007-04-19 |
JP4829795B2 (ja) | 2011-12-07 |
DE602004024438D1 (de) | 2010-01-14 |
US20150174045A1 (en) | 2015-06-25 |
AU2004290493B2 (en) | 2009-09-24 |
KR20060109882A (ko) | 2006-10-23 |
ATE450247T1 (de) | 2009-12-15 |
CN1874751A (zh) | 2006-12-06 |
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