KR100490325B1 - 2차원형 검출기를 이용한 박막 특성 측정 장치 및 그 측정 방법 - Google Patents

2차원형 검출기를 이용한 박막 특성 측정 장치 및 그 측정 방법 Download PDF

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Publication number
KR100490325B1
KR100490325B1 KR10-2002-0057581A KR20020057581A KR100490325B1 KR 100490325 B1 KR100490325 B1 KR 100490325B1 KR 20020057581 A KR20020057581 A KR 20020057581A KR 100490325 B1 KR100490325 B1 KR 100490325B1
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KR
South Korea
Prior art keywords
thin film
light
reflectance
sample substrate
thickness
Prior art date
Application number
KR10-2002-0057581A
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English (en)
Korean (ko)
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KR20030025891A (ko
Inventor
김영렬
박지종
김진용
이중환
Original Assignee
케이맥(주)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 케이맥(주) filed Critical 케이맥(주)
Priority to EP02798860A priority Critical patent/EP1430270A4/en
Priority to CNA028184084A priority patent/CN1556914A/zh
Priority to PCT/KR2002/001795 priority patent/WO2003025497A1/en
Priority to US10/489,108 priority patent/US7286242B2/en
Priority to JP2003529082A priority patent/JP4242767B2/ja
Priority to CN2006100064494A priority patent/CN1808056B/zh
Publication of KR20030025891A publication Critical patent/KR20030025891A/ko
Application granted granted Critical
Publication of KR100490325B1 publication Critical patent/KR100490325B1/ko
Priority to JP2008235547A priority patent/JP2009031301A/ja

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
KR10-2002-0057581A 2001-09-21 2002-09-23 2차원형 검출기를 이용한 박막 특성 측정 장치 및 그 측정 방법 KR100490325B1 (ko)

Priority Applications (7)

Application Number Priority Date Filing Date Title
EP02798860A EP1430270A4 (en) 2001-09-21 2002-09-23 METHOD AND DEVICE FOR MEASURING THE THICK PROFILE AND THE DISTRIBUTION OF THIN FILM MULTI-LAYER REFRACTIVE INDICES BY TWO-DIMENSIONAL REFLECTOMETRY
CNA028184084A CN1556914A (zh) 2001-09-21 2002-09-23 利用二维反射计测量多层薄膜的厚度轮廓和折射率分布的装置及其测量方法
PCT/KR2002/001795 WO2003025497A1 (en) 2001-09-21 2002-09-23 Apparatus for measuring thickness profile and refractive index distribution of multiple layers of thin films by means of two-dimensional reflectometry and method of measuring the same
US10/489,108 US7286242B2 (en) 2001-09-21 2002-09-23 Apparatus for measuring characteristics of thin film by means of two-dimensional detector and method of measuring the same
JP2003529082A JP4242767B2 (ja) 2001-09-21 2002-09-23 ２次元型検出器を用いた薄膜特性測定装置及びその測定方法
CN2006100064494A CN1808056B (zh) 2001-09-21 2002-09-23 利用二维检测器测量薄膜特性的装置及测量方法
JP2008235547A JP2009031301A (ja) 2001-09-21 2008-09-12 ２次元型検出器を用いた薄膜特性測定装置及びその測定方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20010058535 2001-09-21
KR1020010058535 2001-09-21

Publications (2)

Publication Number Publication Date
KR20030025891A KR20030025891A (ko) 2003-03-29
KR100490325B1 true KR100490325B1 (ko) 2005-05-17

Family

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Family Applications (1)

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KR10-2002-0057581A KR100490325B1 (ko) 2001-09-21 2002-09-23 2차원형 검출기를 이용한 박막 특성 측정 장치 및 그 측정 방법

Country Status (3)

Country Link
JP (1) JP2009031301A (zh)
KR (1) KR100490325B1 (zh)
CN (1) CN1808056B (zh)

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KR100947031B1 (ko) 2008-04-03 2010-03-11 한국과학기술원 3파장 광원을 이용한 위상물체의 굴절률과 두께 측정장치및 그 방법
WO2010110535A2 (ko) * 2009-03-23 2010-09-30 에스엔유 프리시젼 주식회사 반사도분포곡선의 모델링방법 및 이를 이용하는 두께 측정방법, 두께 측정 반사계
KR100990641B1 (ko) 2008-06-04 2010-10-29 삼성엘이디 주식회사 Ｌｅｄ 검사 장치 및 그 방법
KR101088911B1 (ko) 2010-07-23 2011-12-07 삼성엘이디 주식회사 발광 디바이스 제조 장치 및 발광 디바이스 제조 방법
CN102077051B (zh) * 2008-06-30 2012-11-28 株式会社Snu精密 厚度或表面形貌检测方法
KR101289826B1 (ko) * 2011-06-15 2013-07-26 삼성전자주식회사 Ｌｅｄ 검사 장치 및 그 방법
KR101650319B1 (ko) 2015-03-06 2016-08-24 에스엔유 프리시젼 주식회사 컬러 카메라를 이용한 두께 측정방법 및 두께 측정장치
KR101655096B1 (ko) 2015-04-23 2016-09-08 에스엔유 프리시젼 주식회사 박막의 두께 측정방법
KR20230001611A (ko) * 2021-06-28 2023-01-05 서울대학교산학협력단 3차원 반사도 곡면을 이용한 두께 측정 방법

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DE502004005147D1 (de) 2004-09-07 2007-11-15 Applied Materials Gmbh & Co Kg Verfahren zur Bestimmung von physikalischen Eigenschaften einer optischen Schicht oder eines Schichtsystems
KR100657154B1 (ko) * 2005-10-11 2006-12-13 동부일렉트로닉스 주식회사 보호층의 경화율 측정 방법
KR100936282B1 (ko) * 2007-07-13 2010-01-18 충북대학교 산학협력단 판유리의 굴절률 측정방법
KR101063753B1 (ko) * 2009-11-11 2011-09-14 한양대학교 산학협력단 텍스처가 형성된 시편에 증착된 박막의 특성 측정방법 및 이를 이용한 분광반사측정기
KR101388239B1 (ko) * 2012-11-19 2014-04-23 와이즈플래닛(주) 카메라와 가변파장 레이저를 이용한 다층막 두께 측정 검사장치
CN103673903A (zh) * 2013-12-23 2014-03-26 清华大学 薄膜厚度测量装置
JP6269183B2 (ja) * 2014-03-07 2018-01-31 株式会社リコー 屈折率測定装置
KR101699604B1 (ko) * 2015-01-16 2017-01-25 한양대학교 산학협력단 도포 균일성 검사 장치
KR102169436B1 (ko) * 2016-03-07 2020-10-26 에이에스엠엘 네델란즈 비.브이. 조명 시스템 및 계측 시스템
DE102017007140A1 (de) * 2016-10-18 2018-04-19 Reifenhäuser GmbH & Co. KG Maschinenfabrik Verfahren zum indirekten Ableiten einer systematischen Abhängigkeit zwischen einer Einstellgröße und einer optischen Eigenschaft einer Folienbahn, Verfahren zum Anpassen der Qualität einer Folienbahn, Verfahren zum Herstellen einer Folienbahn sowie Vorrichtung zum Herstellen einer Folienbahn
JP6568041B2 (ja) * 2016-10-25 2019-08-28 株式会社ブルービジョン 光源装置及び撮像システム
EP3346229B1 (en) * 2017-01-09 2022-03-30 Unity Semiconductor GmbH Method and assembly for determining the thickness of layers in a sample stack
JP2020106277A (ja) * 2018-12-26 2020-07-09 株式会社ディスコ 厚み計測装置、及び厚み計測装置を備えた加工装置
CN109764817A (zh) * 2019-01-14 2019-05-17 南京信息工程大学 非接触式透镜中心厚测量系统及方法
CN110044277B (zh) * 2019-04-04 2020-11-24 深圳市华星光电技术有限公司 框胶检测装置和框胶检测方法
JP7241663B2 (ja) * 2019-11-01 2023-03-17 東京エレクトロン株式会社 情報処理装置、情報処理方法、情報処理プログラム及び半導体製造装置
KR102273485B1 (ko) * 2019-12-05 2021-07-06 주식회사 신코 멀티형 형광측정기
CN112697080A (zh) * 2020-12-16 2021-04-23 长江存储科技有限责任公司 薄膜层厚度的测量方法
CN112798614A (zh) * 2020-12-25 2021-05-14 长江存储科技有限责任公司 一种半导体机台及检测方法
WO2022180829A1 (ja) * 2021-02-26 2022-09-01 日本電信電話株式会社 非接触測定法
CN113916775B (zh) * 2021-08-26 2024-05-03 中国工程物理研究院激光聚变研究中心 一种高辨识度漫反射靶
KR102609881B1 (ko) 2021-10-05 2023-12-05 한국광기술원 1차원 광센서를 이용한 2차원 형광 데이터 측정 장치
KR20230085350A (ko) 2021-12-07 2023-06-14 한국광기술원 1차원 광센서를 이용한 다중 웰 pcr 형광 측정 장치
CN115101437B (zh) * 2022-08-26 2024-02-06 合肥新晶集成电路有限公司 晶圆的测试方法、测试装置以及晶圆测试系统

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JPH08152307A (ja) * 1994-11-29 1996-06-11 Toray Ind Inc 光学定数測定方法およびその装置
JPH11173994A (ja) * 1997-09-22 1999-07-02 Hdi Instrumentation 光学的測定システム
WO2003025497A1 (en) * 2001-09-21 2003-03-27 Kmac Apparatus for measuring thickness profile and refractive index distribution of multiple layers of thin films by means of two-dimensional reflectometry and method of measuring the same

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US5805290A (en) * 1996-05-02 1998-09-08 International Business Machines Corporation Method of optical metrology of unresolved pattern arrays
JPH1114312A (ja) * 1997-06-24 1999-01-22 Toshiba Corp 成膜装置及びエッチング装置
JP3723392B2 (ja) * 1999-11-29 2005-12-07 大日本スクリーン製造株式会社 膜厚測定装置および膜厚測定方法

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US5291269A (en) * 1991-12-06 1994-03-01 Hughes Aircraft Company Apparatus and method for performing thin film layer thickness metrology on a thin film layer having shape deformations and local slope variations
JPH08152307A (ja) * 1994-11-29 1996-06-11 Toray Ind Inc 光学定数測定方法およびその装置
JPH11173994A (ja) * 1997-09-22 1999-07-02 Hdi Instrumentation 光学的測定システム
WO2003025497A1 (en) * 2001-09-21 2003-03-27 Kmac Apparatus for measuring thickness profile and refractive index distribution of multiple layers of thin films by means of two-dimensional reflectometry and method of measuring the same

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100947031B1 (ko) 2008-04-03 2010-03-11 한국과학기술원 3파장 광원을 이용한 위상물체의 굴절률과 두께 측정장치및 그 방법
KR100990641B1 (ko) 2008-06-04 2010-10-29 삼성엘이디 주식회사 Ｌｅｄ 검사 장치 및 그 방법
CN102077051B (zh) * 2008-06-30 2012-11-28 株式会社Snu精密 厚度或表面形貌检测方法
WO2010110535A2 (ko) * 2009-03-23 2010-09-30 에스엔유 프리시젼 주식회사 반사도분포곡선의 모델링방법 및 이를 이용하는 두께 측정방법, 두께 측정 반사계
WO2010110535A3 (ko) * 2009-03-23 2010-12-09 에스엔유 프리시젼 주식회사 반사도분포곡선의 모델링방법 및 이를 이용하는 두께 측정방법, 두께 측정 반사계
KR101107507B1 (ko) * 2009-03-23 2012-01-31 에스엔유 프리시젼 주식회사 반사도분포곡선의 모델링방법 및 이를 이용하는 두께 측정방법, 두께 측정 반사계
KR101088911B1 (ko) 2010-07-23 2011-12-07 삼성엘이디 주식회사 발광 디바이스 제조 장치 및 발광 디바이스 제조 방법
KR101289826B1 (ko) * 2011-06-15 2013-07-26 삼성전자주식회사 Ｌｅｄ 검사 장치 및 그 방법
KR101650319B1 (ko) 2015-03-06 2016-08-24 에스엔유 프리시젼 주식회사 컬러 카메라를 이용한 두께 측정방법 및 두께 측정장치
KR101655096B1 (ko) 2015-04-23 2016-09-08 에스엔유 프리시젼 주식회사 박막의 두께 측정방법
KR20230001611A (ko) * 2021-06-28 2023-01-05 서울대학교산학협력단 3차원 반사도 곡면을 이용한 두께 측정 방법
KR102570084B1 (ko) * 2021-06-28 2023-08-24 서울대학교산학협력단 3차원 반사도 곡면을 이용한 두께 측정 방법

Also Published As

Publication number Publication date
JP2009031301A (ja) 2009-02-12
CN1808056A (zh) 2006-07-26
KR20030025891A (ko) 2003-03-29
CN1808056B (zh) 2011-09-14

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