KR100693024B1 - 미세 구조체의 제조 방법, 노광 장치, 전자 기기 - Google Patents

미세 구조체의 제조 방법, 노광 장치, 전자 기기 Download PDF

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Publication number
KR100693024B1
KR100693024B1 KR1020050035816A KR20050035816A KR100693024B1 KR 100693024 B1 KR100693024 B1 KR 100693024B1 KR 1020050035816 A KR1020050035816 A KR 1020050035816A KR 20050035816 A KR20050035816 A KR 20050035816A KR 100693024 B1 KR100693024 B1 KR 100693024B1
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South Korea
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light
laser
exposure
photosensitive film
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Expired - Fee Related
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KR1020050035816A
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English (en)
Korean (ko)
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KR20060047608A (ko
Inventor
준 아마코
아츠시 다카쿠와
다이스케 사와키
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세이코 엡슨 가부시키가이샤
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    • E—FIXED CONSTRUCTIONS
    • E02—HYDRAULIC ENGINEERING; FOUNDATIONS; SOIL SHIFTING
    • E02D—FOUNDATIONS; EXCAVATIONS; EMBANKMENTS; UNDERGROUND OR UNDERWATER STRUCTURES
    • E02D29/00—Independent underground or underwater structures; Retaining walls
    • E02D29/16—Arrangement or construction of joints in foundation structures
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • E—FIXED CONSTRUCTIONS
    • E02—HYDRAULIC ENGINEERING; FOUNDATIONS; SOIL SHIFTING
    • E02D—FOUNDATIONS; EXCAVATIONS; EMBANKMENTS; UNDERGROUND OR UNDERWATER STRUCTURES
    • E02D29/00—Independent underground or underwater structures; Retaining walls
    • E02D29/045—Underground structures, e.g. tunnels or galleries, built in the open air or by methods involving disturbance of the ground surface all along the location line; Methods of making them
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02—Optical fibres with cladding with or without a coating
    • G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
    • G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
    • G02B6/02123—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating
    • G02B6/02133—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating using beam interference
    • G02B6/02138—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating using beam interference based on illuminating a phase mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
    • E—FIXED CONSTRUCTIONS
    • E02—HYDRAULIC ENGINEERING; FOUNDATIONS; SOIL SHIFTING
    • E02D—FOUNDATIONS; EXCAVATIONS; EMBANKMENTS; UNDERGROUND OR UNDERWATER STRUCTURES
    • E02D2200/00—Geometrical or physical properties
    • E02D2200/12—Geometrical or physical properties corrugated
    • E—FIXED CONSTRUCTIONS
    • E02—HYDRAULIC ENGINEERING; FOUNDATIONS; SOIL SHIFTING
    • E02D—FOUNDATIONS; EXCAVATIONS; EMBANKMENTS; UNDERGROUND OR UNDERWATER STRUCTURES
    • E02D2600/00—Miscellaneous
    • E02D2600/20—Miscellaneous comprising details of connection between elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02—Optical fibres with cladding with or without a coating
    • G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
    • G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
    • G02B6/02123—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating
    • G02B6/02133—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating using beam interference

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Optics & Photonics (AREA)
  • Paleontology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Structural Engineering (AREA)
  • Civil Engineering (AREA)
  • Mining & Mineral Resources (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Composite Materials (AREA)
  • General Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
KR1020050035816A 2004-08-25 2005-04-29 미세 구조체의 제조 방법, 노광 장치, 전자 기기 Expired - Fee Related KR100693024B1 (ko)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
JPJP-P-2004-00245177 2004-08-25
JPJP-P-2004-00245161 2004-08-25
JP2004245161 2004-08-25
JP2004245169 2004-08-25
JP2004245177 2004-08-25
JPJP-P-2004-00245169 2004-08-25
JP2005010420A JP4389791B2 (ja) 2004-08-25 2005-01-18 微細構造体の製造方法および露光装置
JPJP-P-2005-00010420 2005-01-18

Publications (2)

Publication Number Publication Date
KR20060047608A KR20060047608A (ko) 2006-05-18
KR100693024B1 true KR100693024B1 (ko) 2007-03-12

Family

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KR1020050035816A Expired - Fee Related KR100693024B1 (ko) 2004-08-25 2005-04-29 미세 구조체의 제조 방법, 노광 장치, 전자 기기

Country Status (5)

Country Link
US (1) US7867692B2 (enExample)
EP (1) EP1630612A3 (enExample)
JP (1) JP4389791B2 (enExample)
KR (1) KR100693024B1 (enExample)
TW (1) TWI288862B (enExample)

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US8934084B2 (en) * 2006-05-31 2015-01-13 Asml Holding N.V. System and method for printing interference patterns having a pitch in a lithography system
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JP5145673B2 (ja) * 2006-08-30 2013-02-20 住友電気工業株式会社 レーザ加工方法およびレーザ加工装置
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US8431328B2 (en) * 2007-02-22 2013-04-30 Nikon Corporation Exposure method, method for manufacturing flat panel display substrate, and exposure apparatus
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KR100881140B1 (ko) 2007-08-09 2009-02-02 삼성전기주식회사 나노패턴 형성장치 및 이를 이용한 나노패턴 형성방법
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KR102742638B1 (ko) * 2019-09-26 2024-12-16 주식회사 엘지화학 화각 제어용 복합구조필름, 이의 제조방법 및 이를 이용한 영상표시장치
CN112835263B (zh) * 2019-11-22 2024-05-24 北京理工大学 一种液晶计算全息图的单步曝光方法及装置
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CN112965288B (zh) * 2021-02-02 2022-04-26 深圳市华星光电半导体显示技术有限公司 内置偏光片的制备方法及偏光片
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Also Published As

Publication number Publication date
US7867692B2 (en) 2011-01-11
JP2006093644A (ja) 2006-04-06
EP1630612A3 (en) 2007-09-19
TW200608152A (en) 2006-03-01
JP4389791B2 (ja) 2009-12-24
TWI288862B (en) 2007-10-21
KR20060047608A (ko) 2006-05-18
US20060046156A1 (en) 2006-03-02
EP1630612A2 (en) 2006-03-01

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