KR100808712B1 - 코팅된 폴리머 필름 제조 방법 - Google Patents
코팅된 폴리머 필름 제조 방법 Download PDFInfo
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Abstract
Description
Claims (35)
- (a) 폴리머 물질 기질층을 용융-압출시키는 단계,(b) 기질층을 제1 방향으로 신장시키는 단계,(c) 임의로, 상기 제1 방향에 직교하는 제2 방향으로 기질층을 신장시키는 단계,(d) 임의로, 신장된 필름을 열고정(heat-setting)시키는 단계,(e) 용융 폴리머 물질을 기질의 표면 위에 직접 용융-코팅시킴으로써 기질 표면 상에 열봉합가능 코팅층을 형성하는 단계, 및(f) 코팅된 기질을 냉각시키는 단계를 포함하고, 여기서 코팅 단계 (e)는 단계 (b) 이전에 행하거나 단계 (b)와 단계 (c) 사이에 행하고, 코팅층의 두께는 8 ㎛ 미만이며, 코팅층의 용융 폴리머 물질은, 유리전이점이 10℃ 미만이고 방향족 디카르복실산, 지방족 디카르복실산 및 하나 이상의 글리콜로부터 유도되는 코폴리에스테르를 포함하는데, 여기서 코폴리에스테르 중의 방향족 디카르복실산의 농도는 코폴리에스테르의 모든 디카르복실산 성분을 기준으로 하여 40 내지 70 몰%의 범위이고, 코폴리에스테르 중의 지방족 디카르복실산의 농도는 코폴리에스테르의 모든 디카르복실산 성분을 기준으로 하여 30 내지 60 몰%의 범위인 것인, 박리가능한 열봉합가능 폴리머 필름의 제조 방법.
- 제1항에 있어서, 기질이 폴리에스테르를 포함하는 것인 방법.
- 제1항에 있어서, 기질이 폴리(에틸렌 테레프탈레이트)를 포함하는 것인 방법.
- 제1항에 있어서, 기질이 A층 및 코팅층 조성물이 적용되는 B층을 포함하고, A층은 폴리에틸렌 테레프탈레이트를 포함하고, B층은 1종 이상의 디카르복실산(들) 및 1종 이상의 글리콜(들)로부터 유도된 코폴리에스테르를 포함하는 것인 방법.
- 제4항에 있어서, B층이 에틸렌 글리콜, 테레프탈산 및 이소프탈산으로부터 유도된 코폴리에스테르를 포함하는 것인 방법.
- 제4항에 있어서, B층이 테레프탈산, 에틸렌 글리콜 및 1,4-시클로헥산디메탄올로부터 유도된 코폴리에스테르를 포함하는 것인 방법.
- 삭제
- 삭제
- 제1항 내지 제6항 중 어느 한 항에 있어서, 코폴리에스테르 중의 방향족 디카르복실산의 농도가 코폴리에스테르의 모든 디카르복실산 성분을 기준으로 하여 50 내지 55몰%의 범위이고, 코폴리에스테르 중의 지방족 디카르복실산의 농도가 코폴리에스테르의 모든 디카르복실산 성분을 기준으로 하여 45 내지 50 몰%의 범위인 방법.
- 제1항 내지 제6항 중 어느 한 항에 있어서, 방향족 디카르복실산이 테레프탈산인 방법.
- 제1항 내지 제6항 중 어느 한 항에 있어서, 지방족 디카르복실산이 세바스산, 아디프산 및 아젤라산으로부터 선택되는 것인 방법.
- 제1항 내지 제6항 중 어느 한 항에 있어서, 지방족 디카르복실산이 세바스산인 방법.
- 제1항 내지 제6항 중 어느 한 항에 있어서, 코팅층의 코폴리에스테르의 글리콜 성분이 지방족 글리콜인 방법.
- 제1항 내지 제6항 중 어느 한 항에 있어서, 코팅층의 코폴리에스테르의 글리콜 성분이 1,4-부탄디올인 방법.
- 제1항 내지 제6항 중 어느 한 항에 있어서, 코팅층이(i) 아젤라산 및 테레프탈산과 지방족 글리콜의 코폴리에스테르;(ii) 아디프산 및 테레프탈산과 지방족 글리콜의 코폴리에스테르; 및(iii) 세바스산 및 테레프탈산과 지방족 글리콜의 코폴리에스테르로부터 선택되는 폴리머를 포함하는 것인 방법.
- 제1항 내지 제6항 중 어느 한 항에 있어서, 코팅층이(i) 유리전이점 (Tg)이 -40℃이고 융점 (Tm)이 117℃인 세바스산/테레프탈산/부틸렌 글리콜 (50/50/100 몰%)의 코폴리에스테르; 및(ii) Tg가 -15℃이고 Tm이 150℃인 아젤라산/테레프탈산/에틸렌 글리콜 (45/55/100 몰%)의 코폴리에스테르로부터 선택되는 폴리머를 포함하는 것인 방법.
- 제1항 내지 제6항 중 어느 한 항에 있어서, 코팅층의 용융 폴리머 물질의 점도가 0.005 내지 50 Pa.s의 범위인 방법.
- 제1항 내지 제6항 중 어느 한 항에 있어서, 코팅층의 용융 폴리머 물질의 점도가 0.005 내지 20 Pa.s의 범위인 방법.
- 제1항 내지 제6항 중 어느 한 항에 있어서, 코팅 단계 이전에 코팅층의 폴리머 물질에 물을 첨가하는 단계를 추가로 포함하고, 이때의 물은 코팅층의 코폴리에스테르의 600 중량ppm 내지 2500 중량ppm 범위의 양으로 첨가되는 것인 방법.
- 제19항에 있어서, 물이 1000 중량ppm 내지 2000 중량ppm의 범위의 양으로 첨가되는 것인 방법.
- 제19항에 있어서, 물이 1300 중량ppm 내지 1600 중량ppm의 범위의 양으로 첨가되는 것인 방법.
- 제1항 내지 제6항 중 어느 한 항에 있어서, 기질층이 상기한 직교 방향으로 신장되고, 단계(e)가 단계 (b)와 단계 (c) 사이에 수행되는 것인 방법.
- 제1항 내지 제6항 중 어느 한 항에 나타낸 바와 같은 코폴리에스테르-함유 열봉합가능 코팅층을 표면 위에 갖는 폴리머 물질의 기질층을 포함하며, 이때 코팅층은 두께가 8 마이크론 미만인 박리가능한 열봉합가능 폴리머 필름.
- 삭제
- 삭제
- 식품 또는 음료를 함유하는 저장기 및 제23항에 따른 폴리머 필름으로 형성된 뚜껑을 포함하는 봉합된 용기.
- 삭제
- 삭제
- 제5항에 있어서, 테레프탈산 성분 대 이소프탈산 성분의 몰비가 65:35 내지 85:15의 범위인 방법.
- 제5항에 있어서, 테레프탈산 성분 대 이소프탈산 성분의 몰비가 82:18인 방법.
- 제6항에 있어서, 1,4-시클로헥산디메탄올 대 에틸렌 글리콜의 몰비가 30:70 내지 35:65의 범위인 방법.
- 제6항에 있어서, 1,4-시클로헥산디메탄올 대 에틸렌 글리콜의 몰비가 33:67인 방법.
- 제15항에 있어서, 아젤라산 및 테레프탈산과 지방족 글리콜의 코폴리에스테르 중 지방족 글리콜이 에틸렌 글리콜인 방법.
- 제15항에 있어서, 아디프산 및 테레프탈산과 지방족 글리콜의 코폴리에스테르 중 지방족 글리콜이 에틸렌 글리콜인 방법.
- 제15항에 있어서, 세바스산 및 테레프탈산과 지방족 글리콜의 코폴리에스테르 중 지방족 글리콜이 부틸렌 글리콜인 방법.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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GB0101994A GB0101994D0 (en) | 2001-01-25 | 2001-01-25 | Process for the production of coated polumeric film |
GB0101994.2 | 2001-01-25 | ||
PCT/GB2002/000315 WO2002059186A1 (en) | 2001-01-25 | 2002-01-25 | Process for the production of coated polymeric film |
Publications (2)
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KR20030070918A KR20030070918A (ko) | 2003-09-02 |
KR100808712B1 true KR100808712B1 (ko) | 2008-02-29 |
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KR1020037009539A KR100808712B1 (ko) | 2001-01-25 | 2002-01-25 | 코팅된 폴리머 필름 제조 방법 |
Country Status (9)
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US (2) | US6939584B2 (ko) |
EP (1) | EP1362075B1 (ko) |
JP (2) | JP4773676B2 (ko) |
KR (1) | KR100808712B1 (ko) |
CN (1) | CN1244617C (ko) |
DE (1) | DE60222741T2 (ko) |
GB (1) | GB0101994D0 (ko) |
TW (1) | TWI252859B (ko) |
WO (1) | WO2002059186A1 (ko) |
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2001
- 2001-01-25 GB GB0101994A patent/GB0101994D0/en not_active Ceased
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2002
- 2002-01-24 TW TW91101153A patent/TWI252859B/zh not_active IP Right Cessation
- 2002-01-25 US US10/250,994 patent/US6939584B2/en not_active Expired - Fee Related
- 2002-01-25 EP EP02715565A patent/EP1362075B1/en not_active Expired - Lifetime
- 2002-01-25 CN CNB028041461A patent/CN1244617C/zh not_active Expired - Fee Related
- 2002-01-25 DE DE2002622741 patent/DE60222741T2/de not_active Expired - Lifetime
- 2002-01-25 JP JP2002559481A patent/JP4773676B2/ja not_active Expired - Fee Related
- 2002-01-25 WO PCT/GB2002/000315 patent/WO2002059186A1/en active IP Right Grant
- 2002-01-25 KR KR1020037009539A patent/KR100808712B1/ko active IP Right Grant
-
2005
- 2005-06-16 US US11/154,851 patent/US7368165B2/en not_active Expired - Fee Related
-
2011
- 2011-05-24 JP JP2011115959A patent/JP5314084B2/ja not_active Expired - Fee Related
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Also Published As
Publication number | Publication date |
---|---|
KR20030070918A (ko) | 2003-09-02 |
JP5314084B2 (ja) | 2013-10-16 |
CN1244617C (zh) | 2006-03-08 |
US20040067284A1 (en) | 2004-04-08 |
CN1489613A (zh) | 2004-04-14 |
DE60222741D1 (de) | 2007-11-15 |
WO2002059186A1 (en) | 2002-08-01 |
TWI252859B (en) | 2006-04-11 |
DE60222741T2 (de) | 2008-07-17 |
US7368165B2 (en) | 2008-05-06 |
US6939584B2 (en) | 2005-09-06 |
JP2011178176A (ja) | 2011-09-15 |
EP1362075B1 (en) | 2007-10-03 |
JP4773676B2 (ja) | 2011-09-14 |
US20050249906A1 (en) | 2005-11-10 |
GB0101994D0 (en) | 2001-03-14 |
JP2004518007A (ja) | 2004-06-17 |
EP1362075A1 (en) | 2003-11-19 |
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