KR100306087B1 - 세정장치 - Google Patents

세정장치 Download PDF

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Publication number
KR100306087B1
KR100306087B1 KR1019930030041A KR930030041A KR100306087B1 KR 100306087 B1 KR100306087 B1 KR 100306087B1 KR 1019930030041 A KR1019930030041 A KR 1019930030041A KR 930030041 A KR930030041 A KR 930030041A KR 100306087 B1 KR100306087 B1 KR 100306087B1
Authority
KR
South Korea
Prior art keywords
rectifying
cleaning
holes
substrate
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1019930030041A
Other languages
English (en)
Korean (ko)
Other versions
KR940016548A (ko
Inventor
요코미조겐지
다시마지하야
무카이에이이치
혼다요시유키
하라무라나오히코
무라카미신야
쵸노야스히로
Original Assignee
다카시마 히로시
도오교오에레구토론큐우슈우가부시끼가이샤
히가시 데쓰로
동경 엘렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 다카시마 히로시, 도오교오에레구토론큐우슈우가부시끼가이샤, 히가시 데쓰로, 동경 엘렉트론 주식회사 filed Critical 다카시마 히로시
Publication of KR940016548A publication Critical patent/KR940016548A/ko
Application granted granted Critical
Publication of KR100306087B1 publication Critical patent/KR100306087B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning In General (AREA)
KR1019930030041A 1992-12-26 1993-12-27 세정장치 Expired - Fee Related KR100306087B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP92-358224 1992-12-26
JP04358224A JP3118739B2 (ja) 1992-12-26 1992-12-26 洗浄装置

Related Child Applications (2)

Application Number Title Priority Date Filing Date
KR1019980017968A Division KR19990066686A (ko) 1992-12-26 1998-05-19 세정처리장치
KR1019980017969A Division KR19990066687A (ko) 1992-12-26 1998-05-19 세정장치

Publications (2)

Publication Number Publication Date
KR940016548A KR940016548A (ko) 1994-07-23
KR100306087B1 true KR100306087B1 (ko) 2001-11-30

Family

ID=18458186

Family Applications (3)

Application Number Title Priority Date Filing Date
KR1019930030041A Expired - Fee Related KR100306087B1 (ko) 1992-12-26 1993-12-27 세정장치
KR1019980017969A Ceased KR19990066687A (ko) 1992-12-26 1998-05-19 세정장치
KR1019980017968A Ceased KR19990066686A (ko) 1992-12-26 1998-05-19 세정처리장치

Family Applications After (2)

Application Number Title Priority Date Filing Date
KR1019980017969A Ceased KR19990066687A (ko) 1992-12-26 1998-05-19 세정장치
KR1019980017968A Ceased KR19990066686A (ko) 1992-12-26 1998-05-19 세정처리장치

Country Status (3)

Country Link
JP (1) JP3118739B2 (enrdf_load_stackoverflow)
KR (3) KR100306087B1 (enrdf_load_stackoverflow)
TW (1) TW238401B (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3328481B2 (ja) * 1995-10-13 2002-09-24 東京エレクトロン株式会社 処理方法および装置
KR101425813B1 (ko) * 2012-12-24 2014-08-05 주식회사 케이씨텍 웨이퍼의 침지식 세정 건조 장치
KR102137876B1 (ko) * 2018-08-29 2020-08-13 이한주 개폐식 기판 처리 장치 및 기판 처리 방법

Also Published As

Publication number Publication date
KR940016548A (ko) 1994-07-23
TW238401B (enrdf_load_stackoverflow) 1995-01-11
JP3118739B2 (ja) 2000-12-18
JPH06204199A (ja) 1994-07-22
KR19990066686A (ko) 1999-08-16
KR19990066687A (ko) 1999-08-16

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