KR100559719B1 - 반도체 소자의 고전압 트랜지스터 - Google Patents
반도체 소자의 고전압 트랜지스터 Download PDFInfo
- Publication number
- KR100559719B1 KR100559719B1 KR1020030088278A KR20030088278A KR100559719B1 KR 100559719 B1 KR100559719 B1 KR 100559719B1 KR 1020030088278 A KR1020030088278 A KR 1020030088278A KR 20030088278 A KR20030088278 A KR 20030088278A KR 100559719 B1 KR100559719 B1 KR 100559719B1
- Authority
- KR
- South Korea
- Prior art keywords
- region
- gate
- dummy gate
- high voltage
- drift region
- Prior art date
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 26
- 238000000034 method Methods 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 13
- 239000002184 metal Substances 0.000 claims description 12
- 125000006850 spacer group Chemical group 0.000 claims description 12
- 239000010410 layer Substances 0.000 description 10
- 230000005684 electric field Effects 0.000 description 8
- 238000002955 isolation Methods 0.000 description 5
- 239000011229 interlayer Substances 0.000 description 4
- 238000005468 ion implantation Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000005641 tunneling Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66545—Unipolar field-effect transistors with an insulated gate, i.e. MISFET using a dummy, i.e. replacement gate in a process wherein at least a part of the final gate is self aligned to the dummy gate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66568—Lateral single gate silicon transistors
- H01L29/66575—Lateral single gate silicon transistors where the source and drain or source and drain extensions are self-aligned to the sides of the gate
- H01L29/6659—Lateral single gate silicon transistors where the source and drain or source and drain extensions are self-aligned to the sides of the gate with both lightly doped source and drain extensions and source and drain self-aligned to the sides of the gate, e.g. lightly doped drain [LDD] MOSFET, double diffused drain [DDD] MOSFET
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Abstract
Description
Claims (4)
- 반도체 기판에 채널 영역을 사이에 두고 일정 거리 이격되어 형성된 소오스 영역과 드리프트 영역;상기 드리프트 영역 내에 형성된 드레인 영역;상기 소오스 영역 및 드리프트 영역과 일부 중첩되도록 형성된 게이트 산화막 및 게이트;상기 게이트 하부의 상기 소오스 영역과 드리프트 영역 사이에 형성된 채널 영역;상기 게이트로부터 일정 거리 이격되며, 상기 드레인 영역과 중첩되게 형성된 더미 게이트 산화막 및 더미 게이트;상기 게이트 및 상기 더미 게이트 양측벽에 형성된 스페이서 절연막; 및상기 더미 게이트 및 상기 드레인 영역이 전기적으로 연결되도록 형성된 금속배선을 포함하는 반도체 소자의 고전압 트랜지스터.
- 제 1 항에 있어서,상기 게이트는 상기 드리프트 영역에 일부분 오버랩되는 반도체 소자의 고전압 트랜지스터.
- 삭제
- 제 1 항에 있어서,상기 게이트와 상기 더미 게이트 사이는 스페이서 절연막에 의해 덮일 정도로 이격되는 반도체 소자의 고전압 트랜지스터.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020030088278A KR100559719B1 (ko) | 2003-12-05 | 2003-12-05 | 반도체 소자의 고전압 트랜지스터 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020030088278A KR100559719B1 (ko) | 2003-12-05 | 2003-12-05 | 반도체 소자의 고전압 트랜지스터 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20050055223A KR20050055223A (ko) | 2005-06-13 |
KR100559719B1 true KR100559719B1 (ko) | 2006-03-10 |
Family
ID=37250226
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020030088278A KR100559719B1 (ko) | 2003-12-05 | 2003-12-05 | 반도체 소자의 고전압 트랜지스터 |
Country Status (1)
Country | Link |
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KR (1) | KR100559719B1 (ko) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100739925B1 (ko) * | 2005-04-18 | 2007-07-16 | 주식회사 하이닉스반도체 | 플라즈마 전하로 인한 손상을 방지하는 비휘발성메모리소자 |
KR100702029B1 (ko) * | 2005-09-22 | 2007-03-30 | 삼성전자주식회사 | 플로팅된 드레인측 보조 게이트를 갖는 고전압 모스트랜지스터를 구비하는 비휘발성 메모리 소자들 및 그제조방법들 |
KR100891426B1 (ko) * | 2007-08-20 | 2009-04-02 | 주식회사 하이닉스반도체 | 반도체 소자 |
KR100915763B1 (ko) * | 2007-12-17 | 2009-09-04 | 주식회사 동부하이텍 | 반도체 소자 |
KR101699612B1 (ko) | 2015-05-28 | 2017-01-24 | 주식회사 동부하이텍 | 고전압 반도체 소자 및 그 제조 방법 |
KR102424768B1 (ko) | 2017-12-13 | 2022-07-25 | 주식회사 디비하이텍 | Pldmos 트랜지스터 및 이의 제조 방법 |
-
2003
- 2003-12-05 KR KR1020030088278A patent/KR100559719B1/ko active IP Right Grant
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Publication number | Publication date |
---|---|
KR20050055223A (ko) | 2005-06-13 |
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