KR100816319B1 - 레지스트 희석 시스템 - Google Patents

레지스트 희석 시스템 Download PDF

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Publication number
KR100816319B1
KR100816319B1 KR1020060098803A KR20060098803A KR100816319B1 KR 100816319 B1 KR100816319 B1 KR 100816319B1 KR 1020060098803 A KR1020060098803 A KR 1020060098803A KR 20060098803 A KR20060098803 A KR 20060098803A KR 100816319 B1 KR100816319 B1 KR 100816319B1
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KR
South Korea
Prior art keywords
liquid
resist
high viscosity
piping
dilution
Prior art date
Application number
KR1020060098803A
Other languages
English (en)
Korean (ko)
Other versions
KR20070053100A (ko
Inventor
기미타카 모리오
도루 하세가와
에이지 무로부시
Original Assignee
도오꾜오까고오교 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 도오꾜오까고오교 가부시끼가이샤 filed Critical 도오꾜오까고오교 가부시끼가이샤
Publication of KR20070053100A publication Critical patent/KR20070053100A/ko
Application granted granted Critical
Publication of KR100816319B1 publication Critical patent/KR100816319B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
  • Materials For Photolithography (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR1020060098803A 2005-11-18 2006-10-11 레지스트 희석 시스템 KR100816319B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005333617A JP4901191B2 (ja) 2005-11-18 2005-11-18 レジスト希釈システム
JPJP-P-2005-00333617 2005-11-18

Publications (2)

Publication Number Publication Date
KR20070053100A KR20070053100A (ko) 2007-05-23
KR100816319B1 true KR100816319B1 (ko) 2008-03-24

Family

ID=38076213

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020060098803A KR100816319B1 (ko) 2005-11-18 2006-10-11 레지스트 희석 시스템

Country Status (4)

Country Link
JP (1) JP4901191B2 (zh)
KR (1) KR100816319B1 (zh)
CN (1) CN100552547C (zh)
TW (1) TW200719980A (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4923882B2 (ja) * 2006-09-07 2012-04-25 三菱化学エンジニアリング株式会社 フォトレジスト供給装置およびフォトレジスト供給方法
KR101506654B1 (ko) * 2007-12-20 2015-03-27 레이브 엔.피., 인크. 노즐용 유체 분사 조립체
WO2009133621A1 (ja) * 2008-05-01 2009-11-05 長瀬産業株式会社 レジスト液希釈装置、及び、レジスト液希釈方法
CN102989629A (zh) * 2012-10-30 2013-03-27 茅惠杰 改进的中性电极喷胶装置
JP6237511B2 (ja) * 2014-07-11 2017-11-29 東京エレクトロン株式会社 薬液排出機構、液処理装置、薬液排出方法、記憶媒体
CN106179867B (zh) * 2016-09-07 2019-05-21 武汉华星光电技术有限公司 防静电液涂覆系统
JP6291676B2 (ja) * 2017-05-16 2018-03-14 東京エレクトロン株式会社 薬液排出機構、液処理装置、薬液排出方法、記憶媒体

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19980064625A (ko) * 1996-12-25 1998-10-07 히가시데쓰로 도포장치
KR19980070955A (ko) * 1997-01-31 1998-10-26 히가시데쓰로 도포장치 및 도포방법
KR20010095105A (ko) * 2000-03-31 2001-11-03 히가시 데쓰로 도포장치 및 혼합장치

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4605146A (en) * 1985-02-15 1986-08-12 E. I. Du Pont De Nemours And Company Hydrostatic film support
JPH0443630A (ja) * 1990-06-11 1992-02-13 Nec Corp 半導体製造装置
JPH0929158A (ja) * 1995-07-18 1997-02-04 Dainippon Screen Mfg Co Ltd 回転式塗布装置
JP2001176776A (ja) * 1999-12-16 2001-06-29 Toshiba Corp 塗布膜形成装置
JP3813118B2 (ja) * 2002-10-15 2006-08-23 沖電気工業株式会社 レジスト処理方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19980064625A (ko) * 1996-12-25 1998-10-07 히가시데쓰로 도포장치
KR19980070955A (ko) * 1997-01-31 1998-10-26 히가시데쓰로 도포장치 및 도포방법
KR20010095105A (ko) * 2000-03-31 2001-11-03 히가시 데쓰로 도포장치 및 혼합장치

Also Published As

Publication number Publication date
TWI311078B (zh) 2009-06-21
JP2007142133A (ja) 2007-06-07
JP4901191B2 (ja) 2012-03-21
TW200719980A (en) 2007-06-01
CN1967385A (zh) 2007-05-23
CN100552547C (zh) 2009-10-21
KR20070053100A (ko) 2007-05-23

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