TWI911270B - 基板之洗淨方法 - Google Patents

基板之洗淨方法

Info

Publication number
TWI911270B
TWI911270B TW110132940A TW110132940A TWI911270B TW I911270 B TWI911270 B TW I911270B TW 110132940 A TW110132940 A TW 110132940A TW 110132940 A TW110132940 A TW 110132940A TW I911270 B TWI911270 B TW I911270B
Authority
TW
Taiwan
Prior art keywords
component
mass
resin mask
cleaning
formula
Prior art date
Application number
TW110132940A
Other languages
English (en)
Chinese (zh)
Other versions
TW202214831A (zh
Inventor
山田晃平
鄭敬騰
Original Assignee
日商花王股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商花王股份有限公司 filed Critical 日商花王股份有限公司
Publication of TW202214831A publication Critical patent/TW202214831A/zh
Application granted granted Critical
Publication of TWI911270B publication Critical patent/TWI911270B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/265—Carboxylic acids or salts thereof
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Emergency Medicine (AREA)
  • Health & Medical Sciences (AREA)
  • Detergent Compositions (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
TW110132940A 2020-09-04 2021-09-03 基板之洗淨方法 TWI911270B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020-149274 2020-09-04
JP2020149274 2020-09-04

Publications (2)

Publication Number Publication Date
TW202214831A TW202214831A (zh) 2022-04-16
TWI911270B true TWI911270B (zh) 2026-01-11

Family

ID=80491086

Family Applications (1)

Application Number Title Priority Date Filing Date
TW110132940A TWI911270B (zh) 2020-09-04 2021-09-03 基板之洗淨方法

Country Status (5)

Country Link
JP (1) JP7739305B2 (https=)
KR (1) KR102902784B1 (https=)
CN (2) CN121736843A (https=)
TW (1) TWI911270B (https=)
WO (1) WO2022050386A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118295222B (zh) * 2024-05-06 2025-08-12 惠州达诚微电子材料有限公司 一种光刻胶用剥离液及其制备方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010004633A1 (en) * 1999-11-16 2001-06-21 Esc, Inc. Post chemical-mechanical planarization (CMP) cleaning composition

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4033419A1 (de) * 1990-10-20 1992-04-23 Wolman Gmbh Dr Polymere stickstoffverbindungen und metall fixierende saeuren enthaltende holzschutzmittel
JP4138096B2 (ja) * 1998-09-09 2008-08-20 花王株式会社 剥離剤組成物
JP4296320B2 (ja) * 1999-06-21 2009-07-15 ナガセケムテックス株式会社 レジスト剥離剤組成物及びその使用方法
JP4267359B2 (ja) * 2002-04-26 2009-05-27 花王株式会社 レジスト用剥離剤組成物
TWI315030B (en) * 2003-06-26 2009-09-21 Dongwoo Fine Chem Co Ltd Photoresist stripper composition, and exfoliation method of a photoresist using it
US8778212B2 (en) * 2012-05-22 2014-07-15 Cabot Microelectronics Corporation CMP composition containing zirconia particles and method of use
KR102338550B1 (ko) 2013-06-06 2021-12-14 엔테그리스, 아이엔씨. 질화 티타늄의 선택적인 에칭을 위한 조성물 및 방법
JP7136894B2 (ja) * 2018-06-26 2022-09-13 旭化成株式会社 感光性樹脂組成物、硬化レリーフパターンの製造方法、及び半導体装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010004633A1 (en) * 1999-11-16 2001-06-21 Esc, Inc. Post chemical-mechanical planarization (CMP) cleaning composition

Also Published As

Publication number Publication date
KR20230061402A (ko) 2023-05-08
KR102902784B1 (ko) 2025-12-19
CN116018397A (zh) 2023-04-25
CN121736843A (zh) 2026-03-27
WO2022050386A1 (ja) 2022-03-10
TW202214831A (zh) 2022-04-16
JP7739305B2 (ja) 2025-09-16
JPWO2022050386A1 (https=) 2022-03-10

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