KR100884161B1 - 냉각 수단을 구비한 진공 장치 - Google Patents

냉각 수단을 구비한 진공 장치 Download PDF

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Publication number
KR100884161B1
KR100884161B1 KR1020067022051A KR20067022051A KR100884161B1 KR 100884161 B1 KR100884161 B1 KR 100884161B1 KR 1020067022051 A KR1020067022051 A KR 1020067022051A KR 20067022051 A KR20067022051 A KR 20067022051A KR 100884161 B1 KR100884161 B1 KR 100884161B1
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KR
South Korea
Prior art keywords
refrigerant
path
coolant
cooling
vacuum chamber
Prior art date
Application number
KR1020067022051A
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English (en)
Korean (ko)
Other versions
KR20070012424A (ko
Inventor
마사유키 타키모토
유타카 후세
타츠미 아베
히로유키 코무로
카즈히토 아오나하타
Original Assignee
가부시키가이샤 쇼와 신쿠
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 가부시키가이샤 쇼와 신쿠 filed Critical 가부시키가이샤 쇼와 신쿠
Publication of KR20070012424A publication Critical patent/KR20070012424A/ko
Application granted granted Critical
Publication of KR100884161B1 publication Critical patent/KR100884161B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25D—REFRIGERATORS; COLD ROOMS; ICE-BOXES; COOLING OR FREEZING APPARATUS NOT OTHERWISE PROVIDED FOR
    • F25D23/00—General constructional features
    • F25D23/06—Walls
    • F25D23/061—Walls with conduit means

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Combustion & Propulsion (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Physical Vapour Deposition (AREA)
KR1020067022051A 2004-05-14 2005-01-24 냉각 수단을 구비한 진공 장치 KR100884161B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2004-00144538 2004-05-14
JP2004144538A JP4016071B2 (ja) 2004-05-14 2004-05-14 冷却手段を備えた装置及び冷却方法

Publications (2)

Publication Number Publication Date
KR20070012424A KR20070012424A (ko) 2007-01-25
KR100884161B1 true KR100884161B1 (ko) 2009-02-17

Family

ID=35394172

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020067022051A KR100884161B1 (ko) 2004-05-14 2005-01-24 냉각 수단을 구비한 진공 장치

Country Status (4)

Country Link
JP (1) JP4016071B2 (zh)
KR (1) KR100884161B1 (zh)
CN (1) CN1946871B (zh)
WO (1) WO2005111258A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2234463A1 (en) * 2007-12-27 2010-09-29 Sharp Kabushiki Kaisha Plasma treatment apparatus, heating device for the plasma treatment apparatus, and plasma treatment method
CN103132027A (zh) * 2011-11-28 2013-06-05 鸿富锦精密工业（深圳）有限公司 真空镀膜设备
CN108385065A (zh) * 2018-05-23 2018-08-10 北京铂阳顶荣光伏科技有限公司 一种带有蒸发源的设备及安全控制方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03179742A (ja) * 1989-12-07 1991-08-05 Toshiba Corp 酸化珪素成膜方法
KR19990069535A (ko) * 1998-02-10 1999-09-06 서성기 박막 증착 장치
JP2000310694A (ja) * 1999-04-27 2000-11-07 Ishikawajima Harima Heavy Ind Co Ltd 原子炉圧力容器アクセスホールカバーの吊り耳切断用放電加工電極
KR20020086761A (ko) * 2001-05-10 2002-11-20 주식회사 엘지이아이 냉각수단을 구비한 고분자막 연속증착장비

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10256038A1 (de) * 2002-11-30 2004-06-17 Applied Films Gmbh & Co. Kg Bedampfungsvorrichtung

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03179742A (ja) * 1989-12-07 1991-08-05 Toshiba Corp 酸化珪素成膜方法
KR19990069535A (ko) * 1998-02-10 1999-09-06 서성기 박막 증착 장치
JP2000310694A (ja) * 1999-04-27 2000-11-07 Ishikawajima Harima Heavy Ind Co Ltd 原子炉圧力容器アクセスホールカバーの吊り耳切断用放電加工電極
KR20020086761A (ko) * 2001-05-10 2002-11-20 주식회사 엘지이아이 냉각수단을 구비한 고분자막 연속증착장비

Also Published As

Publication number Publication date
CN1946871A (zh) 2007-04-11
CN1946871B (zh) 2012-06-20
KR20070012424A (ko) 2007-01-25
JP2005325410A (ja) 2005-11-24
JP4016071B2 (ja) 2007-12-05
WO2005111258A1 (ja) 2005-11-24

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