KR100737228B1 - 가스 분배 장치 및 그 가스 분배 장치를 포함하는 챔버 - Google Patents

가스 분배 장치 및 그 가스 분배 장치를 포함하는 챔버 Download PDF

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Publication number
KR100737228B1
KR100737228B1 KR1020010003198A KR20010003198A KR100737228B1 KR 100737228 B1 KR100737228 B1 KR 100737228B1 KR 1020010003198 A KR1020010003198 A KR 1020010003198A KR 20010003198 A KR20010003198 A KR 20010003198A KR 100737228 B1 KR100737228 B1 KR 100737228B1
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South Korea
Prior art keywords
gas distribution
distribution plate
gas
inlet manifold
gas inlet
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Expired - Lifetime
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KR1020010003198A
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English (en)
Korean (ko)
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KR20010076391A (ko
Inventor
존 엠. 화이트
에른스트 켈러
웬델 티. 블로니간
Original Assignee
어플라이드 머티어리얼스, 인코포레이티드
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Application filed by 어플라이드 머티어리얼스, 인코포레이티드 filed Critical 어플라이드 머티어리얼스, 인코포레이티드
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45565—Shower nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C23C16/5096—Flat-bed apparatus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49428—Gas and water specific plumbing component making
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49826—Assembling or joining

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
KR1020010003198A 2000-01-20 2001-01-19 가스 분배 장치 및 그 가스 분배 장치를 포함하는 챔버 Expired - Lifetime KR100737228B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/488,612 2000-01-20
US09/488,612 US6477980B1 (en) 2000-01-20 2000-01-20 Flexibly suspended gas distribution manifold for plasma chamber

Related Child Applications (3)

Application Number Title Priority Date Filing Date
KR1020050016708A Division KR20050033573A (ko) 2000-01-20 2005-02-28 가스 분배 장치 및 가스 분배 방법
KR1020060108003A Division KR100882072B1 (ko) 2000-01-20 2006-11-02 가스 분배 장치 및 그 가스 분배 장치를 포함하는 챔버
KR1020060108004A Division KR100802682B1 (ko) 2000-01-20 2006-11-02 가스 분배 장치 및 그 가스 분배 장치를 포함하는 챔버

Publications (2)

Publication Number Publication Date
KR20010076391A KR20010076391A (ko) 2001-08-11
KR100737228B1 true KR100737228B1 (ko) 2007-07-09

Family

ID=23940398

Family Applications (7)

Application Number Title Priority Date Filing Date
KR1020010003198A Expired - Lifetime KR100737228B1 (ko) 2000-01-20 2001-01-19 가스 분배 장치 및 그 가스 분배 장치를 포함하는 챔버
KR1020050016708A Ceased KR20050033573A (ko) 2000-01-20 2005-02-28 가스 분배 장치 및 가스 분배 방법
KR1020060108003A Expired - Lifetime KR100882072B1 (ko) 2000-01-20 2006-11-02 가스 분배 장치 및 그 가스 분배 장치를 포함하는 챔버
KR1020060108004A Expired - Lifetime KR100802682B1 (ko) 2000-01-20 2006-11-02 가스 분배 장치 및 그 가스 분배 장치를 포함하는 챔버
KR1020080113938A Ceased KR20080108208A (ko) 2000-01-20 2008-11-17 가스 분배 장치 및 그 가스 분배 장치를 포함하는 챔버
KR1020100012871A Ceased KR20100033988A (ko) 2000-01-20 2010-02-11 가스 분배 장치 및 그 가스 분배 장치를 포함하는 챔버
KR1020100127659A Expired - Lifetime KR101287100B1 (ko) 2000-01-20 2010-12-14 가스 분배 장치 및 상기 가스 분배 장치를 포함하는 챔버

Family Applications After (6)

Application Number Title Priority Date Filing Date
KR1020050016708A Ceased KR20050033573A (ko) 2000-01-20 2005-02-28 가스 분배 장치 및 가스 분배 방법
KR1020060108003A Expired - Lifetime KR100882072B1 (ko) 2000-01-20 2006-11-02 가스 분배 장치 및 그 가스 분배 장치를 포함하는 챔버
KR1020060108004A Expired - Lifetime KR100802682B1 (ko) 2000-01-20 2006-11-02 가스 분배 장치 및 그 가스 분배 장치를 포함하는 챔버
KR1020080113938A Ceased KR20080108208A (ko) 2000-01-20 2008-11-17 가스 분배 장치 및 그 가스 분배 장치를 포함하는 챔버
KR1020100012871A Ceased KR20100033988A (ko) 2000-01-20 2010-02-11 가스 분배 장치 및 그 가스 분배 장치를 포함하는 챔버
KR1020100127659A Expired - Lifetime KR101287100B1 (ko) 2000-01-20 2010-12-14 가스 분배 장치 및 상기 가스 분배 장치를 포함하는 챔버

Country Status (7)

Country Link
US (3) US6477980B1 (https=)
EP (1) EP1118693B1 (https=)
JP (1) JP4430253B2 (https=)
KR (7) KR100737228B1 (https=)
DE (1) DE60125608T2 (https=)
SG (1) SG87200A1 (https=)
TW (1) TW477830B (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
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US8033772B2 (en) 2002-06-21 2011-10-11 Applied Materials, Inc. Transfer chamber for vacuum processing system
KR20190000370A (ko) * 2016-05-19 2019-01-02 어플라이드 머티어리얼스, 인코포레이티드 개선된 반도체 식각 및 구성요소 보호를 위한 시스템들 및 방법들
KR20190000371A (ko) * 2016-05-19 2019-01-02 어플라이드 머티어리얼스, 인코포레이티드 개선된 반도체 식각 및 구성요소 보호를 위한 시스템들 및 방법들

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* Cited by examiner, † Cited by third party
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KR20100033988A (ko) 2010-03-31
US20030066607A1 (en) 2003-04-10
EP1118693A2 (en) 2001-07-25
KR20060122798A (ko) 2006-11-30
TW477830B (en) 2002-03-01
KR20060121781A (ko) 2006-11-29
SG87200A1 (en) 2002-03-19
DE60125608T2 (de) 2007-11-15
EP1118693B1 (en) 2007-01-03
US6477980B1 (en) 2002-11-12
KR101287100B1 (ko) 2013-07-17
KR20080108208A (ko) 2008-12-12
KR20110004343A (ko) 2011-01-13
US6823589B2 (en) 2004-11-30
EP1118693A3 (en) 2001-10-17
JP2001284271A (ja) 2001-10-12
KR100882072B1 (ko) 2009-02-10
US7017269B2 (en) 2006-03-28
DE60125608D1 (de) 2007-02-15
US20040118345A1 (en) 2004-06-24
KR100802682B1 (ko) 2008-02-12
KR20050033573A (ko) 2005-04-12
KR20010076391A (ko) 2001-08-11

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