KR100332077B1 - 표면코팅의전기화학적전착방법 - Google Patents

표면코팅의전기화학적전착방법 Download PDF

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Publication number
KR100332077B1
KR100332077B1 KR1019950702238A KR19950702238A KR100332077B1 KR 100332077 B1 KR100332077 B1 KR 100332077B1 KR 1019950702238 A KR1019950702238 A KR 1019950702238A KR 19950702238 A KR19950702238 A KR 19950702238A KR 100332077 B1 KR100332077 B1 KR 100332077B1
Authority
KR
South Korea
Prior art keywords
current
current density
electrodeposition
seconds
surface coating
Prior art date
Application number
KR1019950702238A
Other languages
English (en)
Korean (ko)
Inventor
칼뮐
Original Assignee
로마바우-홀딩 아게
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=6499571&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=KR100332077(B1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from DE4334122A external-priority patent/DE4334122C2/de
Application filed by 로마바우-홀딩 아게 filed Critical 로마바우-홀딩 아게
Application granted granted Critical
Publication of KR100332077B1 publication Critical patent/KR100332077B1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/625—Discontinuous layers, e.g. microcracked layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B17/00—Methods preventing fouling
    • B08B17/02—Preventing deposition of fouling or of dust
    • B08B17/06—Preventing deposition of fouling or of dust by giving articles subject to fouling a special shape or arrangement
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B17/00—Methods preventing fouling
    • B08B17/02—Preventing deposition of fouling or of dust
    • B08B17/06—Preventing deposition of fouling or of dust by giving articles subject to fouling a special shape or arrangement
    • B08B17/065—Preventing deposition of fouling or of dust by giving articles subject to fouling a special shape or arrangement the surface having a microscopic surface pattern to achieve the same effect as a lotus flower
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
KR1019950702238A 1993-10-07 1994-10-01 표면코팅의전기화학적전착방법 KR100332077B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE4334122A DE4334122C2 (de) 1992-04-09 1993-10-07 Verfahren zum elektrochemischen Aufbringen einer Oberflächenbeschichtung und Anwendung des Verfahrens
DEP4334122.5 1993-10-07
PCT/EP1994/003314 WO1995009938A1 (de) 1993-10-07 1994-10-01 Verfahren zum galvanischen aufbringen einer oberflächenbeschichtung

Publications (1)

Publication Number Publication Date
KR100332077B1 true KR100332077B1 (ko) 2002-10-31

Family

ID=6499571

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950702238A KR100332077B1 (ko) 1993-10-07 1994-10-01 표면코팅의전기화학적전착방법

Country Status (17)

Country Link
EP (1) EP0722515B1 (zh)
JP (1) JP3293828B2 (zh)
KR (1) KR100332077B1 (zh)
CN (1) CN1044395C (zh)
AU (1) AU7784794A (zh)
BR (1) BR9405631A (zh)
CA (1) CA2172613C (zh)
CH (1) CH690273A5 (zh)
CZ (1) CZ286909B6 (zh)
DE (1) DE59405190D1 (zh)
ES (1) ES2114703T3 (zh)
FI (1) FI103674B (zh)
GR (1) GR3026689T3 (zh)
PL (1) PL177073B1 (zh)
SI (1) SI9420006B (zh)
SK (1) SK281999B6 (zh)
WO (1) WO1995009938A1 (zh)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19828545C1 (de) * 1998-06-26 1999-08-12 Cromotec Oberflaechentechnik G Galvanisches Bad, Verfahren zur Erzeugung strukturierter Hartchromschichten und Verwendung
US6478943B1 (en) 2000-06-01 2002-11-12 Roll Surface Technologies, Inc. Method of manufacture of electrochemically textured surface having controlled peak characteristics
WO2003004732A1 (en) * 2001-07-05 2003-01-16 Roll Surface Technologies, Inc. Electrochemically textured surface having controlled peak characteristics and the method of manufacture
DE10255853A1 (de) 2002-11-29 2004-06-17 Federal-Mogul Burscheid Gmbh Herstellung strukturierter Hartchromschichten
DE10302107A1 (de) 2003-01-21 2004-07-29 Fuchs Technology Ag Zylinderoberfläche
DE102004019370B3 (de) 2004-04-21 2005-09-01 Federal-Mogul Burscheid Gmbh Herstellung einer strukturierten Hartchromschicht und Herstellung einer Beschichtung
DE102008017270B3 (de) 2008-04-04 2009-06-04 Federal-Mogul Burscheid Gmbh Strukturierte Chrom-Feststoffpartikel-Schicht und Verfahren zu deren Herstellung sowie beschichtetes Maschinenelement
AT506076B1 (de) * 2008-06-03 2009-06-15 Vassilios Dipl Ing Polydoros Verfahren zur herstellung von nanostrukturierten chromschichten auf einem substrat
EP2149447A1 (de) 2008-07-29 2010-02-03 Alcan Technology & Management Ltd. Verfahren zur Herstellung einer Materialbahn mit Oberflächenstruktur
CN102877098B (zh) * 2012-10-29 2015-06-17 东莞市若美电子科技有限公司 一种多波段输出的脉冲电镀方法
EP3000918B1 (de) * 2014-09-24 2018-10-24 topocrom systems AG Verfahren zum galvanischen aufbringen einer oberflächenbeschichtung
CN105734631B (zh) * 2014-12-10 2019-03-19 上海宝钢工业技术服务有限公司 冷轧轧辊毛化处理的电镀方法
CN108350594B (zh) 2015-11-05 2020-09-11 托普克莱姆系统公司 用于电化学施加表面涂层的方法和装置
CN110117802B (zh) * 2019-05-06 2020-05-22 浙江大学 一种多级三维微观结构的制备方法
CN111962120A (zh) * 2020-08-18 2020-11-20 重庆佰鸿机械设备有限公司 一种管件内壁表面处理工艺
EP4012074A1 (de) 2020-12-14 2022-06-15 topocrom systems AG Oberflächenbeschichtung und verfahren zu ihrer herstellung

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5185073A (en) * 1988-06-21 1993-02-09 International Business Machines Corporation Method of fabricating nendritic materials

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD134785A1 (de) * 1978-01-25 1979-03-21 Hans Skilandat Verfahren zur elektrolytischen erzeugung eines kupfernen haftbelages auf kupferfolie
US4468293A (en) * 1982-03-05 1984-08-28 Olin Corporation Electrochemical treatment of copper for improving its bond strength
DE4211881C2 (de) * 1992-04-09 1994-07-28 Wmv Ag Verfahren zum elektrochemischen Aufbringen einer strukturierten Oberflächenbeschichtung

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5185073A (en) * 1988-06-21 1993-02-09 International Business Machines Corporation Method of fabricating nendritic materials

Also Published As

Publication number Publication date
BR9405631A (pt) 1999-09-08
PL177073B1 (pl) 1999-09-30
AU7784794A (en) 1995-05-01
GR3026689T3 (en) 1998-07-31
CA2172613C (en) 2003-06-17
CN1044395C (zh) 1999-07-28
SI9420006B (sl) 2002-02-28
CZ144795A3 (en) 1996-07-17
JPH09503550A (ja) 1997-04-08
SK86195A3 (en) 1996-03-06
FI952774A (fi) 1995-06-06
EP0722515B1 (de) 1998-01-28
CZ286909B6 (en) 2000-08-16
ES2114703T3 (es) 1998-06-01
CH690273A5 (de) 2000-06-30
SI9420006A (en) 1995-12-31
CA2172613A1 (en) 1995-04-13
FI103674B1 (fi) 1999-08-13
EP0722515A1 (de) 1996-07-24
JP3293828B2 (ja) 2002-06-17
FI952774A0 (fi) 1995-06-06
CN1115583A (zh) 1996-01-24
SK281999B6 (sk) 2001-10-08
FI103674B (fi) 1999-08-13
DE59405190D1 (de) 1998-03-05
WO1995009938A1 (de) 1995-04-13
PL309286A1 (en) 1995-10-02

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