KR100939403B1 - 반도체 가공 장치용 세라믹 피복 부재 - Google Patents

반도체 가공 장치용 세라믹 피복 부재 Download PDF

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KR100939403B1
KR100939403B1 KR1020070026433A KR20070026433A KR100939403B1 KR 100939403 B1 KR100939403 B1 KR 100939403B1 KR 1020070026433 A KR1020070026433 A KR 1020070026433A KR 20070026433 A KR20070026433 A KR 20070026433A KR 100939403 B1 KR100939403 B1 KR 100939403B1
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South Korea
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layer
semiconductor processing
porous layer
alloys
oxide
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Korean (ko)
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KR20070095211A (ko
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요시유끼 고바야시
다까히로 무라까미
요시오 하라다
쥰이찌 다께우찌
료오 야마사끼
게이고 고바야시
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도쿄엘렉트론가부시키가이샤
도카로 가부시키가이샤
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/02—Pretreatment of the material to be coated, e.g. for coating on selected surface areas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
    • C23C4/11—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/18—After-treatment

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Cleaning In General (AREA)
  • Drying Of Semiconductors (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR1020070026433A 2006-03-20 2007-03-19 반도체 가공 장치용 세라믹 피복 부재 Expired - Fee Related KR100939403B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006076196A JP5324029B2 (ja) 2006-03-20 2006-03-20 半導体加工装置用セラミック被覆部材
JPJP-P-2006-00076196 2006-03-20

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020090024410A Division KR20090035676A (ko) 2006-03-20 2009-03-23 반도체 가공 장치용 세라믹 피복 부재

Publications (2)

Publication Number Publication Date
KR20070095211A KR20070095211A (ko) 2007-09-28
KR100939403B1 true KR100939403B1 (ko) 2010-01-28

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Application Number Title Priority Date Filing Date
KR1020070026433A Expired - Fee Related KR100939403B1 (ko) 2006-03-20 2007-03-19 반도체 가공 장치용 세라믹 피복 부재
KR1020090024410A Withdrawn KR20090035676A (ko) 2006-03-20 2009-03-23 반도체 가공 장치용 세라믹 피복 부재

Family Applications After (1)

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KR1020090024410A Withdrawn KR20090035676A (ko) 2006-03-20 2009-03-23 반도체 가공 장치용 세라믹 피복 부재

Country Status (5)

Country Link
JP (1) JP5324029B2 (enrdf_load_stackoverflow)
KR (2) KR100939403B1 (enrdf_load_stackoverflow)
CN (1) CN101074473B (enrdf_load_stackoverflow)
TW (1) TW200741033A (enrdf_load_stackoverflow)
WO (1) WO2007108546A1 (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101236351B1 (ko) * 2010-11-30 2013-02-22 (주)제니스월드 엘이디용 유기금속화학증착장비 쿼츠 실링의 코팅방법

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JP4999721B2 (ja) * 2008-02-05 2012-08-15 トーカロ株式会社 優れた外観を有する溶射皮膜被覆部材およびその製造方法
CN102822115B (zh) 2010-03-30 2017-06-27 日本碍子株式会社 半导体制造装置用耐腐蚀性构件及其制法
WO2011122376A1 (ja) 2010-03-30 2011-10-06 日本碍子株式会社 半導体製造装置用耐食性部材及びその製法
US20120177908A1 (en) * 2010-07-14 2012-07-12 Christopher Petorak Thermal spray coatings for semiconductor applications
JP2013095973A (ja) * 2011-11-02 2013-05-20 Tocalo Co Ltd 半導体製造装置用部材
JP6359236B2 (ja) 2012-05-07 2018-07-18 トーカロ株式会社 静電チャック
WO2013176168A1 (ja) * 2012-05-22 2013-11-28 株式会社東芝 プラズマ処理装置用部品およびプラズマ処理装置用部品の製造方法
TW201546007A (zh) * 2014-06-11 2015-12-16 Creating Nano Technologies Inc 玻璃結構之製造方法與設備
JP6362461B2 (ja) * 2014-07-14 2018-07-25 有限会社コンタミネーション・コントロール・サービス 腐食防止方法
CN105428195B (zh) * 2014-09-17 2018-07-17 东京毅力科创株式会社 等离子体处理装置用的部件和部件的制造方法
KR101723931B1 (ko) * 2015-10-12 2017-04-06 (주)티티에스 그래눌 형태의 세라믹 커버링층이 증착된 표면처리 제품
US10422028B2 (en) 2015-12-07 2019-09-24 Lam Research Corporation Surface coating treatment
US10388492B2 (en) * 2016-04-14 2019-08-20 Fm Industries, Inc. Coated semiconductor processing members having chlorine and fluorine plasma erosion resistance and complex oxide coatings therefor
KR102656926B1 (ko) * 2016-07-14 2024-04-16 신에쓰 가가꾸 고교 가부시끼가이샤 서스펜션 플라스마 용사용 슬러리, 희토류산 불화물 용사막의 형성 방법 및 용사 부재
WO2020167414A1 (en) * 2019-02-12 2020-08-20 Applied Materials, Inc. Method for fabricating chamber parts
KR102407421B1 (ko) * 2019-02-14 2022-06-10 엔지케이 인슐레이터 엘티디 소성 지그
JP7515583B2 (ja) * 2020-05-28 2024-07-12 京セラ株式会社 通気性プラグ、基板支持アセンブリおよびシャワープレート
CN114959547A (zh) * 2022-05-30 2022-08-30 苏州众芯联电子材料有限公司 提高静电卡盘的电介质层的致密性的工艺、静电卡盘的制备工艺、静电卡盘

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KR100248081B1 (ko) * 1997-09-03 2000-04-01 정선종 입방정 구조의 와이비에이투씨유쓰리오엑스 박막 제조 방법
JP2005256098A (ja) * 2004-03-12 2005-09-22 Tocalo Co Ltd 熱放射性および耐損傷性に優れるｙ２ｏ３溶射皮膜被覆部材およびその製造方法

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JP2005256098A (ja) * 2004-03-12 2005-09-22 Tocalo Co Ltd 熱放射性および耐損傷性に優れるｙ２ｏ３溶射皮膜被覆部材およびその製造方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101236351B1 (ko) * 2010-11-30 2013-02-22 (주)제니스월드 엘이디용 유기금속화학증착장비 쿼츠 실링의 코팅방법

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Publication number Publication date
JP2007247042A (ja) 2007-09-27
TWI351444B (enrdf_load_stackoverflow) 2011-11-01
WO2007108546A1 (ja) 2007-09-27
JP5324029B2 (ja) 2013-10-23
CN101074473A (zh) 2007-11-21
CN101074473B (zh) 2012-05-30
KR20090035676A (ko) 2009-04-10
KR20070095211A (ko) 2007-09-28
TW200741033A (en) 2007-11-01

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