KR100891181B1 - 레티클을 취급하기 위한 엔드 이펙터 및 레티클을 이송하고 로딩하는 방법 - Google Patents

레티클을 취급하기 위한 엔드 이펙터 및 레티클을 이송하고 로딩하는 방법 Download PDF

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Publication number
KR100891181B1
KR100891181B1 KR1020030000923A KR20030000923A KR100891181B1 KR 100891181 B1 KR100891181 B1 KR 100891181B1 KR 1020030000923 A KR1020030000923 A KR 1020030000923A KR 20030000923 A KR20030000923 A KR 20030000923A KR 100891181 B1 KR100891181 B1 KR 100891181B1
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KR
South Korea
Prior art keywords
reticle
plate
abandoned
payment
vacuum
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Expired - Fee Related
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KR1020030000923A
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English (en)
Korean (ko)
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KR20030080180A (ko
Inventor
프리드맨글렌엠.
코처스퍼거피터
래간자조세프
Original Assignee
에이에스엠엘 유에스, 인크.
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Publication of KR20030080180A publication Critical patent/KR20030080180A/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Library & Information Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Manipulator (AREA)
KR1020030000923A 2002-01-09 2003-01-08 레티클을 취급하기 위한 엔드 이펙터 및 레티클을 이송하고 로딩하는 방법 Expired - Fee Related KR100891181B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/040,375 US7004715B2 (en) 2002-01-09 2002-01-09 Apparatus for transferring and loading a reticle with a robotic reticle end-effector
US10/040,375 2002-01-09

Publications (2)

Publication Number Publication Date
KR20030080180A KR20030080180A (ko) 2003-10-11
KR100891181B1 true KR100891181B1 (ko) 2009-04-01

Family

ID=21910641

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020030000923A Expired - Fee Related KR100891181B1 (ko) 2002-01-09 2003-01-08 레티클을 취급하기 위한 엔드 이펙터 및 레티클을 이송하고 로딩하는 방법

Country Status (7)

Country Link
US (2) US7004715B2 (enrdf_load_stackoverflow)
EP (1) EP1327913A3 (enrdf_load_stackoverflow)
JP (1) JP2003243301A (enrdf_load_stackoverflow)
KR (1) KR100891181B1 (enrdf_load_stackoverflow)
CN (1) CN1295121C (enrdf_load_stackoverflow)
SG (1) SG102066A1 (enrdf_load_stackoverflow)
TW (1) TWI283799B (enrdf_load_stackoverflow)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7004715B2 (en) * 2002-01-09 2006-02-28 Asml Holding N.V. Apparatus for transferring and loading a reticle with a robotic reticle end-effector
US6862817B1 (en) 2003-11-12 2005-03-08 Asml Holding N.V. Method and apparatus for kinematic registration of a reticle
EP2035320A4 (en) * 2006-06-19 2010-07-28 Entegris Inc RELEASE CLEANING SYSTEM
NL1036673A1 (nl) * 2008-04-09 2009-10-12 Asml Holding Nv Robot Position Calibration Tool (RPCT).
NL1036785A1 (nl) * 2008-04-18 2009-10-20 Asml Netherlands Bv Rapid exchange device for lithography reticles.
US8145349B2 (en) 2008-05-14 2012-03-27 Formfactor, Inc. Pre-aligner search
US8336188B2 (en) * 2008-07-17 2012-12-25 Formfactor, Inc. Thin wafer chuck
KR101657544B1 (ko) * 2009-04-06 2016-09-19 에이에스엠엘 홀딩 엔.브이. 레티클 고속 교환 장치에서 공유되는 준수사항, 및 레티클 스테이지
CN102320472B (zh) * 2011-06-03 2013-07-10 深圳市华星光电技术有限公司 基板传送系统及传送方法
KR102270563B1 (ko) * 2015-03-16 2021-06-30 주식회사 탑 엔지니어링 기판 이송 시스템
US11845184B2 (en) * 2022-04-18 2023-12-19 Dextrous Robotics, Inc. System and/or method for grasping objects
US12176228B2 (en) 2022-04-20 2024-12-24 Taiwan Semiconductor Manufacturing Co., Ltd. High density semiconductor storage system
CN116088283B (zh) * 2023-04-12 2023-06-30 深圳市龙图光罩股份有限公司 掩模版预校准方法、系统、电子设备以及可读存储介质

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1052546A2 (en) 1999-04-21 2000-11-15 Asm Lithography B.V. Substrate handler for use in lithographic projection apparatus
WO2000068625A1 (en) * 1999-05-11 2000-11-16 Matrix Integrated Systems, Inc. End-effector with integrated cooling mechanism
US6183026B1 (en) 1999-04-07 2001-02-06 Gasonics International Corporation End effector
JP2001076998A (ja) * 1999-09-01 2001-03-23 Canon Inc 基板管理方法及び半導体露光装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4984953A (en) 1987-02-20 1991-01-15 Canon Kabushiki Kaisha Plate-like article conveying system
EP0452041B1 (en) 1990-04-06 1996-11-27 Canon Kabushiki Kaisha Substrate conveying device and method of controlling the same
US5130747A (en) 1990-09-28 1992-07-14 Kabushiki Kaisha Toshiba Carrier apparatus
EP0634787B1 (en) * 1993-07-15 1997-05-02 Applied Materials, Inc. Subsrate tray and ceramic blade for semiconductor processing apparatus
US5980187A (en) 1997-04-16 1999-11-09 Kla-Tencor Corporation Mechanism for transporting semiconductor-process masks
JPH1174182A (ja) * 1997-08-28 1999-03-16 Nikon Corp マスク搬送装置及びマスクステージ
EP1052547A3 (en) * 1999-04-21 2002-07-31 Asm Lithography B.V. Mask-handling apparatus for lithographic projection apparatus
JP4689064B2 (ja) 2000-03-30 2011-05-25 キヤノン株式会社 露光装置およびデバイス製造方法
JP4560182B2 (ja) 2000-07-06 2010-10-13 キヤノン株式会社 減圧処理装置、半導体製造装置およびデバイス製造方法
JP2002050667A (ja) 2000-08-04 2002-02-15 Canon Inc 基板搬送装置、半導体製造装置および半導体デバイス製造方法
US6619903B2 (en) 2001-08-10 2003-09-16 Glenn M. Friedman System and method for reticle protection and transport
US7004715B2 (en) 2002-01-09 2006-02-28 Asml Holding N.V. Apparatus for transferring and loading a reticle with a robotic reticle end-effector

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6183026B1 (en) 1999-04-07 2001-02-06 Gasonics International Corporation End effector
EP1052546A2 (en) 1999-04-21 2000-11-15 Asm Lithography B.V. Substrate handler for use in lithographic projection apparatus
WO2000068625A1 (en) * 1999-05-11 2000-11-16 Matrix Integrated Systems, Inc. End-effector with integrated cooling mechanism
JP2001076998A (ja) * 1999-09-01 2001-03-23 Canon Inc 基板管理方法及び半導体露光装置

Also Published As

Publication number Publication date
CN1295121C (zh) 2007-01-17
US20060182605A1 (en) 2006-08-17
US20030129051A1 (en) 2003-07-10
KR20030080180A (ko) 2003-10-11
US7004715B2 (en) 2006-02-28
EP1327913A2 (en) 2003-07-16
EP1327913A3 (en) 2007-03-21
CN1433940A (zh) 2003-08-06
JP2003243301A (ja) 2003-08-29
US7278817B2 (en) 2007-10-09
TWI283799B (en) 2007-07-11
TW200302955A (en) 2003-08-16
SG102066A1 (en) 2004-02-27

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