JPWO2022050386A5 - - Google Patents
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- Publication number
- JPWO2022050386A5 JPWO2022050386A5 JP2022546987A JP2022546987A JPWO2022050386A5 JP WO2022050386 A5 JPWO2022050386 A5 JP WO2022050386A5 JP 2022546987 A JP2022546987 A JP 2022546987A JP 2022546987 A JP2022546987 A JP 2022546987A JP WO2022050386 A5 JPWO2022050386 A5 JP WO2022050386A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- component
- cleaning
- resin mask
- hydrogen atom
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020149274 | 2020-09-04 | ||
| JP2020149274 | 2020-09-04 | ||
| PCT/JP2021/032486 WO2022050386A1 (ja) | 2020-09-04 | 2021-09-03 | 基板の洗浄方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2022050386A1 JPWO2022050386A1 (https=) | 2022-03-10 |
| JPWO2022050386A5 true JPWO2022050386A5 (https=) | 2024-06-21 |
| JP7739305B2 JP7739305B2 (ja) | 2025-09-16 |
Family
ID=80491086
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022546987A Active JP7739305B2 (ja) | 2020-09-04 | 2021-09-03 | 基板の洗浄方法 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP7739305B2 (https=) |
| KR (1) | KR102902784B1 (https=) |
| CN (2) | CN121736843A (https=) |
| TW (1) | TWI911270B (https=) |
| WO (1) | WO2022050386A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN118295222B (zh) * | 2024-05-06 | 2025-08-12 | 惠州达诚微电子材料有限公司 | 一种光刻胶用剥离液及其制备方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4033419A1 (de) * | 1990-10-20 | 1992-04-23 | Wolman Gmbh Dr | Polymere stickstoffverbindungen und metall fixierende saeuren enthaltende holzschutzmittel |
| JP4138096B2 (ja) * | 1998-09-09 | 2008-08-20 | 花王株式会社 | 剥離剤組成物 |
| JP4296320B2 (ja) * | 1999-06-21 | 2009-07-15 | ナガセケムテックス株式会社 | レジスト剥離剤組成物及びその使用方法 |
| US6723691B2 (en) * | 1999-11-16 | 2004-04-20 | Advanced Technology Materials, Inc. | Post chemical-mechanical planarization (CMP) cleaning composition |
| JP4267359B2 (ja) * | 2002-04-26 | 2009-05-27 | 花王株式会社 | レジスト用剥離剤組成物 |
| TWI315030B (en) * | 2003-06-26 | 2009-09-21 | Dongwoo Fine Chem Co Ltd | Photoresist stripper composition, and exfoliation method of a photoresist using it |
| US8778212B2 (en) * | 2012-05-22 | 2014-07-15 | Cabot Microelectronics Corporation | CMP composition containing zirconia particles and method of use |
| KR102338550B1 (ko) | 2013-06-06 | 2021-12-14 | 엔테그리스, 아이엔씨. | 질화 티타늄의 선택적인 에칭을 위한 조성물 및 방법 |
| JP7136894B2 (ja) * | 2018-06-26 | 2022-09-13 | 旭化成株式会社 | 感光性樹脂組成物、硬化レリーフパターンの製造方法、及び半導体装置 |
-
2021
- 2021-09-03 JP JP2022546987A patent/JP7739305B2/ja active Active
- 2021-09-03 WO PCT/JP2021/032486 patent/WO2022050386A1/ja not_active Ceased
- 2021-09-03 CN CN202511909233.8A patent/CN121736843A/zh active Pending
- 2021-09-03 TW TW110132940A patent/TWI911270B/zh active
- 2021-09-03 KR KR1020237008109A patent/KR102902784B1/ko active Active
- 2021-09-03 CN CN202180052691.8A patent/CN116018397A/zh active Pending
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