KR100886030B1 - 처리 장치 및 덮개의 개폐 기구 - Google Patents

처리 장치 및 덮개의 개폐 기구 Download PDF

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Publication number
KR100886030B1
KR100886030B1 KR1020070023916A KR20070023916A KR100886030B1 KR 100886030 B1 KR100886030 B1 KR 100886030B1 KR 1020070023916 A KR1020070023916 A KR 1020070023916A KR 20070023916 A KR20070023916 A KR 20070023916A KR 100886030 B1 KR100886030 B1 KR 100886030B1
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South Korea
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lid
cover
opening
processing
closing mechanism
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KR1020070023916A
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English (en)
Korean (ko)
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KR20070093350A (ko
Inventor
준 야마시타
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도쿄엘렉트론가부시키가이샤
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
KR1020070023916A 2006-03-13 2007-03-12 처리 장치 및 덮개의 개폐 기구 Expired - Fee Related KR100886030B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006067733A JP4889326B2 (ja) 2006-03-13 2006-03-13 処理装置および蓋体の開閉機構
JPJP-P-2006-00067733 2006-03-13

Publications (2)

Publication Number Publication Date
KR20070093350A KR20070093350A (ko) 2007-09-18
KR100886030B1 true KR100886030B1 (ko) 2009-02-26

Family

ID=38575880

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020070023916A Expired - Fee Related KR100886030B1 (ko) 2006-03-13 2007-03-12 처리 장치 및 덮개의 개폐 기구

Country Status (3)

Country Link
US (1) US7707965B2 (enExample)
JP (1) JP4889326B2 (enExample)
KR (1) KR100886030B1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5196474B2 (ja) * 2008-01-29 2013-05-15 サムコ株式会社 薄膜製造装置
BRPI0907579A2 (pt) * 2008-02-18 2015-07-21 Sharp Kk Montagem de chassi, dispositivo de iluminação, dispositivo de exibição e aparelho receptor de televisão
JP5357486B2 (ja) 2008-09-30 2013-12-04 東京エレクトロン株式会社 プラズマ処理装置
CN102414794B (zh) * 2009-04-21 2015-01-28 应用材料公司 改良膜厚度不均匀性与粒子表现的cvd设备
KR101066033B1 (ko) * 2009-07-28 2011-09-20 엘아이지에이디피 주식회사 화학기상 증착장치 및 기판 처리장치
KR101136728B1 (ko) * 2010-10-18 2012-04-20 주성엔지니어링(주) 기판처리장치와 그의 분해 및 조립방법
US8826857B2 (en) * 2011-11-21 2014-09-09 Lam Research Corporation Plasma processing assemblies including hinge assemblies
US12106934B2 (en) 2017-08-17 2024-10-01 Beijing Naura Microelectronics Equipment Co., Ltd. Liner, reaction chamber and semiconductor processing equipment
JP7360305B2 (ja) * 2019-11-13 2023-10-12 株式会社日立ハイテク 真空処理装置
JP7350907B2 (ja) * 2022-01-24 2023-09-26 株式会社Ｓｃｒｅｅｎホールディングス 処理チャンバおよび基板処理装置
KR102747906B1 (ko) * 2022-12-22 2024-12-31 주식회사 에스에프에이 Oled 증착용 대형 마스크와 캐리어의 탈부착장치

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990030258A (ko) * 1997-09-30 1999-04-26 히가시 데쓰로 진공 처리 장치의 개폐 커버를 지지하기 위한 힌지 장치
KR20050045360A (ko) * 2003-11-11 2005-05-17 주식회사 디엠에스 기판의 진공처리장치

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0369757A (ja) * 1989-08-07 1991-03-26 Mitsuo Kumabe アンテナ取付部付屋根裏換気装置
JP2970891B2 (ja) * 1992-08-08 1999-11-02 東京エレクトロン株式会社 プラズマ装置の真空チャンバー
TW295677B (enExample) * 1994-08-19 1997-01-11 Tokyo Electron Co Ltd
JPH11354457A (ja) * 1998-06-08 1999-12-24 Kokusai Electric Co Ltd 半導体基板処理装置
WO2000045425A1 (en) * 1999-02-01 2000-08-03 Tokyo Electron Limited Etching system and etching chamber
JP2004055614A (ja) * 2002-07-16 2004-02-19 Tokyo Electron Ltd プラズマ処理装置
JP2004293649A (ja) * 2003-03-26 2004-10-21 Ts Corporation 蓋の開閉装置
JP4550554B2 (ja) * 2004-11-11 2010-09-22 株式会社日立ハイテクノロジーズ 試料処理装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990030258A (ko) * 1997-09-30 1999-04-26 히가시 데쓰로 진공 처리 장치의 개폐 커버를 지지하기 위한 힌지 장치
KR20050045360A (ko) * 2003-11-11 2005-05-17 주식회사 디엠에스 기판의 진공처리장치

Also Published As

Publication number Publication date
US7707965B2 (en) 2010-05-04
JP4889326B2 (ja) 2012-03-07
KR20070093350A (ko) 2007-09-18
US20070238307A1 (en) 2007-10-11
JP2007250568A (ja) 2007-09-27

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