KR100299211B1 - 기판처리장치 - Google Patents

기판처리장치 Download PDF

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Publication number
KR100299211B1
KR100299211B1 KR1019970031812A KR19970031812A KR100299211B1 KR 100299211 B1 KR100299211 B1 KR 100299211B1 KR 1019970031812 A KR1019970031812 A KR 1019970031812A KR 19970031812 A KR19970031812 A KR 19970031812A KR 100299211 B1 KR100299211 B1 KR 100299211B1
Authority
KR
South Korea
Prior art keywords
substrate
robot
processing unit
processing
wafer
Prior art date
Application number
KR1019970031812A
Other languages
English (en)
Korean (ko)
Other versions
KR980012047A (ko
Inventor
요시히로 고야마
쥰 와타나베
야스히로 미조하타
Original Assignee
이시다 아키라
다이닛뽕스크린 세이조오 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 이시다 아키라, 다이닛뽕스크린 세이조오 가부시키가이샤 filed Critical 이시다 아키라
Publication of KR980012047A publication Critical patent/KR980012047A/ko
Application granted granted Critical
Publication of KR100299211B1 publication Critical patent/KR100299211B1/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67766—Mechanical parts of transfer devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Robotics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
KR1019970031812A 1996-07-17 1997-07-09 기판처리장치 KR100299211B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP8187291A JPH1031316A (ja) 1996-07-17 1996-07-17 基板処理装置
JP96-187291 1996-07-17

Publications (2)

Publication Number Publication Date
KR980012047A KR980012047A (ko) 1998-04-30
KR100299211B1 true KR100299211B1 (ko) 2001-11-30

Family

ID=16203438

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019970031812A KR100299211B1 (ko) 1996-07-17 1997-07-09 기판처리장치

Country Status (2)

Country Link
JP (1) JPH1031316A (ja)
KR (1) KR100299211B1 (ja)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW444275B (en) 1998-01-13 2001-07-01 Toshiba Corp Processing device, laser annealing device, laser annealing method, manufacturing device and substrate manufacturing device for panel display
TW559855B (en) * 2000-09-06 2003-11-01 Olympus Optical Co Wafer transfer apparatus
JP2002134587A (ja) * 2000-10-26 2002-05-10 Tokyo Electron Ltd 被処理体の搬送機構及び処理システム
TW533460B (en) * 2001-03-09 2003-05-21 Tokyo Electron Ltd Processing apparatus
JP4796040B2 (ja) * 2001-03-09 2011-10-19 東京エレクトロン株式会社 基板処理装置、基板処理方法、および基板製造方法
JP4114737B2 (ja) * 2001-03-09 2008-07-09 東京エレクトロン株式会社 処理装置
JP4619562B2 (ja) * 2001-03-27 2011-01-26 東京エレクトロン株式会社 処理装置
JP3725051B2 (ja) * 2001-07-27 2005-12-07 大日本スクリーン製造株式会社 基板処理装置
KR100934769B1 (ko) * 2005-08-01 2009-12-30 주식회사 에이디피엔지니어링 기판 이송 시스템
JP4643630B2 (ja) * 2007-11-27 2011-03-02 東京エレクトロン株式会社 処理装置
JP2008124502A (ja) * 2008-02-01 2008-05-29 Yoshitake Ito 基板処理装置及び基板処理方法及び基板の製造方法及び電子機器

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR860007858A (ko) * 1985-03-18 1986-10-17 데무라 쯔요시 전자부품 세정 건조장치
KR920022411A (ko) * 1991-05-08 1992-12-19 이노우에 아키라 세정 장치

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR860007858A (ko) * 1985-03-18 1986-10-17 데무라 쯔요시 전자부품 세정 건조장치
KR920022411A (ko) * 1991-05-08 1992-12-19 이노우에 아키라 세정 장치

Also Published As

Publication number Publication date
KR980012047A (ko) 1998-04-30
JPH1031316A (ja) 1998-02-03

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