KR100332713B1 - 피처리체의표면세정장치및방법 - Google Patents

피처리체의표면세정장치및방법 Download PDF

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Publication number
KR100332713B1
KR100332713B1 KR1019970003738A KR19970003738A KR100332713B1 KR 100332713 B1 KR100332713 B1 KR 100332713B1 KR 1019970003738 A KR1019970003738 A KR 1019970003738A KR 19970003738 A KR19970003738 A KR 19970003738A KR 100332713 B1 KR100332713 B1 KR 100332713B1
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KR
South Korea
Prior art keywords
chamber
lamp
ultraviolet
ozone
exhaust
Prior art date
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Expired - Fee Related
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KR1019970003738A
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English (en)
Korean (ko)
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KR970062748A (ko
Inventor
겐고 미조사키
마사아키 요시다
Original Assignee
동경 엘렉트론 주식회사
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Application filed by 동경 엘렉트론 주식회사 filed Critical 동경 엘렉트론 주식회사
Publication of KR970062748A publication Critical patent/KR970062748A/ko
Application granted granted Critical
Publication of KR100332713B1 publication Critical patent/KR100332713B1/ko
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
    • H10W72/01371—
    • H10W72/07311—

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
KR1019970003738A 1996-02-08 1997-02-06 피처리체의표면세정장치및방법 Expired - Fee Related KR100332713B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP96-45613 1996-02-08
JP04561396A JP3166065B2 (ja) 1996-02-08 1996-02-08 処理装置及び処理方法

Publications (2)

Publication Number Publication Date
KR970062748A KR970062748A (ko) 1997-09-12
KR100332713B1 true KR100332713B1 (ko) 2002-12-18

Family

ID=12724234

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019970003738A Expired - Fee Related KR100332713B1 (ko) 1996-02-08 1997-02-06 피처리체의표면세정장치및방법

Country Status (4)

Country Link
US (1) US5998766A (enExample)
JP (1) JP3166065B2 (enExample)
KR (1) KR100332713B1 (enExample)
TW (1) TW315496B (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170000871U (ko) * 2015-08-31 2017-03-08 주식회사 광수헌 광학시트용 광 세정 챔버
KR20180004827A (ko) * 2015-06-02 2018-01-12 도쿄엘렉트론가부시키가이샤 스핀-온-카본 평탄화 기술

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7025831B1 (en) 1995-12-21 2006-04-11 Fsi International, Inc. Apparatus for surface conditioning
US6465374B1 (en) 1997-10-21 2002-10-15 Fsi International, Inc. Method of surface preparation
US6165273A (en) 1997-10-21 2000-12-26 Fsi International Inc. Equipment for UV wafer heating and photochemistry
US6222161B1 (en) * 1998-01-12 2001-04-24 Tokyo Electron Limited Heat treatment apparatus
US6248671B1 (en) 1998-08-19 2001-06-19 Micron Technology, Inc. Semiconductor processing apparatuses, and methods of forming antireflective coating materials over substrates
JP2000133736A (ja) * 1998-10-26 2000-05-12 Furukawa Electric Co Ltd:The 半導体レーザ素子の気密封止方法及び気密封止装置
KR100525730B1 (ko) * 1999-12-11 2005-11-03 엘지.필립스 엘시디 주식회사 습식 식각 장비 및 습식 식각 방법
JP3910821B2 (ja) 2000-10-26 2007-04-25 東京エレクトロン株式会社 基板の処理装置
US6715316B2 (en) * 2001-05-08 2004-04-06 Corning Incorporated Water-removable coatings for LCD glass
JP2003007579A (ja) 2001-06-19 2003-01-10 Matsushita Electric Ind Co Ltd 有機薄膜形成方法
KR100741893B1 (ko) * 2001-07-05 2007-07-23 엘지.필립스 엘시디 주식회사 액정패널 이송장치
KR100788389B1 (ko) * 2001-12-29 2007-12-31 엘지.필립스 엘시디 주식회사 배기 장치
JP4038557B2 (ja) * 2002-04-16 2008-01-30 リアライズ・アドバンストテクノロジ株式会社 レジスト除去装置及びレジスト除去方法
KR100505061B1 (ko) * 2003-02-12 2005-08-01 삼성전자주식회사 기판 이송 모듈
JP2004259734A (ja) * 2003-02-24 2004-09-16 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法
US8536492B2 (en) * 2003-10-27 2013-09-17 Applied Materials, Inc. Processing multilayer semiconductors with multiple heat sources
EP2006899A4 (en) * 2006-04-05 2011-12-28 Nikon Corp Stage apparatus, exposure apparatus, stage control method, exposure method and device manufacturing method
US8404572B2 (en) * 2009-02-13 2013-03-26 Taiwan Semiconductor Manufacturing Co., Ltd Multi-zone temperature control for semiconductor wafer
US9991141B2 (en) 2012-03-23 2018-06-05 SCREEN Holdings Co., Ltd. Substrate processing apparatus and heater cleaning method
JP5999625B2 (ja) * 2012-03-23 2016-09-28 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法
TWI512374B (zh) * 2013-11-05 2015-12-11 Au Optronics Corp 光配向設備與光配向方法
US9368378B2 (en) * 2013-12-31 2016-06-14 Sophia Wen Semiconductor wafer cleaning system
JP6323141B2 (ja) * 2014-04-18 2018-05-16 東京エレクトロン株式会社 基板処理装置
CN109641419B (zh) * 2016-08-18 2021-07-27 Ａｇｃ株式会社 层叠体、电子设备的制造方法、层叠体的制造方法
CN113331169B (zh) * 2021-06-04 2022-08-09 海南浙江大学研究院 针对水下设备的防污防生物附着设备

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2532783A1 (fr) * 1982-09-07 1984-03-09 Vu Duy Phach Machine de traitement thermique pour semiconducteurs
US4654509A (en) * 1985-10-07 1987-03-31 Epsilon Limited Partnership Method and apparatus for substrate heating in an axially symmetric epitaxial deposition apparatus
IL95975A (en) * 1989-10-24 1997-06-10 Takeda Chemical Industries Ltd N-benzyl- 2-alkylbenzimidazole derivatives, their production and pharmaceutical compositions containing them
US5127365A (en) * 1990-02-27 1992-07-07 Kabushiki Kaisha Toshiba Vertical heat-treatment apparatus for semiconductor parts
JPH0613361A (ja) * 1992-06-26 1994-01-21 Tokyo Electron Ltd 処理装置
JPH06151395A (ja) * 1992-11-10 1994-05-31 Matsushita Electric Ind Co Ltd Ｓｉ清浄表面形成方法
JP3380988B2 (ja) * 1993-04-21 2003-02-24 東京エレクトロン株式会社 熱処理装置
US5433791A (en) * 1994-05-26 1995-07-18 Hughes Aircraft Company MBE apparatus with photo-cracker cell

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180004827A (ko) * 2015-06-02 2018-01-12 도쿄엘렉트론가부시키가이샤 스핀-온-카본 평탄화 기술
KR102538281B1 (ko) * 2015-06-02 2023-05-30 도쿄엘렉트론가부시키가이샤 스핀-온-카본 평탄화 기술
KR20170000871U (ko) * 2015-08-31 2017-03-08 주식회사 광수헌 광학시트용 광 세정 챔버
KR200483391Y1 (ko) * 2015-08-31 2017-05-10 주식회사 다비스 광학시트용 광 세정 챔버

Also Published As

Publication number Publication date
US5998766A (en) 1999-12-07
JPH09219356A (ja) 1997-08-19
JP3166065B2 (ja) 2001-05-14
KR970062748A (ko) 1997-09-12
TW315496B (enExample) 1997-09-11

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