JPWO2022239722A5 - - Google Patents
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- Publication number
- JPWO2022239722A5 JPWO2022239722A5 JP2023521008A JP2023521008A JPWO2022239722A5 JP WO2022239722 A5 JPWO2022239722 A5 JP WO2022239722A5 JP 2023521008 A JP2023521008 A JP 2023521008A JP 2023521008 A JP2023521008 A JP 2023521008A JP WO2022239722 A5 JPWO2022239722 A5 JP WO2022239722A5
- Authority
- JP
- Japan
- Prior art keywords
- electrode layer
- dielectric film
- semiconductor device
- external electrode
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010410 layer Substances 0.000 claims 11
- 239000004065 semiconductor Substances 0.000 claims 5
- 239000011241 protective layer Substances 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 229910052581 Si3N4 Inorganic materials 0.000 claims 1
- 230000000149 penetrating effect Effects 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021079849 | 2021-05-10 | ||
| JP2021079849 | 2021-05-10 | ||
| PCT/JP2022/019625 WO2022239722A1 (ja) | 2021-05-10 | 2022-05-09 | 半導体装置、マッチング回路及びフィルタ回路 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2022239722A1 JPWO2022239722A1 (https=) | 2022-11-17 |
| JPWO2022239722A5 true JPWO2022239722A5 (https=) | 2024-02-13 |
| JP7563591B2 JP7563591B2 (ja) | 2024-10-08 |
Family
ID=84029626
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023521008A Active JP7563591B2 (ja) | 2021-05-10 | 2022-05-09 | 半導体装置、マッチング回路及びフィルタ回路 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20240072107A1 (https=) |
| JP (1) | JP7563591B2 (https=) |
| CN (1) | CN117242538A (https=) |
| WO (1) | WO2022239722A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2024252872A1 (https=) * | 2023-06-07 | 2024-12-12 | ||
| JPWO2024252871A1 (https=) * | 2023-06-07 | 2024-12-12 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019026771A1 (ja) * | 2017-07-31 | 2019-02-07 | 株式会社村田製作所 | キャパシタ |
| DE102019204503B3 (de) * | 2018-10-09 | 2020-03-26 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Integrierter Kondensator und Verfahren zur Herstellung eines integrierten Kondensators |
-
2022
- 2022-05-09 CN CN202280032701.6A patent/CN117242538A/zh active Pending
- 2022-05-09 WO PCT/JP2022/019625 patent/WO2022239722A1/ja not_active Ceased
- 2022-05-09 JP JP2023521008A patent/JP7563591B2/ja active Active
-
2023
- 2023-11-06 US US18/502,482 patent/US20240072107A1/en active Pending
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