KR100873099B1 - 처리장치 - Google Patents

처리장치 Download PDF

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Publication number
KR100873099B1
KR100873099B1 KR1020020011973A KR20020011973A KR100873099B1 KR 100873099 B1 KR100873099 B1 KR 100873099B1 KR 1020020011973 A KR1020020011973 A KR 1020020011973A KR 20020011973 A KR20020011973 A KR 20020011973A KR 100873099 B1 KR100873099 B1 KR 100873099B1
Authority
KR
South Korea
Prior art keywords
substrate
processed
processing unit
thermal processing
conveying
Prior art date
Application number
KR1020020011973A
Other languages
English (en)
Korean (ko)
Other versions
KR20020072202A (ko
Inventor
모토다키미오
사카이미쯔히로
Original Assignee
도쿄엘렉트론가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 도쿄엘렉트론가부시키가이샤 filed Critical 도쿄엘렉트론가부시키가이샤
Publication of KR20020072202A publication Critical patent/KR20020072202A/ko
Application granted granted Critical
Publication of KR100873099B1 publication Critical patent/KR100873099B1/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
    • H01L21/67225—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process comprising at least one lithography chamber
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67742—Mechanical parts of transfer devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Robotics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Photolithography (AREA)
  • Coating Apparatus (AREA)
KR1020020011973A 2001-03-09 2002-03-06 처리장치 KR100873099B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001066020 2001-03-09
JPJP-P-2001-00066020 2001-03-09

Publications (2)

Publication Number Publication Date
KR20020072202A KR20020072202A (ko) 2002-09-14
KR100873099B1 true KR100873099B1 (ko) 2008-12-09

Family

ID=28786074

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020020011973A KR100873099B1 (ko) 2001-03-09 2002-03-06 처리장치

Country Status (3)

Country Link
JP (3) JP4813540B2 (ja)
KR (1) KR100873099B1 (ja)
TW (1) TW533460B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230130525A (ko) * 2022-03-03 2023-09-12 가부시키가이샤 스크린 홀딩스 기판 처리 장치 및 기판 처리 방법

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100808374B1 (ko) * 2003-12-27 2008-02-27 동부일렉트로닉스 주식회사 반도체 제조설비의 포토레지스트 경화장치

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07297258A (ja) * 1994-04-26 1995-11-10 Tokyo Electron Ltd 板状体の搬送装置
JPH11260883A (ja) * 1998-03-09 1999-09-24 Dainippon Screen Mfg Co Ltd 基板処理装置
JPH11274265A (ja) * 1998-03-26 1999-10-08 Dainippon Screen Mfg Co Ltd 基板処理装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1031316A (ja) * 1996-07-17 1998-02-03 Dainippon Screen Mfg Co Ltd 基板処理装置
JP3249755B2 (ja) * 1996-12-24 2002-01-21 シャープ株式会社 気相成長方法及びこれに用いられるウエハー搬送装置
JP3928902B2 (ja) * 1998-02-20 2007-06-13 平田機工株式会社 基板製造ラインおよび基板製造方法
JP2000031239A (ja) * 1998-07-13 2000-01-28 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2000294616A (ja) * 1999-04-06 2000-10-20 Ebara Corp 仮置台付位置合わせ機構及びポリッシング装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07297258A (ja) * 1994-04-26 1995-11-10 Tokyo Electron Ltd 板状体の搬送装置
KR950034476A (ko) * 1994-04-26 1995-12-28 이노우에 아키라 피처리체의 처리장치
JPH11260883A (ja) * 1998-03-09 1999-09-24 Dainippon Screen Mfg Co Ltd 基板処理装置
JPH11274265A (ja) * 1998-03-26 1999-10-08 Dainippon Screen Mfg Co Ltd 基板処理装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230130525A (ko) * 2022-03-03 2023-09-12 가부시키가이샤 스크린 홀딩스 기판 처리 장치 및 기판 처리 방법
KR102627210B1 (ko) 2022-03-03 2024-01-19 가부시키가이샤 스크린 홀딩스 기판 처리 장치 및 기판 처리 방법

Also Published As

Publication number Publication date
JP5063817B2 (ja) 2012-10-31
JP2009062199A (ja) 2009-03-26
KR20020072202A (ko) 2002-09-14
JP2011187987A (ja) 2011-09-22
JP2012094908A (ja) 2012-05-17
TW533460B (en) 2003-05-21
JP4813540B2 (ja) 2011-11-09

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