KR100814320B1 - 스퍼터링 타겟의 제조방법 - Google Patents

스퍼터링 타겟의 제조방법 Download PDF

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Publication number
KR100814320B1
KR100814320B1 KR1020060058442A KR20060058442A KR100814320B1 KR 100814320 B1 KR100814320 B1 KR 100814320B1 KR 1020060058442 A KR1020060058442 A KR 1020060058442A KR 20060058442 A KR20060058442 A KR 20060058442A KR 100814320 B1 KR100814320 B1 KR 100814320B1
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KR
South Korea
Prior art keywords
sputtering target
powder
indium oxide
calcined
oxide powder
Prior art date
Application number
KR1020060058442A
Other languages
English (en)
Korean (ko)
Other versions
KR20070001811A (ko
Inventor
세이이치로 다카하시
히로시 와타나베
Original Assignee
미츠이 긴조쿠 고교 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 미츠이 긴조쿠 고교 가부시키가이샤 filed Critical 미츠이 긴조쿠 고교 가부시키가이샤
Publication of KR20070001811A publication Critical patent/KR20070001811A/ko
Application granted granted Critical
Publication of KR100814320B1 publication Critical patent/KR100814320B1/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
    • C04B35/457—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates based on tin oxides or stannates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3286—Gallium oxides, gallates, indium oxides, indates, thallium oxides, thallates or oxide forming salts thereof, e.g. zinc gallate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Manufacturing & Machinery (AREA)
  • Structural Engineering (AREA)
  • Physical Vapour Deposition (AREA)
  • Compositions Of Oxide Ceramics (AREA)
KR1020060058442A 2005-06-29 2006-06-28 스퍼터링 타겟의 제조방법 KR100814320B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2005-00190805 2005-06-29
JP2005190805A JP2007009268A (ja) 2005-06-29 2005-06-29 スパッタリングターゲットの製造方法

Publications (2)

Publication Number Publication Date
KR20070001811A KR20070001811A (ko) 2007-01-04
KR100814320B1 true KR100814320B1 (ko) 2008-03-18

Family

ID=37596896

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020060058442A KR100814320B1 (ko) 2005-06-29 2006-06-28 스퍼터링 타겟의 제조방법

Country Status (4)

Country Link
JP (1) JP2007009268A (ja)
KR (1) KR100814320B1 (ja)
CN (1) CN100513354C (ja)
TW (1) TWI306124B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101568215B1 (ko) * 2009-08-07 2015-11-11 스미토모 긴조쿠 고잔 가부시키가이샤 증착용 타블렛의 제조 방법

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012052227A (ja) * 2010-08-05 2012-03-15 Mitsubishi Materials Corp スパッタリングターゲットの製造方法およびスパッタリングターゲット
JP6359901B2 (ja) * 2014-07-16 2018-07-18 三菱マテリアル株式会社 スパッタリングターゲット
CN116332637A (zh) * 2023-02-14 2023-06-27 芜湖映日科技股份有限公司 一种制备太阳能电池行业ito旋转靶材的方法
CN116496081A (zh) * 2023-04-17 2023-07-28 湘潭大学 一种铟锡氧三元化合物靶材及其制备方法和应用

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04224162A (ja) * 1990-12-20 1992-08-13 Sumitomo Metal Mining Co Ltd Ｉｔｏ焼結体
KR19990088444A (ko) * 1998-05-20 1999-12-27 안드레아스 바우만/ 게하르트 리체르트 인듐-주석-산화물-성형체의제조방법
KR20030075992A (ko) * 2002-03-22 2003-09-26 삼성코닝 주식회사 인듐산화물 분말 및 인듐 주석 산화물 타겟의 제조방법
KR20060002124A (ko) * 2004-07-01 2006-01-09 전자부품연구원 이동통신단말기 송/수신부용 적층 필터

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04224162A (ja) * 1990-12-20 1992-08-13 Sumitomo Metal Mining Co Ltd Ｉｔｏ焼結体
KR19990088444A (ko) * 1998-05-20 1999-12-27 안드레아스 바우만/ 게하르트 리체르트 인듐-주석-산화물-성형체의제조방법
KR20030075992A (ko) * 2002-03-22 2003-09-26 삼성코닝 주식회사 인듐산화물 분말 및 인듐 주석 산화물 타겟의 제조방법
KR20060002124A (ko) * 2004-07-01 2006-01-09 전자부품연구원 이동통신단말기 송/수신부용 적층 필터

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101568215B1 (ko) * 2009-08-07 2015-11-11 스미토모 긴조쿠 고잔 가부시키가이샤 증착용 타블렛의 제조 방법

Also Published As

Publication number Publication date
JP2007009268A (ja) 2007-01-18
CN100513354C (zh) 2009-07-15
CN1891662A (zh) 2007-01-10
TW200710245A (en) 2007-03-16
TWI306124B (en) 2009-02-11
KR20070001811A (ko) 2007-01-04

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