JPWO2023189489A5 - - Google Patents

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Publication number
JPWO2023189489A5
JPWO2023189489A5 JP2024511697A JP2024511697A JPWO2023189489A5 JP WO2023189489 A5 JPWO2023189489 A5 JP WO2023189489A5 JP 2024511697 A JP2024511697 A JP 2024511697A JP 2024511697 A JP2024511697 A JP 2024511697A JP WO2023189489 A5 JPWO2023189489 A5 JP WO2023189489A5
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JP
Japan
Prior art keywords
semiconductor device
layer
metal oxide
region
oxide layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024511697A
Other languages
English (en)
Japanese (ja)
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JPWO2023189489A1 (https=
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/JP2023/009642 external-priority patent/WO2023189489A1/ja
Publication of JPWO2023189489A1 publication Critical patent/JPWO2023189489A1/ja
Publication of JPWO2023189489A5 publication Critical patent/JPWO2023189489A5/ja
Pending legal-status Critical Current

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JP2024511697A 2022-03-30 2023-03-13 Pending JPWO2023189489A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022057462 2022-03-30
PCT/JP2023/009642 WO2023189489A1 (ja) 2022-03-30 2023-03-13 半導体装置

Publications (2)

Publication Number Publication Date
JPWO2023189489A1 JPWO2023189489A1 (https=) 2023-10-05
JPWO2023189489A5 true JPWO2023189489A5 (https=) 2026-03-17

Family

ID=88200912

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024511697A Pending JPWO2023189489A1 (https=) 2022-03-30 2023-03-13

Country Status (4)

Country Link
US (1) US20250048680A1 (https=)
JP (1) JPWO2023189489A1 (https=)
CN (1) CN118661268A (https=)
WO (1) WO2023189489A1 (https=)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011142467A1 (en) * 2010-05-14 2011-11-17 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device
US8860023B2 (en) * 2012-05-01 2014-10-14 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
US9343579B2 (en) * 2013-05-20 2016-05-17 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
US11189736B2 (en) * 2015-07-24 2021-11-30 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof

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