KR100661408B1 - 세정 장치 - Google Patents

세정 장치 Download PDF

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Publication number
KR100661408B1
KR100661408B1 KR1020050081165A KR20050081165A KR100661408B1 KR 100661408 B1 KR100661408 B1 KR 100661408B1 KR 1020050081165 A KR1020050081165 A KR 1020050081165A KR 20050081165 A KR20050081165 A KR 20050081165A KR 100661408 B1 KR100661408 B1 KR 100661408B1
Authority
KR
South Korea
Prior art keywords
mask
cleaning
liquid
rinse
washing
Prior art date
Application number
KR1020050081165A
Other languages
English (en)
Korean (ko)
Other versions
KR20060050912A (ko
Inventor
요시따까 기노무라
데루오 히라오까
고지로 오오까와
Original Assignee
산요덴키가부시키가이샤
가부시끼가이샤 기가 테크
오오까와 코포레이션 리미티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 산요덴키가부시키가이샤, 가부시끼가이샤 기가 테크, 오오까와 코포레이션 리미티드 filed Critical 산요덴키가부시키가이샤
Publication of KR20060050912A publication Critical patent/KR20060050912A/ko
Application granted granted Critical
Publication of KR100661408B1 publication Critical patent/KR100661408B1/ko

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/10—Vacuum distillation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • B08B11/02—Devices for holding articles during cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/06—Cleaning involving contact with liquid using perforated drums in which the article or material is placed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/14—Removing waste, e.g. labels, from cleaning liquid; Regenerating cleaning liquids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
KR1020050081165A 2004-09-01 2005-09-01 세정 장치 KR100661408B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2004254656 2004-09-01
JPJP-P-2004-00254656 2004-09-01
JPJP-P-2005-00249431 2005-08-30
JP2005249431A JP4644565B2 (ja) 2004-09-01 2005-08-30 洗浄装置

Publications (2)

Publication Number Publication Date
KR20060050912A KR20060050912A (ko) 2006-05-19
KR100661408B1 true KR100661408B1 (ko) 2006-12-27

Family

ID=36239842

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020050081165A KR100661408B1 (ko) 2004-09-01 2005-09-01 세정 장치

Country Status (4)

Country Link
JP (1) JP4644565B2 (zh)
KR (1) KR100661408B1 (zh)
CN (1) CN100567553C (zh)
TW (1) TWI298746B (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100891067B1 (ko) 2007-12-03 2009-03-31 주식회사 동부하이텍 웨트 스테이션 장치
KR101103474B1 (ko) * 2010-08-19 2012-01-09 현대중공업 주식회사 기판 세정 장치

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4884180B2 (ja) * 2006-11-21 2012-02-29 東京エレクトロン株式会社 基板処理装置および基板処理方法
JP5280667B2 (ja) * 2007-11-08 2013-09-04 株式会社ジャパンディスプレイ 有機ｅｌ表示装置の製造方法及び蒸着マスクのクリーニング方法
JP5877955B2 (ja) * 2011-03-18 2016-03-08 キヤノントッキ株式会社 蒸着装置並びに蒸着方法
JP2013071062A (ja) * 2011-09-28 2013-04-22 Toho Technology Corp 蒸着マスク洗浄装置、蒸着マスク洗浄システムおよび蒸着マスク洗浄方法
KR101456614B1 (ko) * 2013-04-25 2014-11-03 주식회사 케이씨텍 마스크 세정 시스템의 배치 모사 방법 및 이를 이용한 마스크 세정 시스템.
CN104152846B (zh) * 2014-02-21 2016-08-17 深圳浚漪科技有限公司 一种掩模板清洗系统
CN110965021A (zh) * 2019-12-26 2020-04-07 寰采星科技(宁波)有限公司 一种金属掩模板堵孔返修方法及装置
CN111394739B (zh) * 2020-04-26 2024-01-05 北京七星华创集成电路装备有限公司 一种金属掩膜板清洗设备
CN112553571A (zh) * 2020-12-09 2021-03-26 四川富乐德科技发展有限公司 一种Open Mask表面IZO蒸镀材料的清洗方法
CN114995052A (zh) * 2022-05-18 2022-09-02 上海图灵智算量子科技有限公司 光罩版清洁装置
CN115382834A (zh) * 2022-09-06 2022-11-25 苏州清越光电科技股份有限公司 掩膜版清洗机构及掩膜版清洗设备

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60110194A (ja) * 1983-11-18 1985-06-15 株式会社ニコン 基板の洗浄装置
JPH0610677Y2 (ja) * 1988-08-03 1994-03-16 森尾電機株式会社 洗浄物移動機
US4867186A (en) * 1988-08-15 1989-09-19 Shigeo Otsuka Chloro-fluoro-carbon liquid jetting immersion cleaning apparatus
JPH03253031A (ja) * 1990-03-01 1991-11-12 Hitachi Ltd 洗浄処理装置
CN2136064Y (zh) * 1992-09-16 1993-06-16 河南中医学院 多功能闪蒸装置
DE69520687T2 (de) * 1994-11-09 2001-08-23 R R Street & Co Verfahren und system zur aufbereitung von unter druck stehenden flüssigen lösungsmitteln zur reinigung von substraten
JP2001203079A (ja) * 2000-01-18 2001-07-27 Toray Ind Inc 有機電界発光装置の製造方法
JP2001300446A (ja) * 2000-04-28 2001-10-30 Nippon Zeon Co Ltd 被洗浄物の洗浄方法
JP2003340384A (ja) * 2002-05-23 2003-12-02 Star Cluster:Kk 薄板状ワークの超音波洗浄装置
JP4352880B2 (ja) * 2003-12-02 2009-10-28 セイコーエプソン株式会社 洗浄方法および洗浄装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100891067B1 (ko) 2007-12-03 2009-03-31 주식회사 동부하이텍 웨트 스테이션 장치
KR101103474B1 (ko) * 2010-08-19 2012-01-09 현대중공업 주식회사 기판 세정 장치

Also Published As

Publication number Publication date
TW200617196A (en) 2006-06-01
JP4644565B2 (ja) 2011-03-02
JP2006100264A (ja) 2006-04-13
CN1746331A (zh) 2006-03-15
CN100567553C (zh) 2009-12-09
TWI298746B (en) 2008-07-11
KR20060050912A (ko) 2006-05-19

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