KR100983952B1 - 복합구조물 - Google Patents
복합구조물 Download PDFInfo
- Publication number
- KR100983952B1 KR100983952B1 KR1020087008410A KR20087008410A KR100983952B1 KR 100983952 B1 KR100983952 B1 KR 100983952B1 KR 1020087008410 A KR1020087008410 A KR 1020087008410A KR 20087008410 A KR20087008410 A KR 20087008410A KR 100983952 B1 KR100983952 B1 KR 100983952B1
- Authority
- KR
- South Korea
- Prior art keywords
- yttrium
- yttrium oxide
- fine particles
- base material
- substrate
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/02—Coating starting from inorganic powder by application of pressure only
- C23C24/04—Impact or kinetic deposition of particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3293—Tin oxides, stannates or oxide forming salts thereof, e.g. indium tin oxide [ITO]
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
- Compositions Of Oxide Ceramics (AREA)
Abstract
Description
Claims (2)
- 기재표면에 산화이트륨으로 되는 구조물이 에어로졸 데포지션법에 의해 형성되고, 플라즈마에 폭로되는 장치용 부재로서 이용되는 복합구조물로서,상기 구조물에는 산화이트륨 다결정체가 90wt% 이상 포함되어 있고,추가로 상기 구조물을 구성하는 산화이트륨 다결정체의 결정구조에 입방정계(cubic)와 단사정계(monoclinic)가 혼재하도록,상기 에어로졸 데포지션법에 있어서, 상기 구조물을 형성하는 산화이트륨 미립자와, 상기 산화이트륨 미립자보다도 대입경이고, 상기 구조물의 구성재료로는 되지 않는 제막 보조입자의 혼합 분체를 포함하는 에어로졸을 생성하여 기재표면에 충돌시킴으로써,상기 제막 보조입자는 상기 산화이트륨 미립자를 파쇄 또는 변형시켜서 신생면을 형성시키고 산화이트륨으로 되는 구조물을 기재 상에 형성시키는 동시에, 상기 제막 보조입자 자신은 기재에 충돌하여 반사됨으로써 구조물의 구성재료로는 되지 않는 것을 특징으로 하는 복합구조물.
- 제1항에 있어서, 상기 복합구조물의 일부가 기재표면에 박히는 앵커부로 되어 있는 것을 특징으로 하는 복합구조물.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005298223 | 2005-10-12 | ||
JPJP-P-2005-00298223 | 2005-10-12 | ||
JPJP-P-2006-00274848 | 2006-10-06 | ||
JP2006274848A JP5093745B2 (ja) | 2005-10-12 | 2006-10-06 | 複合構造物 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20080044335A KR20080044335A (ko) | 2008-05-20 |
KR100983952B1 true KR100983952B1 (ko) | 2010-09-27 |
Family
ID=37942756
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020087008410A KR100983952B1 (ko) | 2005-10-12 | 2006-10-10 | 복합구조물 |
Country Status (6)
Country | Link |
---|---|
US (1) | US7897268B2 (ko) |
JP (1) | JP5093745B2 (ko) |
KR (1) | KR100983952B1 (ko) |
CN (1) | CN101283118B (ko) |
TW (1) | TWI315356B (ko) |
WO (1) | WO2007043520A1 (ko) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012073954A1 (ja) * | 2010-12-01 | 2012-06-07 | 株式会社東芝 | プラズマエッチング装置用部品およびプラズマエッチング装置用部品の製造方法 |
TW201334035A (zh) * | 2011-10-06 | 2013-08-16 | Greene Tweed Of Delaware | 抗電漿蝕刻膜,承載抗電漿蝕刻膜之物品及相關的方法 |
CN104364887B (zh) * | 2012-05-22 | 2017-09-22 | 株式会社东芝 | 等离子体处理装置用部件和等离子体处理装置用部件的制造方法 |
JP5656036B2 (ja) * | 2013-03-28 | 2015-01-21 | Toto株式会社 | 複合構造物 |
JP2016008352A (ja) * | 2014-06-26 | 2016-01-18 | Toto株式会社 | 耐プラズマ性部材 |
JP5888458B2 (ja) | 2014-06-26 | 2016-03-22 | Toto株式会社 | 耐プラズマ性部材及びその製造方法 |
JP6808168B2 (ja) * | 2015-12-24 | 2021-01-06 | Toto株式会社 | 耐プラズマ性部材 |
US11047035B2 (en) | 2018-02-23 | 2021-06-29 | Applied Materials, Inc. | Protective yttria coating for semiconductor equipment parts |
WO2020116384A1 (ja) * | 2018-12-05 | 2020-06-11 | 京セラ株式会社 | プラズマ処理装置用部材およびこれを備えるプラズマ処理装置 |
JP7290716B2 (ja) * | 2019-04-26 | 2023-06-13 | 京セラ株式会社 | プラズマ処理装置用部材およびプラズマ処理装置 |
KR102490570B1 (ko) * | 2022-05-23 | 2023-01-20 | 주식회사 코미코 | 희토류 금속 화합물 분말의 열처리 공정을 이용하여 저 명도의 내플라즈마성 코팅막의 제조방법 및 이에 의해 형성된 내플라즈마성 코팅막 |
WO2024038674A1 (ja) * | 2022-08-19 | 2024-02-22 | Agc株式会社 | イットリウム質保護膜およびその製造方法ならびに部材 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1078630A (ja) | 1996-09-03 | 1998-03-24 | Nippon Hoso Kyokai <Nhk> | 光メモリ材料およびその製造方法 |
JP2005217349A (ja) | 2004-02-02 | 2005-08-11 | Toto Ltd | 耐プラズマ性を有する半導体製造装置用部材およびその作製方法 |
JP2005217351A (ja) * | 2004-02-02 | 2005-08-11 | Toto Ltd | 耐プラズマ性を有する半導体製造装置用部材およびその作製方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3265481B2 (ja) * | 1999-04-23 | 2002-03-11 | 独立行政法人産業技術総合研究所 | 脆性材料超微粒子成形体の低温成形法 |
CN1243848C (zh) * | 1999-10-12 | 2006-03-01 | 东陶机器株式会社 | 复合构造物及其制作方法和制作装置 |
JP4205912B2 (ja) | 2002-08-13 | 2009-01-07 | 時田シーブイディーシステムズ株式会社 | 透明な酸化イットリウム膜とその製造方法 |
JP4006535B2 (ja) | 2003-11-25 | 2007-11-14 | 独立行政法人産業技術総合研究所 | 半導体または液晶製造装置部材およびその製造方法 |
JP2005217350A (ja) | 2004-02-02 | 2005-08-11 | Toto Ltd | 耐プラズマ性を有する半導体製造装置用部材およびその作製方法 |
TW200724506A (en) * | 2005-10-07 | 2007-07-01 | Ohara Kk | Inorganic composition |
JP2007109828A (ja) * | 2005-10-12 | 2007-04-26 | Toto Ltd | 耐プラズマ性部材 |
JP2007109827A (ja) * | 2005-10-12 | 2007-04-26 | Toto Ltd | 静電チャック |
-
2006
- 2006-10-06 JP JP2006274848A patent/JP5093745B2/ja not_active Expired - Fee Related
- 2006-10-10 CN CN2006800375538A patent/CN101283118B/zh not_active Expired - Fee Related
- 2006-10-10 US US12/083,065 patent/US7897268B2/en not_active Expired - Fee Related
- 2006-10-10 KR KR1020087008410A patent/KR100983952B1/ko active IP Right Grant
- 2006-10-10 WO PCT/JP2006/320203 patent/WO2007043520A1/ja active Application Filing
- 2006-10-12 TW TW095137582A patent/TWI315356B/zh not_active IP Right Cessation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1078630A (ja) | 1996-09-03 | 1998-03-24 | Nippon Hoso Kyokai <Nhk> | 光メモリ材料およびその製造方法 |
JP2005217349A (ja) | 2004-02-02 | 2005-08-11 | Toto Ltd | 耐プラズマ性を有する半導体製造装置用部材およびその作製方法 |
JP2005217351A (ja) * | 2004-02-02 | 2005-08-11 | Toto Ltd | 耐プラズマ性を有する半導体製造装置用部材およびその作製方法 |
Also Published As
Publication number | Publication date |
---|---|
JP2007131943A (ja) | 2007-05-31 |
CN101283118B (zh) | 2011-04-20 |
US20090233126A1 (en) | 2009-09-17 |
TWI315356B (en) | 2009-10-01 |
CN101283118A (zh) | 2008-10-08 |
JP5093745B2 (ja) | 2012-12-12 |
KR20080044335A (ko) | 2008-05-20 |
US7897268B2 (en) | 2011-03-01 |
WO2007043520A1 (ja) | 2007-04-19 |
TW200734485A (en) | 2007-09-16 |
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