JP4644565B2 - 洗浄装置 - Google Patents

洗浄装置 Download PDF

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Publication number
JP4644565B2
JP4644565B2 JP2005249431A JP2005249431A JP4644565B2 JP 4644565 B2 JP4644565 B2 JP 4644565B2 JP 2005249431 A JP2005249431 A JP 2005249431A JP 2005249431 A JP2005249431 A JP 2005249431A JP 4644565 B2 JP4644565 B2 JP 4644565B2
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JP
Japan
Prior art keywords
mask
cleaning
liquid
tank
rinsing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2005249431A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006100264A (ja
Inventor
芳孝 木野村
照雄 平岡
光治郎 大川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP2005249431A priority Critical patent/JP4644565B2/ja
Priority to TW094129815A priority patent/TWI298746B/zh
Priority to CNB2005100936991A priority patent/CN100567553C/zh
Priority to KR1020050081165A priority patent/KR100661408B1/ko
Publication of JP2006100264A publication Critical patent/JP2006100264A/ja
Application granted granted Critical
Publication of JP4644565B2 publication Critical patent/JP4644565B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/10—Vacuum distillation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • B08B11/02—Devices for holding articles during cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/06—Cleaning involving contact with liquid using perforated drums in which the article or material is placed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/14—Removing waste, e.g. labels, from cleaning liquid; Regenerating cleaning liquids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
JP2005249431A 2004-09-01 2005-08-30 洗浄装置 Active JP4644565B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2005249431A JP4644565B2 (ja) 2004-09-01 2005-08-30 洗浄装置
TW094129815A TWI298746B (en) 2004-09-01 2005-08-31 Cleaning device
CNB2005100936991A CN100567553C (zh) 2004-09-01 2005-09-01 清洗装置
KR1020050081165A KR100661408B1 (ko) 2004-09-01 2005-09-01 세정 장치

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004254656 2004-09-01
JP2005249431A JP4644565B2 (ja) 2004-09-01 2005-08-30 洗浄装置

Publications (2)

Publication Number Publication Date
JP2006100264A JP2006100264A (ja) 2006-04-13
JP4644565B2 true JP4644565B2 (ja) 2011-03-02

Family

ID=36239842

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005249431A Active JP4644565B2 (ja) 2004-09-01 2005-08-30 洗浄装置

Country Status (4)

Country Link
JP (1) JP4644565B2 (zh)
KR (1) KR100661408B1 (zh)
CN (1) CN100567553C (zh)
TW (1) TWI298746B (zh)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4884180B2 (ja) * 2006-11-21 2012-02-29 東京エレクトロン株式会社 基板処理装置および基板処理方法
JP5280667B2 (ja) * 2007-11-08 2013-09-04 株式会社ジャパンディスプレイ 有機ｅｌ表示装置の製造方法及び蒸着マスクのクリーニング方法
KR100891067B1 (ko) 2007-12-03 2009-03-31 주식회사 동부하이텍 웨트 스테이션 장치
KR101103474B1 (ko) * 2010-08-19 2012-01-09 현대중공업 주식회사 기판 세정 장치
JP5877955B2 (ja) * 2011-03-18 2016-03-08 キヤノントッキ株式会社 蒸着装置並びに蒸着方法
JP2013071062A (ja) * 2011-09-28 2013-04-22 Toho Technology Corp 蒸着マスク洗浄装置、蒸着マスク洗浄システムおよび蒸着マスク洗浄方法
KR101456614B1 (ko) * 2013-04-25 2014-11-03 주식회사 케이씨텍 마스크 세정 시스템의 배치 모사 방법 및 이를 이용한 마스크 세정 시스템.
CN104152846B (zh) * 2014-02-21 2016-08-17 深圳浚漪科技有限公司 一种掩模板清洗系统
CN110965021A (zh) * 2019-12-26 2020-04-07 寰采星科技(宁波)有限公司 一种金属掩模板堵孔返修方法及装置
CN111394739B (zh) * 2020-04-26 2024-01-05 北京七星华创集成电路装备有限公司 一种金属掩膜板清洗设备
CN112553571A (zh) * 2020-12-09 2021-03-26 四川富乐德科技发展有限公司 一种Open Mask表面IZO蒸镀材料的清洗方法
CN114995052A (zh) * 2022-05-18 2022-09-02 上海图灵智算量子科技有限公司 光罩版清洁装置
CN115382834A (zh) * 2022-09-06 2022-11-25 苏州清越光电科技股份有限公司 掩膜版清洗机构及掩膜版清洗设备

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0224538U (zh) * 1988-08-03 1990-02-19
JP2001203079A (ja) * 2000-01-18 2001-07-27 Toray Ind Inc 有機電界発光装置の製造方法
JP2001300446A (ja) * 2000-04-28 2001-10-30 Nippon Zeon Co Ltd 被洗浄物の洗浄方法
JP2003340384A (ja) * 2002-05-23 2003-12-02 Star Cluster:Kk 薄板状ワークの超音波洗浄装置
JP2005161190A (ja) * 2003-12-02 2005-06-23 Seiko Epson Corp 洗浄方法、洗浄装置および電気光学装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60110194A (ja) * 1983-11-18 1985-06-15 株式会社ニコン 基板の洗浄装置
US4867186A (en) * 1988-08-15 1989-09-19 Shigeo Otsuka Chloro-fluoro-carbon liquid jetting immersion cleaning apparatus
JPH03253031A (ja) * 1990-03-01 1991-11-12 Hitachi Ltd 洗浄処理装置
CN2136064Y (zh) * 1992-09-16 1993-06-16 河南中医学院 多功能闪蒸装置
DE69520687T2 (de) * 1994-11-09 2001-08-23 R R Street & Co Verfahren und system zur aufbereitung von unter druck stehenden flüssigen lösungsmitteln zur reinigung von substraten

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0224538U (zh) * 1988-08-03 1990-02-19
JP2001203079A (ja) * 2000-01-18 2001-07-27 Toray Ind Inc 有機電界発光装置の製造方法
JP2001300446A (ja) * 2000-04-28 2001-10-30 Nippon Zeon Co Ltd 被洗浄物の洗浄方法
JP2003340384A (ja) * 2002-05-23 2003-12-02 Star Cluster:Kk 薄板状ワークの超音波洗浄装置
JP2005161190A (ja) * 2003-12-02 2005-06-23 Seiko Epson Corp 洗浄方法、洗浄装置および電気光学装置

Also Published As

Publication number Publication date
KR100661408B1 (ko) 2006-12-27
TW200617196A (en) 2006-06-01
JP2006100264A (ja) 2006-04-13
CN1746331A (zh) 2006-03-15
CN100567553C (zh) 2009-12-09
TWI298746B (en) 2008-07-11
KR20060050912A (ko) 2006-05-19

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