KR100492135B1 - 페이스플레이트, 그 페이스플레이트를 포함하는 반응기 - Google Patents

페이스플레이트, 그 페이스플레이트를 포함하는 반응기 Download PDF

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Publication number
KR100492135B1
KR100492135B1 KR1019970053881A KR19970053881A KR100492135B1 KR 100492135 B1 KR100492135 B1 KR 100492135B1 KR 1019970053881 A KR1019970053881 A KR 1019970053881A KR 19970053881 A KR19970053881 A KR 19970053881A KR 100492135 B1 KR100492135 B1 KR 100492135B1
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South Korea
Prior art keywords
faceplate
showerhead
grooves
gas
reactor
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Expired - Fee Related
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KR1019970053881A
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English (en)
Korean (ko)
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KR19980033001A (ko
Inventor
자오 준
쉬레이버 알렉스
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어플라이드 머티어리얼스, 인코포레이티드
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Publication of KR19980033001A publication Critical patent/KR19980033001A/ko
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45565—Shower nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
KR1019970053881A 1996-10-21 1997-10-21 페이스플레이트, 그 페이스플레이트를 포함하는 반응기 Expired - Fee Related KR100492135B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/735,386 1996-10-21
US8/735,386 1996-10-21
US08/735,386 US5882411A (en) 1996-10-21 1996-10-21 Faceplate thermal choke in a CVD plasma reactor

Publications (2)

Publication Number Publication Date
KR19980033001A KR19980033001A (ko) 1998-07-25
KR100492135B1 true KR100492135B1 (ko) 2005-09-02

Family

ID=24955564

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019970053881A Expired - Fee Related KR100492135B1 (ko) 1996-10-21 1997-10-21 페이스플레이트, 그 페이스플레이트를 포함하는 반응기

Country Status (3)

Country Link
US (1) US5882411A (enExample)
JP (1) JP4371442B2 (enExample)
KR (1) KR100492135B1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210105139A (ko) 2020-02-18 2021-08-26 (주)포인트엔지니어링 가스 공급장치 및 이를 구비한 증착장치
KR20220067696A (ko) 2020-11-18 2022-05-25 (주)포인트엔지니어링 가스 공급부재 및 이를 구비한 기판처리장치

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Patent Citations (1)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210105139A (ko) 2020-02-18 2021-08-26 (주)포인트엔지니어링 가스 공급장치 및 이를 구비한 증착장치
KR20220067696A (ko) 2020-11-18 2022-05-25 (주)포인트엔지니어링 가스 공급부재 및 이를 구비한 기판처리장치

Also Published As

Publication number Publication date
JPH10144614A (ja) 1998-05-29
US5882411A (en) 1999-03-16
JP4371442B2 (ja) 2009-11-25
KR19980033001A (ko) 1998-07-25

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