KR100799418B1 - 반사굴절광학계 및 이 광학계를 구비한 노광장치 - Google Patents

반사굴절광학계 및 이 광학계를 구비한 노광장치 Download PDF

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Publication number
KR100799418B1
KR100799418B1 KR1020037005588A KR20037005588A KR100799418B1 KR 100799418 B1 KR100799418 B1 KR 100799418B1 KR 1020037005588 A KR1020037005588 A KR 1020037005588A KR 20037005588 A KR20037005588 A KR 20037005588A KR 100799418 B1 KR100799418 B1 KR 100799418B1
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South Korea
Prior art keywords
optical system
reticle
lens
imaging optical
concave
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Expired - Fee Related
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KR1020037005588A
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English (en)
Korean (ko)
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KR20030045130A (ko
Inventor
다카하시도모와키
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가부시키가이샤 니콘
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0836—Catadioptric systems using more than three curved mirrors
    • G02B17/0844—Catadioptric systems using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020037005588A 2000-10-23 2001-10-23 반사굴절광학계 및 이 광학계를 구비한 노광장치 Expired - Fee Related KR100799418B1 (ko)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP2000322068 2000-10-23
JPJP-P-2000-00322068 2000-10-23
JP2001003200 2001-01-11
JPJP-P-2001-00003200 2001-01-11
JP2001309516A JP4245286B2 (ja) 2000-10-23 2001-10-05 反射屈折光学系および該光学系を備えた露光装置
JPJP-P-2001-00309516 2001-10-05
PCT/JP2001/009266 WO2002035273A1 (en) 2000-10-23 2001-10-23 Catadioptric system and exposure device having this system

Publications (2)

Publication Number Publication Date
KR20030045130A KR20030045130A (ko) 2003-06-09
KR100799418B1 true KR100799418B1 (ko) 2008-01-30

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KR1020037005588A Expired - Fee Related KR100799418B1 (ko) 2000-10-23 2001-10-23 반사굴절광학계 및 이 광학계를 구비한 노광장치

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Country Link
US (1) US7030965B2 (https=)
EP (1) EP1336887A4 (https=)
JP (1) JP4245286B2 (https=)
KR (1) KR100799418B1 (https=)
CN (1) CN100460921C (https=)
AU (1) AU2001295994A1 (https=)
TW (1) TW529080B (https=)
WO (1) WO2002035273A1 (https=)

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Publication number Publication date
KR20030045130A (ko) 2003-06-09
EP1336887A4 (en) 2008-07-09
CN1535392A (zh) 2004-10-06
WO2002035273A1 (en) 2002-05-02
JP2002277742A (ja) 2002-09-25
AU2001295994A1 (en) 2002-05-06
JP4245286B2 (ja) 2009-03-25
EP1336887A1 (en) 2003-08-20
CN100460921C (zh) 2009-02-11
US7030965B2 (en) 2006-04-18
TW529080B (en) 2003-04-21
US20040130806A1 (en) 2004-07-08

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