KR100827342B1 - 좌표 검출 장치 및 피검체 검사 장치 - Google Patents

좌표 검출 장치 및 피검체 검사 장치 Download PDF

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Publication number
KR100827342B1
KR100827342B1 KR1020060004448A KR20060004448A KR100827342B1 KR 100827342 B1 KR100827342 B1 KR 100827342B1 KR 1020060004448 A KR1020060004448 A KR 1020060004448A KR 20060004448 A KR20060004448 A KR 20060004448A KR 100827342 B1 KR100827342 B1 KR 100827342B1
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South Korea
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subject
spot light
guide member
coordinate
glass substrate
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Expired - Fee Related
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KR1020060004448A
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English (en)
Korean (ko)
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KR20060083890A (ko
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히로시 가토
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올림푸스 가부시키가이샤
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854—Grading and classifying of flaws
    • G01N2021/8861—Determining coordinates of flaws
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N2021/9513—Liquid crystal panels
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/061—Sources
    • G01N2201/06113—Coherent sources; lasers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/40—Imaging
    • G01N2223/417—Imaging recording with co-ordinate markings

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
KR1020060004448A 2005-01-18 2006-01-16 좌표 검출 장치 및 피검체 검사 장치 Expired - Fee Related KR100827342B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005010239A JP4653500B2 (ja) 2005-01-18 2005-01-18 座標検出装置及び被検体検査装置
JPJP-P-2005-00010239 2005-01-18

Publications (2)

Publication Number Publication Date
KR20060083890A KR20060083890A (ko) 2006-07-21
KR100827342B1 true KR100827342B1 (ko) 2008-05-06

Family

ID=36840076

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020060004448A Expired - Fee Related KR100827342B1 (ko) 2005-01-18 2006-01-16 좌표 검출 장치 및 피검체 검사 장치

Country Status (4)

Country Link
JP (1) JP4653500B2 (https=)
KR (1) KR100827342B1 (https=)
CN (1) CN100516771C (https=)
TW (1) TWI342967B (https=)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4517354B2 (ja) * 2004-11-08 2010-08-04 株式会社ニコン 露光装置及びデバイス製造方法
CN101446699B (zh) * 2008-12-30 2010-06-02 友达光电股份有限公司 检测装置与用于此检测装置的检测方法
TWI474068B (zh) * 2010-05-05 2015-02-21 Hon Hai Prec Ind Co Ltd 位移量測裝置
CN102253506B (zh) * 2010-05-21 2019-05-14 京东方科技集团股份有限公司 液晶显示基板的制造方法及检测修补设备
US8854616B2 (en) 2011-08-03 2014-10-07 Shenzhen China Star Optoelectronics Technology Co., Ltd. Visual inspection apparatus for glass substrate of liquid crystal display and inspection method thereof
CN102393576A (zh) * 2011-08-03 2012-03-28 深圳市华星光电技术有限公司 液晶显示器中玻璃基板的目视检查机及检查方法
CN102927928B (zh) * 2012-10-30 2016-08-17 三峡大学 固形物上端面扫描仪及扫描方法
CN103075970B (zh) * 2012-12-27 2015-07-01 深圳市华星光电技术有限公司 测长装置直交度补偿方法及使用该方法的测长装置
US9080865B2 (en) 2012-12-27 2015-07-14 Shenzhen China Star Optoelectronics Technology Co., Ltd Orthogonality compensation method for length measurement device and length measurement device using same
KR101751801B1 (ko) * 2016-05-18 2017-06-29 한국기계연구원 기판 결함 검사 장치 및 이를 이용한 검사 방법
JP2018059830A (ja) * 2016-10-06 2018-04-12 川崎重工業株式会社 外観検査方法
CN106770355A (zh) * 2016-12-09 2017-05-31 武汉华星光电技术有限公司 一种cf涂布机的异物检测装置及方法、cf涂布机
CN106773189A (zh) * 2017-03-27 2017-05-31 武汉华星光电技术有限公司 宏观自动检查机及提升显示异常区域量测效率的方法
CN107014826A (zh) * 2017-04-12 2017-08-04 武汉华星光电技术有限公司 Cf基板微观检查机
CN108613990A (zh) * 2018-07-13 2018-10-02 江苏东旭亿泰智能装备有限公司 一种微观和宏观复合检查机
CN109141303B (zh) * 2018-08-14 2020-06-19 哈尔滨工业大学 一种构件几何缺陷检测系统及检测方法
CN114858821A (zh) * 2022-04-11 2022-08-05 彩虹（合肥）液晶玻璃有限公司 一种玻璃的检修方法及设备
CN116223376A (zh) * 2023-02-20 2023-06-06 彩虹（合肥）液晶玻璃有限公司 一种玻璃基板复检装置
CN116448371B (zh) * 2023-06-16 2023-08-25 苗疆(武汉)机器人科技有限公司 一种工业机器人多角度检测装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10206121A (ja) 1997-01-23 1998-08-07 Laser Tec Kk Ｘｙステージの回動検出装置
JPH1134299A (ja) * 1997-07-18 1999-02-09 Shinohara Tekkosho:Kk 見当マークの検出方法
JP2002082067A (ja) 2000-09-05 2002-03-22 Olympus Optical Co Ltd 基板検査装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01201144A (ja) * 1988-02-05 1989-08-14 Nikon Corp 散乱光検出装置
JP3190406B2 (ja) * 1992-02-18 2001-07-23 オリンパス光学工業株式会社 欠陥検査装置
JP2000266511A (ja) * 1999-03-19 2000-09-29 Olympus Optical Co Ltd 検査装置
JP2002267620A (ja) * 2001-03-09 2002-09-18 Hitachi Kokusai Electric Inc 板状物体目視検査装置
JP4690584B2 (ja) * 2001-06-06 2011-06-01 有限会社ユナテック 表面評価装置及び表面評価方法
JP2003002934A (ja) * 2001-06-25 2003-01-08 Toagosei Co Ltd 水性樹脂分散体及びその製造方法並びに用途
JP4347028B2 (ja) * 2003-12-01 2009-10-21 株式会社日立国際電気 目視検査装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10206121A (ja) 1997-01-23 1998-08-07 Laser Tec Kk Ｘｙステージの回動検出装置
JPH1134299A (ja) * 1997-07-18 1999-02-09 Shinohara Tekkosho:Kk 見当マークの検出方法
JP2002082067A (ja) 2000-09-05 2002-03-22 Olympus Optical Co Ltd 基板検査装置

Also Published As

Publication number Publication date
CN100516771C (zh) 2009-07-22
KR20060083890A (ko) 2006-07-21
JP2006200917A (ja) 2006-08-03
TW200628902A (en) 2006-08-16
CN1808055A (zh) 2006-07-26
TWI342967B (en) 2011-06-01
JP4653500B2 (ja) 2011-03-16

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