JPWO2023176893A5 - - Google Patents

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Publication number
JPWO2023176893A5
JPWO2023176893A5 JP2024508227A JP2024508227A JPWO2023176893A5 JP WO2023176893 A5 JPWO2023176893 A5 JP WO2023176893A5 JP 2024508227 A JP2024508227 A JP 2024508227A JP 2024508227 A JP2024508227 A JP 2024508227A JP WO2023176893 A5 JPWO2023176893 A5 JP WO2023176893A5
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JP
Japan
Prior art keywords
mass
less
silicon nitride
oxygen content
nitride powder
Prior art date
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Pending
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JP2024508227A
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English (en)
Japanese (ja)
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JPWO2023176893A1 (https=
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Priority claimed from PCT/JP2023/010125 external-priority patent/WO2023176893A1/ja
Publication of JPWO2023176893A1 publication Critical patent/JPWO2023176893A1/ja
Publication of JPWO2023176893A5 publication Critical patent/JPWO2023176893A5/ja
Pending legal-status Critical Current

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JP2024508227A 2022-03-18 2023-03-15 Pending JPWO2023176893A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022044684 2022-03-18
PCT/JP2023/010125 WO2023176893A1 (ja) 2022-03-18 2023-03-15 窒化ケイ素粉末、および窒化ケイ素質焼結体の製造方法

Publications (2)

Publication Number Publication Date
JPWO2023176893A1 JPWO2023176893A1 (https=) 2023-09-21
JPWO2023176893A5 true JPWO2023176893A5 (https=) 2026-03-23

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ID=88023924

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024508227A Pending JPWO2023176893A1 (https=) 2022-03-18 2023-03-15

Country Status (3)

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EP (1) EP4495065A4 (https=)
JP (1) JPWO2023176893A1 (https=)
WO (1) WO2023176893A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024195605A1 (ja) * 2023-03-22 2024-09-26 デンカ株式会社 窒化ケイ素仮焼体及びその製造方法、並びに、窒化ケイ素粉末の製造方法
WO2025089218A1 (ja) * 2023-10-23 2025-05-01 株式会社トクヤマ 窒化ケイ素焼結体基板
WO2025234337A1 (ja) * 2024-05-10 2025-11-13 Dic株式会社 多孔質シリコンナイトライド複合材料、燃料電池用電極及び多孔質シリコンナイトライド複合材料の製造方法
WO2025258653A1 (ja) * 2024-06-13 2025-12-18 Ｕｂｅ株式会社 結晶質窒化ケイ素粉末、該粉末を含む窒化ケイ素焼結体、窒化ケイ素焼結体の製造方法、該焼結体を含む物品、および車両

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH087441B2 (ja) 1986-12-29 1996-01-29 凸版印刷株式会社 ポジ型高感度放射線感応性レジスト
JP2872528B2 (ja) 1993-05-25 1999-03-17 宇部興産株式会社 窒化珪素粉末
JP3438928B2 (ja) * 1994-01-12 2003-08-18 電気化学工業株式会社 窒化珪素粉末の製造方法
JPH0812306A (ja) * 1994-07-01 1996-01-16 Ube Ind Ltd 窒化ケイ素粉末
JP3322033B2 (ja) * 1994-10-14 2002-09-09 宇部興産株式会社 結晶質窒化珪素粉末
JP5176627B2 (ja) 2008-03-19 2013-04-03 三菱マテリアル株式会社 パワーモジュール用基板のセラミックス基板、パワーモジュール用基板のセラミックス基板の製造方法及びパワーモジュール用基板の製造方法
KR101652616B1 (ko) 2012-03-28 2016-08-30 우베 고산 가부시키가이샤 질화규소 분말의 제조 방법 및 질화규소 분말, 및 질화규소 소결체 및 그것을 이용한 회로 기판
US20160159648A1 (en) * 2013-07-11 2016-06-09 Ube Industries, Ltd. Silicon nitride powder for mold release agent of casting mold for casting polycrystalline silicon ingot and method for manufacturing said silicon nitride powder, slurry containing said silicon nitride powder, casting mold for casting polycrystalline silicon ingot and method for manufacturing same, and method for manufacturing polycrystalline silicon ingot using said casting mold
TW202140407A (zh) 2020-03-30 2021-11-01 日商電化股份有限公司 氮化矽粉末、以及氮化矽燒結體之製造方法

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