JPWO2023067957A5 - - Google Patents

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Publication number
JPWO2023067957A5
JPWO2023067957A5 JP2023515782A JP2023515782A JPWO2023067957A5 JP WO2023067957 A5 JPWO2023067957 A5 JP WO2023067957A5 JP 2023515782 A JP2023515782 A JP 2023515782A JP 2023515782 A JP2023515782 A JP 2023515782A JP WO2023067957 A5 JPWO2023067957 A5 JP WO2023067957A5
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JP
Japan
Prior art keywords
euv
main
main layer
membrane according
layer
Prior art date
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Granted
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JP2023515782A
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English (en)
Japanese (ja)
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JPWO2023067957A1 (https=
JP7498855B2 (ja
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Publication date
Priority claimed from PCT/JP2021/038811 external-priority patent/WO2023067739A1/ja
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Publication of JPWO2023067957A1 publication Critical patent/JPWO2023067957A1/ja
Publication of JPWO2023067957A5 publication Critical patent/JPWO2023067957A5/ja
Application granted granted Critical
Publication of JP7498855B2 publication Critical patent/JP7498855B2/ja
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JP2023515782A 2021-10-20 2022-09-15 Euv透過膜 Active JP7498855B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPPCT/JP2021/038811 2021-10-20
PCT/JP2021/038811 WO2023067739A1 (ja) 2021-10-20 2021-10-20 Euv透過膜
PCT/JP2022/034590 WO2023067957A1 (ja) 2021-10-20 2022-09-15 Euv透過膜

Publications (3)

Publication Number Publication Date
JPWO2023067957A1 JPWO2023067957A1 (https=) 2023-04-27
JPWO2023067957A5 true JPWO2023067957A5 (https=) 2023-09-21
JP7498855B2 JP7498855B2 (ja) 2024-06-12

Family

ID=86058073

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2023507498A Active JP7492649B2 (ja) 2021-10-20 2021-10-20 Euv透過膜
JP2023515782A Active JP7498855B2 (ja) 2021-10-20 2022-09-15 Euv透過膜
JP2024064701A Active JP7598504B2 (ja) 2021-10-20 2024-04-12 Euv透過膜

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2023507498A Active JP7492649B2 (ja) 2021-10-20 2021-10-20 Euv透過膜

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2024064701A Active JP7598504B2 (ja) 2021-10-20 2024-04-12 Euv透過膜

Country Status (7)

Country Link
US (2) US12591172B2 (https=)
EP (3) EP4194948A4 (https=)
JP (3) JP7492649B2 (https=)
KR (2) KR102891816B1 (https=)
CN (2) CN118076920A (https=)
TW (1) TW202328806A (https=)
WO (2) WO2023067739A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024057499A1 (ja) * 2022-09-15 2024-03-21 日本碍子株式会社 Euv透過膜
EP4636488A1 (en) * 2024-02-29 2025-10-22 Ngk Insulators, Ltd. Euv transmissive film, method for processing same, and light exposure method
KR20250134066A (ko) * 2024-02-29 2025-09-09 엔지케이 인슐레이터 엘티디 Euv 투과막, 펠리클 및 노광 방법

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62114738A (ja) 1985-11-14 1987-05-26 Toshikazu Okuno コイリングマシン
JPH01162332A (ja) * 1987-12-18 1989-06-26 Sharp Corp X線リソグラフィ用マスクメンブレン
JPH10340843A (ja) * 1997-06-06 1998-12-22 Nikon Corp 照明装置および露光装置
JP2000338299A (ja) 1999-05-28 2000-12-08 Mitsubishi Electric Corp X線露光装置、x線露光方法、x線マスク、x線ミラー、シンクロトロン放射装置、シンクロトロン放射方法および半導体装置
JP2001221689A (ja) * 2000-02-08 2001-08-17 Yokogawa Electric Corp 赤外線光源及び赤外線ガス分析計
US7456932B2 (en) * 2003-07-25 2008-11-25 Asml Netherlands B.V. Filter window, lithographic projection apparatus, filter window manufacturing method, device manufacturing method and device manufactured thereby
JP4928494B2 (ja) 2008-05-02 2012-05-09 信越化学工業株式会社 ペリクルおよびペリクルの製造方法
JP6308592B2 (ja) * 2014-04-02 2018-04-11 信越化学工業株式会社 Euv用ペリクル
KR102604554B1 (ko) 2014-07-04 2023-11-22 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 내에서 사용하는 멤브레인 및 이러한멤브레인을 포함한 리소그래피 장치
KR102186010B1 (ko) * 2016-01-26 2020-12-04 한양대학교 산학협력단 Euv 펠리클 구조체, 및 그 제조 방법
JP6518801B2 (ja) * 2017-03-10 2019-05-22 エスアンドエス テック カンパニー リミテッド 極紫外線リソグラフィ用ペリクル及びその製造方法
EP3404487B1 (en) 2017-05-15 2021-12-01 IMEC vzw Method for forming a carbon nanotube pellicle membrane
CN118707800A (zh) * 2017-11-06 2024-09-27 Asml荷兰有限公司 用于降低应力的金属硅氮化物
EP3724721A1 (en) 2017-12-12 2020-10-21 ASML Netherlands B.V. Apparatus and method for determining a condition associated with a pellicle
NL2023932B1 (en) * 2018-10-15 2020-08-19 Asml Netherlands Bv Method of manufacturing a membrane assembly
NL2027098B1 (en) 2020-01-16 2021-10-14 Asml Netherlands Bv Pellicle membrane for a lithographic apparatus
WO2024057499A1 (ja) * 2022-09-15 2024-03-21 日本碍子株式会社 Euv透過膜

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