KR100865183B1 - 반도체 소자, 잉크 제트 헤드용 기판 및 이의 제조 방법 - Google Patents

반도체 소자, 잉크 제트 헤드용 기판 및 이의 제조 방법 Download PDF

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Publication number
KR100865183B1
KR100865183B1 KR1020060009253A KR20060009253A KR100865183B1 KR 100865183 B1 KR100865183 B1 KR 100865183B1 KR 1020060009253 A KR1020060009253 A KR 1020060009253A KR 20060009253 A KR20060009253 A KR 20060009253A KR 100865183 B1 KR100865183 B1 KR 100865183B1
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South Korea
Prior art keywords
semiconductor device
electrode
silicon substrate
forming
ink jet
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Expired - Fee Related
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KR1020060009253A
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English (en)
Korean (ko)
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KR20060088068A (ko
Inventor
사또시 이베
데루오 오자끼
이찌로 사이또
사까이 요꼬야마
겐지 오노
가즈아끼 시바따
도시야스 사까이
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캐논 가부시끼가이샤
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Publication of KR20060088068A publication Critical patent/KR20060088068A/ko
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Publication of KR100865183B1 publication Critical patent/KR100865183B1/ko
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1601—Production of bubble jet print heads
    • B41J2/1603—Production of bubble jet print heads of the front shooter type
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B43—WRITING OR DRAWING IMPLEMENTS; BUREAU ACCESSORIES
    • B43L—ARTICLES FOR WRITING OR DRAWING UPON; WRITING OR DRAWING AIDS; ACCESSORIES FOR WRITING OR DRAWING
    • B43L7/00—Straightedges
    • B43L7/005—Straightedges combined with other drawing aids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B26—HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26B—HAND-HELD CUTTING TOOLS NOT OTHERWISE PROVIDED FOR
    • B26B29/00—Guards or sheaths or guides for hand cutting tools; Arrangements for guiding hand cutting tools
    • B26B29/06—Arrangements for guiding hand cutting tools
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/14—Structure thereof only for on-demand ink jet heads
    • B41J2/14016—Structure of bubble jet print heads
    • B41J2/14072—Electrical connections, e.g. details on electrodes, connecting the chip to the outside...
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/1626—Manufacturing processes etching
    • B41J2/1628—Manufacturing processes etching dry etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/1626—Manufacturing processes etching
    • B41J2/1629—Manufacturing processes etching wet etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/1631—Manufacturing processes photolithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/1632—Manufacturing processes machining
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/164—Manufacturing processes thin film formation
    • B41J2/1643—Manufacturing processes thin film formation thin film formation by plating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/164—Manufacturing processes thin film formation
    • B41J2/1646—Manufacturing processes thin film formation thin film formation by sputtering
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B43—WRITING OR DRAWING IMPLEMENTS; BUREAU ACCESSORIES
    • B43L—ARTICLES FOR WRITING OR DRAWING UPON; WRITING OR DRAWING AIDS; ACCESSORIES FOR WRITING OR DRAWING
    • B43L13/00—Drawing instruments, or writing or drawing appliances or accessories not otherwise provided for
    • B43L13/20—Curve rulers or templets
    • B43L13/201—Stencils for drawing figures, objects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02—Bonding areas ; Manufacturing methods related thereto
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    • H01—ELECTRIC ELEMENTS
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    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02—Bonding areas ; Manufacturing methods related thereto
    • H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L24/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02—Bonding areas; Manufacturing methods related thereto
    • H01L2224/023—Redistribution layers [RDL] for bonding areas
    • H01L2224/0237—Disposition of the redistribution layers
    • H01L2224/02371—Disposition of the redistribution layers connecting the bonding area on a surface of the semiconductor or solid-state body with another surface of the semiconductor or solid-state body
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
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    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02—Bonding areas; Manufacturing methods related thereto
    • H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/04042—Bonding areas specifically adapted for wire connectors, e.g. wirebond pads
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02—Bonding areas; Manufacturing methods related thereto
    • H01L2224/07—Structure, shape, material or disposition of the bonding areas after the connecting process
    • H01L2224/08—Structure, shape, material or disposition of the bonding areas after the connecting process of an individual bonding area
    • H01L2224/081—Disposition
    • H01L2224/0812—Disposition the bonding area connecting directly to another bonding area, i.e. connectorless bonding, e.g. bumpless bonding
    • H01L2224/08135—Disposition the bonding area connecting directly to another bonding area, i.e. connectorless bonding, e.g. bumpless bonding the bonding area connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/08137—Disposition the bonding area connecting directly to another bonding area, i.e. connectorless bonding, e.g. bumpless bonding the bonding area connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
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    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10—Bump connectors; Manufacturing methods related thereto
    • H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161—Disposition
    • H01L2224/16135—Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/16137—Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001—Core members of the connector
    • H01L2224/45099—Material
    • H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45117—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
    • H01L2224/45124—Aluminium (Al) as principal constituent
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484—Connecting portions
    • H01L2224/4847—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/85909—Post-treatment of the connector or wire bonding area
    • H01L2224/8592—Applying permanent coating, e.g. protective coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10—Details of semiconductor or other solid state devices to be connected
    • H01L2924/102—Material of the semiconductor or solid state bodies
    • H01L2924/1025—Semiconducting materials
    • H01L2924/10251—Elemental semiconductors, i.e. Group IV
    • H01L2924/10253—Silicon [Si]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155—Manufacturing circuit on or in base
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49401—Fluid pattern dispersing device making, e.g., ink jet
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
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    • Y10T29/49789—Obtaining plural product pieces from unitary workpiece
    • Y10T29/49798—Dividing sequentially from leading end, e.g., by cutting or breaking

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Forests & Forestry (AREA)
  • Mechanical Engineering (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
KR1020060009253A 2005-01-31 2006-01-31 반도체 소자, 잉크 제트 헤드용 기판 및 이의 제조 방법 Expired - Fee Related KR100865183B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005023716A JP4630680B2 (ja) 2005-01-31 2005-01-31 半導体素子の製造方法およびインクジェット記録ヘッドの製造方法
JPJP-P-2005-00023716 2005-01-31

Publications (2)

Publication Number Publication Date
KR20060088068A KR20060088068A (ko) 2006-08-03
KR100865183B1 true KR100865183B1 (ko) 2008-10-23

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KR1020060009253A Expired - Fee Related KR100865183B1 (ko) 2005-01-31 2006-01-31 반도체 소자, 잉크 제트 헤드용 기판 및 이의 제조 방법

Country Status (3)

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US (1) US7591071B2 (enExample)
JP (1) JP4630680B2 (enExample)
KR (1) KR100865183B1 (enExample)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4137027B2 (ja) * 2004-08-16 2008-08-20 キヤノン株式会社 インクジェットヘッド用基板、該基板の製造方法および前記基板を用いるインクジェットヘッド
JP4182035B2 (ja) * 2004-08-16 2008-11-19 キヤノン株式会社 インクジェットヘッド用基板、該基板の製造方法および前記基板を用いるインクジェットヘッド
US8142678B2 (en) * 2005-08-23 2012-03-27 Canon Kabushiki Kaisha Perovskite type oxide material, piezoelectric element, liquid discharge head and liquid discharge apparatus using the same, and method of producing perovskite type oxide material
US8438729B2 (en) * 2006-03-09 2013-05-14 Canon Kabushiki Kaisha Method of producing liquid discharge head
US8267503B2 (en) * 2006-10-16 2012-09-18 Canon Kabushiki Kaisha Ink jet recording head and manufacturing method therefor
JP5008448B2 (ja) 2007-04-20 2012-08-22 キヤノン株式会社 インクジェット記録ヘッド用の基板の製造方法
JP5355223B2 (ja) * 2008-06-17 2013-11-27 キヤノン株式会社 液体吐出ヘッド
US8152279B2 (en) * 2008-06-18 2012-04-10 Canon Kabushiki Kaisha Liquid ejection head having substrate with nickel-containing layer
US8291576B2 (en) * 2008-06-18 2012-10-23 Canon Kabushiki Kaisha Method of manufacturing liquid ejection head
JP2010000632A (ja) * 2008-06-18 2010-01-07 Canon Inc インクジェットヘッド用基板および該基板を具えるインクジェットヘッド
JP5312202B2 (ja) * 2008-06-20 2013-10-09 キヤノン株式会社 液体吐出ヘッド及びその製造方法
DE102011101035B4 (de) * 2011-05-10 2014-07-10 Infineon Technologies Ag Ein Verfahren zum Herstelllen eines Anschlussgebiets an einer Seitenwand eines Halbleiterkörpers
JP6066612B2 (ja) * 2012-08-06 2017-01-25 キヤノン株式会社 液体吐出ヘッド及びその製造方法
JP6175798B2 (ja) * 2013-02-25 2017-08-09 ブラザー工業株式会社 液体吐出装置及びフレキシブル配線基板の接続方法
US9308728B2 (en) 2013-05-31 2016-04-12 Stmicroelectronics, Inc. Method of making inkjet print heads having inkjet chambers and orifices formed in a wafer and related devices
JP6296720B2 (ja) 2013-07-29 2018-03-20 キヤノン株式会社 液体吐出ヘッド、液体吐出ヘッド用基板及び記録装置
JP6218517B2 (ja) * 2013-09-09 2017-10-25 キヤノン株式会社 液体吐出ヘッドの製造方法
JP2015080918A (ja) 2013-10-23 2015-04-27 キヤノン株式会社 液体吐出ヘッドおよび該液体吐出ヘッドの製造方法
JP6516613B2 (ja) * 2015-07-24 2019-05-22 キヤノン株式会社 液体吐出ヘッド用基板および液体吐出ヘッド用基板の製造方法
JP2018122554A (ja) * 2017-02-03 2018-08-09 エスアイアイ・プリンテック株式会社 部材、液体噴射ヘッドチップ、液体噴射ヘッド、液体噴射装置および切断方法
US10290512B2 (en) 2017-05-17 2019-05-14 Nanya Technology Corporation Semiconductor structure having bump on tilting upper corner surface
JP7163134B2 (ja) 2018-10-18 2022-10-31 キヤノン株式会社 液体吐出ヘッド、液体吐出ヘッドの製造方法および液体吐出装置
JP7305383B2 (ja) * 2019-03-15 2023-07-10 キヤノン株式会社 液体吐出ヘッドおよびその製造方法
JP7520622B2 (ja) 2020-07-31 2024-07-23 キヤノン株式会社 液体吐出ヘッドおよびその製造方法
JP7621856B2 (ja) * 2021-03-26 2025-01-27 キヤノン株式会社 液体吐出ヘッド、素子基板及びその製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05283271A (ja) * 1992-03-31 1993-10-29 Sumitomo Metal Ind Ltd チップ型半導体磁器部品及びその製造方法
US6443563B1 (en) 1998-10-27 2002-09-03 Canon Kabushiki Kaisha Electro-thermal conversion device board, ink-jet recording head provided with the electro-thermal conversion device board, ink-jet recording apparatus using the same, and production method of ink-jet recording head
US6513911B1 (en) 1999-06-04 2003-02-04 Canon Kabushiki Kaisha Micro-electromechanical device, liquid discharge head, and method of manufacture therefor

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63242653A (ja) * 1987-03-31 1988-10-07 Sony Corp サ−マルヘツド
JPH01175248A (ja) * 1987-12-28 1989-07-11 Sharp Corp 半導体チップ
US5081474A (en) 1988-07-04 1992-01-14 Canon Kabushiki Kaisha Recording head having multi-layer matrix wiring
JP2751242B2 (ja) * 1988-09-28 1998-05-18 日本電気株式会社 半導体装置の製造方法
ATE144193T1 (de) 1990-12-12 1996-11-15 Canon Kk Tintenstrahlaufzeichnung
JPH05175354A (ja) * 1991-12-20 1993-07-13 Sony Corp 半導体素子構造
JP2809115B2 (ja) * 1993-10-13 1998-10-08 ヤマハ株式会社 半導体装置とその製造方法
JP3169842B2 (ja) * 1996-10-07 2001-05-28 セイコーインスツルメンツ株式会社 サーマルヘッドおよびその製造方法
JP2000043271A (ja) 1997-11-14 2000-02-15 Canon Inc インクジェット記録ヘッド、その製造方法及び該インクジェット記録ヘッドを具備する記録装置
JP3415789B2 (ja) 1999-06-10 2003-06-09 松下電器産業株式会社 インクジェットヘッド及びインクジェットプリンタ
US6497477B1 (en) 1998-11-04 2002-12-24 Matsushita Electric Industrial Co., Ltd. Ink-jet head mounted with a driver IC, method for manufacturing thereof and ink-jet printer having the same
US6402302B1 (en) 1999-06-04 2002-06-11 Canon Kabushiki Kaisha Liquid discharge head, manufacturing method thereof, and microelectromechanical device
JP2001138521A (ja) 1999-11-11 2001-05-22 Canon Inc インクジェット記録ヘッドおよび該記録ヘッドを用いたインクジェット記録装置
JP3970016B2 (ja) * 2000-12-28 2007-09-05 キヤノン株式会社 インクジェット記録ヘッド及びインクジェット記録装置
JP3804011B2 (ja) * 2001-01-26 2006-08-02 富士写真フイルム株式会社 半導体デバイスの製造方法
JP4554831B2 (ja) * 2001-02-13 2010-09-29 ローム株式会社 個片基板の製造方法および個片基板並びに集合基板
US7340181B1 (en) * 2002-05-13 2008-03-04 National Semiconductor Corporation Electrical die contact structure and fabrication method
KR100452850B1 (ko) * 2002-10-17 2004-10-14 삼성전자주식회사 잉크젯 프린터의 프린트 헤드 및 그 제조방법
JP2004221372A (ja) * 2003-01-16 2004-08-05 Seiko Epson Corp 半導体装置、半導体モジュール、電子機器、半導体装置の製造方法および半導体モジュールの製造方法
JP4137027B2 (ja) 2004-08-16 2008-08-20 キヤノン株式会社 インクジェットヘッド用基板、該基板の製造方法および前記基板を用いるインクジェットヘッド
US8438729B2 (en) 2006-03-09 2013-05-14 Canon Kabushiki Kaisha Method of producing liquid discharge head

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05283271A (ja) * 1992-03-31 1993-10-29 Sumitomo Metal Ind Ltd チップ型半導体磁器部品及びその製造方法
US6443563B1 (en) 1998-10-27 2002-09-03 Canon Kabushiki Kaisha Electro-thermal conversion device board, ink-jet recording head provided with the electro-thermal conversion device board, ink-jet recording apparatus using the same, and production method of ink-jet recording head
US6513911B1 (en) 1999-06-04 2003-02-04 Canon Kabushiki Kaisha Micro-electromechanical device, liquid discharge head, and method of manufacture therefor

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