KR100621293B1 - 전자방출장치에서 과잉 이미터재료를 제거하기 위한 임피던스-이용 전기화학적 방법 및 전기화학 - Google Patents

전자방출장치에서 과잉 이미터재료를 제거하기 위한 임피던스-이용 전기화학적 방법 및 전기화학 Download PDF

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Publication number
KR100621293B1
KR100621293B1 KR1019997012036A KR19997012036A KR100621293B1 KR 100621293 B1 KR100621293 B1 KR 100621293B1 KR 1019997012036 A KR1019997012036 A KR 1019997012036A KR 19997012036 A KR19997012036 A KR 19997012036A KR 100621293 B1 KR100621293 B1 KR 100621293B1
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South Korea
Prior art keywords
delete delete
layer
emitter
impedance
electron
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KR1019997012036A
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English (en)
Korean (ko)
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KR20010014008A (ko
Inventor
낼엔.요한
포터존디.
스핀트크리스토퍼제이.
차카로바가브리엘라에스.
해븐듀안에이.
머콜레이존시.
바튼로저더블유.
니콜로바마리아에스.
시어슨피터시.
Original Assignee
컨데슨트 인터렉추얼 프로퍼티 서비시스 인코포레이티드
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Priority claimed from US08/884,701 external-priority patent/US6120674A/en
Priority claimed from US08/884,700 external-priority patent/US5893967A/en
Application filed by 컨데슨트 인터렉추얼 프로퍼티 서비시스 인코포레이티드 filed Critical 컨데슨트 인터렉추얼 프로퍼티 서비시스 인코포레이티드
Publication of KR20010014008A publication Critical patent/KR20010014008A/ko
Application granted granted Critical
Publication of KR100621293B1 publication Critical patent/KR100621293B1/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/022—Manufacture of electrodes or electrode systems of cold cathodes
    • H01J9/025—Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Cold Cathode And The Manufacture (AREA)
KR1019997012036A 1997-06-30 1998-06-29 전자방출장치에서 과잉 이미터재료를 제거하기 위한 임피던스-이용 전기화학적 방법 및 전기화학 KR100621293B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US08/884700 1997-06-30
US08/884,701 US6120674A (en) 1997-06-30 1997-06-30 Electrochemical removal of material in electron-emitting device
US08/884701 1997-06-30
US08/884,700 US5893967A (en) 1996-03-05 1997-06-30 Impedance-assisted electrochemical removal of material, particularly excess emitter material in electron-emitting device
PCT/US1998/012801 WO1999000537A1 (fr) 1997-06-30 1998-06-29 Technique electrochimique assistee par impedance et procede electrochimique permettant d'eliminer un materiau, notamment un materiau generateur d'excedents, dans un dispositif emetteur d'electrons

Publications (2)

Publication Number Publication Date
KR20010014008A KR20010014008A (ko) 2001-02-26
KR100621293B1 true KR100621293B1 (ko) 2006-09-13

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019997012036A KR100621293B1 (ko) 1997-06-30 1998-06-29 전자방출장치에서 과잉 이미터재료를 제거하기 위한 임피던스-이용 전기화학적 방법 및 전기화학

Country Status (4)

Country Link
EP (1) EP0993513B1 (fr)
JP (1) JP3648255B2 (fr)
KR (1) KR100621293B1 (fr)
WO (1) WO1999000537A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1014727C2 (nl) * 2000-03-23 2001-09-25 Univ Eindhoven Tech Werkwijze voor het elektrolytisch polijsten van een metaal in aanwezigheid van een elektrolytsamenstelling, alsmede een vormdeel verkregen volgens een dergelijke werkwijze.
JP4803998B2 (ja) * 2004-12-08 2011-10-26 ソニー株式会社 電界放出型電子放出素子の製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2928777A (en) * 1950-12-16 1960-03-15 Electro Process Inc Electrolytic polishing of metals

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4385971A (en) * 1981-06-26 1983-05-31 Rca Corporation Electrolytic etch for eliminating shorts and shunts in large area amorphous silicon solar cells
US4629539A (en) * 1982-07-08 1986-12-16 Tdk Corporation Metal layer patterning method
JPH0353099A (ja) * 1989-07-19 1991-03-07 Matsushita Electric Ind Co Ltd Ｔａ基材の加工方法
US5564959A (en) * 1993-09-08 1996-10-15 Silicon Video Corporation Use of charged-particle tracks in fabricating gated electron-emitting devices
GB9416754D0 (en) * 1994-08-18 1994-10-12 Isis Innovation Field emitter structures
US5828288A (en) * 1995-08-24 1998-10-27 Fed Corporation Pedestal edge emitter and non-linear current limiters for field emitter displays and other electron source applications
US5766446A (en) * 1996-03-05 1998-06-16 Candescent Technologies Corporation Electrochemical removal of material, particularly excess emitter material in electron-emitting device
JP4195109B2 (ja) * 1996-11-13 2008-12-10 荏原ユージライト株式会社 電解剥離用電解液および電解剥離方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2928777A (en) * 1950-12-16 1960-03-15 Electro Process Inc Electrolytic polishing of metals

Also Published As

Publication number Publication date
EP0993513B1 (fr) 2009-01-07
KR20010014008A (ko) 2001-02-26
EP0993513A1 (fr) 2000-04-19
JP3648255B2 (ja) 2005-05-18
WO1999000537A1 (fr) 1999-01-07
JP2001508834A (ja) 2001-07-03
EP0993513A4 (fr) 2001-04-04

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