KR100265104B1 - 기판 처리 장치 및 방법 - Google Patents

기판 처리 장치 및 방법

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Publication number
KR100265104B1
KR100265104B1 KR1019970081835A KR19970081835A KR100265104B1 KR 100265104 B1 KR100265104 B1 KR 100265104B1 KR 1019970081835 A KR1019970081835 A KR 1019970081835A KR 19970081835 A KR19970081835 A KR 19970081835A KR 100265104 B1 KR100265104 B1 KR 100265104B1
Authority
KR
South Korea
Prior art keywords
substrate
speed
conveying
board
processing
Prior art date
Application number
KR1019970081835A
Other languages
English (en)
Korean (ko)
Other versions
KR19980079576A (ko
Inventor
야스마사 시마
Original Assignee
이시다 아키라
다이니폰 스크린 세이조우 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 이시다 아키라, 다이니폰 스크린 세이조우 가부시키가이샤 filed Critical 이시다 아키라
Publication of KR19980079576A publication Critical patent/KR19980079576A/ko
Application granted granted Critical
Publication of KR100265104B1 publication Critical patent/KR100265104B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975—Assembly, maintenance, transport or storage of apparatus

Landscapes

  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1019970081835A 1997-04-07 1997-12-31 기판 처리 장치 및 방법 KR100265104B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP97-88097 1997-04-07
JP08809797A JP3552187B2 (ja) 1997-04-07 1997-04-07 基板処理装置及び方法

Publications (2)

Publication Number Publication Date
KR19980079576A KR19980079576A (ko) 1998-11-25
KR100265104B1 true KR100265104B1 (ko) 2000-11-01

Family

ID=13933374

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019970081835A KR100265104B1 (ko) 1997-04-07 1997-12-31 기판 처리 장치 및 방법

Country Status (2)

Country Link
JP (1) JP3552187B2 (ja)
KR (1) KR100265104B1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200113114A (ko) * 2019-03-22 2020-10-06 주식회사 티케이씨 기판의 비접촉식 수직 처리시스템의 지그 이송장치
KR20200113113A (ko) * 2019-03-22 2020-10-06 주식회사 티케이씨 기판의 비접촉식 수직 처리시스템

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3968038B2 (ja) * 2003-03-04 2007-08-29 東京エレクトロン株式会社 基板処理方法及び基板処理装置及び現像処理方法及び現像処理装置
JP4691887B2 (ja) * 2004-03-04 2011-06-01 パナソニック株式会社 パターンの形成方法、パターンの形成装置およびプラズマディスプレイ用部材の製造方法
JP4899337B2 (ja) * 2005-05-09 2012-03-21 凸版印刷株式会社 現像装置
KR100854981B1 (ko) * 2007-10-10 2008-08-28 홍경표 인쇄회로기판 제조공정상의 습식공정 처리장치
JP2011198892A (ja) * 2010-03-18 2011-10-06 Dainippon Screen Mfg Co Ltd 基板洗浄処理装置
JP6360404B2 (ja) * 2014-09-30 2018-07-18 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
WO2018216612A1 (ja) * 2017-05-26 2018-11-29 シャープ株式会社 基板処理装置
CN107552522A (zh) * 2017-09-05 2018-01-09 深圳市华星光电技术有限公司 一种湿法剥离机的水洗装置及水洗方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200113114A (ko) * 2019-03-22 2020-10-06 주식회사 티케이씨 기판의 비접촉식 수직 처리시스템의 지그 이송장치
KR20200113113A (ko) * 2019-03-22 2020-10-06 주식회사 티케이씨 기판의 비접촉식 수직 처리시스템
KR102172665B1 (ko) * 2019-03-22 2020-11-03 주식회사 티케이씨 기판의 비접촉식 수직 처리시스템의 지그 이송장치
KR102172662B1 (ko) * 2019-03-22 2020-11-03 주식회사 티케이씨 기판의 비접촉식 수직 처리시스템

Also Published As

Publication number Publication date
JP3552187B2 (ja) 2004-08-11
KR19980079576A (ko) 1998-11-25
JPH10284379A (ja) 1998-10-23

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