KR100718194B1 - 투영광학계 및 패턴묘화장치 - Google Patents

투영광학계 및 패턴묘화장치 Download PDF

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Publication number
KR100718194B1
KR100718194B1 KR1020050026895A KR20050026895A KR100718194B1 KR 100718194 B1 KR100718194 B1 KR 100718194B1 KR 1020050026895 A KR1020050026895 A KR 1020050026895A KR 20050026895 A KR20050026895 A KR 20050026895A KR 100718194 B1 KR100718194 B1 KR 100718194B1
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KR
South Korea
Prior art keywords
mirror
central axis
concave mirror
substrate
light
Prior art date
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KR1020050026895A
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English (en)
Korean (ko)
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KR20060045059A (ko
Inventor
야스유키 코야기
Original Assignee
다이닛뽕스크린 세이조오 가부시키가이샤
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Publication of KR20060045059A publication Critical patent/KR20060045059A/ko
Application granted granted Critical
Publication of KR100718194B1 publication Critical patent/KR100718194B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020050026895A 2004-06-01 2005-03-31 투영광학계 및 패턴묘화장치 KR100718194B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004162716A JP2005345582A (ja) 2004-06-01 2004-06-01 投影光学系およびパターン描画装置
JPJP-P-2004-00162716 2004-06-01

Publications (2)

Publication Number Publication Date
KR20060045059A KR20060045059A (ko) 2006-05-16
KR100718194B1 true KR100718194B1 (ko) 2007-05-15

Family

ID=35498054

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020050026895A KR100718194B1 (ko) 2004-06-01 2005-03-31 투영광학계 및 패턴묘화장치

Country Status (4)

Country Link
JP (1) JP2005345582A (zh)
KR (1) KR100718194B1 (zh)
CN (1) CN100395582C (zh)
TW (1) TWI275822B (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006038455A1 (de) * 2006-08-16 2008-02-21 Carl Zeiss Smt Ag Optisches System für die Halbleiterlithographie
JP4985308B2 (ja) * 2007-08-31 2012-07-25 大日本印刷株式会社 露光装置、フォトマスクおよび露光方法
DE102007051669A1 (de) * 2007-10-26 2009-04-30 Carl Zeiss Smt Ag Abbildende Optik, Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik sowie Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage
JP5398185B2 (ja) * 2008-07-09 2014-01-29 キヤノン株式会社 投影光学系、露光装置およびデバイス製造方法
JP5116726B2 (ja) * 2009-06-01 2013-01-09 キヤノン株式会社 露光装置およびデバイス製造方法
JP6386896B2 (ja) * 2014-12-02 2018-09-05 キヤノン株式会社 投影光学系、露光装置、および、デバイス製造方法
TWI636292B (zh) * 2017-06-08 2018-09-21 昭朗精密工業有限公司 Projector and its projection lens

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19980703209A (ko) * 1995-03-22 1998-10-15 마크 게스레이 소 필드 스캐닝을 위한 배율 조정
JP2004012574A (ja) 2002-06-04 2004-01-15 Pentax Corp 投影露光光学系および投影露光装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6129815A (ja) * 1984-07-23 1986-02-10 Nippon Kogaku Kk <Nikon> 反射縮小投影光学系
JPH088169A (ja) * 1994-06-23 1996-01-12 Nikon Corp 露光装置
CN1114942A (zh) * 1994-07-11 1996-01-17 代心淑 具有浸没式凸镜的机动车广角视镜
JPH0845824A (ja) * 1994-08-03 1996-02-16 Toshiba Corp 露光装置
JPH09180985A (ja) * 1995-12-25 1997-07-11 Nikon Corp 投影露光装置
JP4655332B2 (ja) * 2000-05-26 2011-03-23 株式会社ニコン 露光装置、露光装置の調整方法、およびマイクロデバイスの製造方法
DE10115875A1 (de) * 2001-03-30 2002-10-10 Heidelberger Druckmasch Ag Bebilderungseinrichtung für eine Druckform mit einer Makrooptik vom Offner-Typ

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19980703209A (ko) * 1995-03-22 1998-10-15 마크 게스레이 소 필드 스캐닝을 위한 배율 조정
JP2004012574A (ja) 2002-06-04 2004-01-15 Pentax Corp 投影露光光学系および投影露光装置

Also Published As

Publication number Publication date
TW200604720A (en) 2006-02-01
JP2005345582A (ja) 2005-12-15
CN100395582C (zh) 2008-06-18
KR20060045059A (ko) 2006-05-16
TWI275822B (en) 2007-03-11
CN1704797A (zh) 2005-12-07

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