JPWO2023120422A5 - - Google Patents

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JPWO2023120422A5
JPWO2023120422A5 JP2023521359A JP2023521359A JPWO2023120422A5 JP WO2023120422 A5 JPWO2023120422 A5 JP WO2023120422A5 JP 2023521359 A JP2023521359 A JP 2023521359A JP 2023521359 A JP2023521359 A JP 2023521359A JP WO2023120422 A5 JPWO2023120422 A5 JP WO2023120422A5
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JP
Japan
Prior art keywords
silicon nitride
nitride powder
powder according
less
ppm
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JP2023521359A
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English (en)
Japanese (ja)
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JP7337304B1 (ja
JPWO2023120422A1 (https=
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Priority claimed from PCT/JP2022/046411 external-priority patent/WO2023120422A1/ja
Publication of JPWO2023120422A1 publication Critical patent/JPWO2023120422A1/ja
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Publication of JP7337304B1 publication Critical patent/JP7337304B1/ja
Publication of JPWO2023120422A5 publication Critical patent/JPWO2023120422A5/ja
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JP2023521359A 2021-12-22 2022-12-16 窒化ケイ素粉末 Active JP7337304B1 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021207697 2021-12-22
JP2021207697 2021-12-22
PCT/JP2022/046411 WO2023120422A1 (ja) 2021-12-22 2022-12-16 窒化ケイ素粉末

Publications (3)

Publication Number Publication Date
JPWO2023120422A1 JPWO2023120422A1 (https=) 2023-06-29
JP7337304B1 JP7337304B1 (ja) 2023-09-01
JPWO2023120422A5 true JPWO2023120422A5 (https=) 2023-11-22

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ID=86902645

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JP2023521359A Active JP7337304B1 (ja) 2021-12-22 2022-12-16 窒化ケイ素粉末

Country Status (6)

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US (1) US20250083958A1 (https=)
EP (1) EP4455078A4 (https=)
JP (1) JP7337304B1 (https=)
KR (1) KR20240125576A (https=)
CN (1) CN118401467A (https=)
WO (1) WO2023120422A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN121605092A (zh) * 2023-07-28 2026-03-03 株式会社德山 氮化硅烧结体

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60186476A (ja) * 1984-03-06 1985-09-21 京セラ株式会社 窒化珪素質焼結体及びその製造方法
JPH07102993B2 (ja) * 1986-09-27 1995-11-08 日産自動車株式会社 窒化珪素質焼結体の製造方法
JP3194494B2 (ja) * 1992-07-29 2001-07-30 電気化学工業株式会社 窒化珪素粉末の製造方法
WO1996020144A1 (en) * 1994-12-28 1996-07-04 Sumitomo Electric Industries, Ltd. Silicon nitride sinter and process for producing the same
US6143677A (en) * 1997-09-03 2000-11-07 Sumitomo Electric Industries, Ltd. Silicon nitride sinter having high thermal conductivity and process for preparing the same
JP4256012B2 (ja) 1999-03-23 2009-04-22 修 山田 燃焼合成反応によるBN、AlN又はSi3N4の製造方法
JP3648541B2 (ja) 2000-10-19 2005-05-18 独立行政法人産業技術総合研究所 高熱伝導窒化ケイ素セラミックス並びにその製造方法
TWI657043B (zh) * 2016-12-12 2019-04-21 日商宇部興產股份有限公司 氮化矽粉末及氮化矽燒結體之製造方法
JP2020023406A (ja) * 2016-12-12 2020-02-13 宇部興産株式会社 高純度窒化ケイ素粉末の製造方法
JP7358331B2 (ja) 2018-02-28 2023-10-10 株式会社トクヤマ 窒化ケイ素粉末の製造方法
EP4067302A4 (en) 2019-11-28 2024-05-15 Tokuyama Corporation METHOD FOR PRODUCING A SILICON NITRIDE SINTERED BODY
JP7353994B2 (ja) * 2020-01-17 2023-10-02 株式会社トクヤマ 窒化ケイ素の製造方法
EP4174020A4 (en) * 2020-06-30 2025-07-02 Tokuyama Corp SINTERED SILICON NITRIDE SUBSTRATE
US12610461B2 (en) * 2020-08-12 2026-04-21 Tokuyama Corporation Laminate for circuit board

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