JPWO2022210179A5 - - Google Patents
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- Publication number
- JPWO2022210179A5 JPWO2022210179A5 JP2022552849A JP2022552849A JPWO2022210179A5 JP WO2022210179 A5 JPWO2022210179 A5 JP WO2022210179A5 JP 2022552849 A JP2022552849 A JP 2022552849A JP 2022552849 A JP2022552849 A JP 2022552849A JP WO2022210179 A5 JPWO2022210179 A5 JP WO2022210179A5
- Authority
- JP
- Japan
- Prior art keywords
- peak
- silicon nitride
- particle size
- powder according
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052581 Si3N4 Inorganic materials 0.000 claims 12
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 12
- 239000002245 particle Substances 0.000 claims 11
- 239000000843 powder Substances 0.000 claims 8
- 238000007561 laser diffraction method Methods 0.000 claims 2
- 239000011164 primary particle Substances 0.000 claims 2
- 238000000790 scattering method Methods 0.000 claims 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 239000002994 raw material Substances 0.000 claims 1
- 238000005245 sintering Methods 0.000 claims 1
- 239000002002 slurry Substances 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021057675 | 2021-03-30 | ||
| JP2021057675 | 2021-03-30 | ||
| PCT/JP2022/013589 WO2022210179A1 (ja) | 2021-03-30 | 2022-03-23 | 窒化ケイ素粉末、及び窒化ケイ素焼結体の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2022210179A1 JPWO2022210179A1 (https=) | 2022-10-06 |
| JP7223918B1 JP7223918B1 (ja) | 2023-02-16 |
| JPWO2022210179A5 true JPWO2022210179A5 (https=) | 2023-03-01 |
Family
ID=83456806
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022552849A Active JP7223918B1 (ja) | 2021-03-30 | 2022-03-23 | 窒化ケイ素粉末、及び窒化ケイ素焼結体の製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP7223918B1 (https=) |
| WO (1) | WO2022210179A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2026005005A1 (ja) * | 2024-06-28 | 2026-01-02 | Ｕｂｅ株式会社 | ３ｄ造形用窒化ケイ素粉末、樹脂組成物、前駆体、窒化ケイ素質焼結体、物品、樹脂組成物の製造方法、および窒化ケイ素質焼結体の製造方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002265276A (ja) * | 2001-03-07 | 2002-09-18 | Hitachi Metals Ltd | 窒化ケイ素粉末および窒化ケイ素焼結体 |
| CN102206082A (zh) * | 2011-03-03 | 2011-10-05 | 北方民族大学 | 一种制备亚微米氮化硅的方法 |
| JP2013203613A (ja) * | 2012-03-29 | 2013-10-07 | Ube Industries Ltd | 窒化ケイ素粉末の管理方法 |
| JP6354367B2 (ja) * | 2014-06-16 | 2018-07-11 | 宇部興産株式会社 | 多結晶シリコンインゴット鋳造用鋳型の離型剤用窒化ケイ素粉末及びその製造方法、多結晶シリコンインゴット鋳造用鋳型の離型剤用窒化ケイ素粉末含有スラリー、ならびに多結晶シリコンインゴット鋳造用鋳型及びその製造方法 |
-
2022
- 2022-03-23 WO PCT/JP2022/013589 patent/WO2022210179A1/ja not_active Ceased
- 2022-03-23 JP JP2022552849A patent/JP7223918B1/ja active Active
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