JP2023172703A5 - - Google Patents

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Publication number
JP2023172703A5
JP2023172703A5 JP2022084683A JP2022084683A JP2023172703A5 JP 2023172703 A5 JP2023172703 A5 JP 2023172703A5 JP 2022084683 A JP2022084683 A JP 2022084683A JP 2022084683 A JP2022084683 A JP 2022084683A JP 2023172703 A5 JP2023172703 A5 JP 2023172703A5
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JP
Japan
Prior art keywords
component
cleaning
mass
less
cleaning method
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Pending
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JP2022084683A
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English (en)
Japanese (ja)
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JP2023172703A (ja
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Priority to JP2022084683A priority Critical patent/JP2023172703A/ja
Priority claimed from JP2022084683A external-priority patent/JP2023172703A/ja
Publication of JP2023172703A publication Critical patent/JP2023172703A/ja
Publication of JP2023172703A5 publication Critical patent/JP2023172703A5/ja
Pending legal-status Critical Current

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JP2022084683A 2022-05-24 2022-05-24 洗浄方法 Pending JP2023172703A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2022084683A JP2023172703A (ja) 2022-05-24 2022-05-24 洗浄方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2022084683A JP2023172703A (ja) 2022-05-24 2022-05-24 洗浄方法

Publications (2)

Publication Number Publication Date
JP2023172703A JP2023172703A (ja) 2023-12-06
JP2023172703A5 true JP2023172703A5 (https=) 2025-03-04

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ID=89029277

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022084683A Pending JP2023172703A (ja) 2022-05-24 2022-05-24 洗浄方法

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JP (1) JP2023172703A (https=)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0578507B1 (en) * 1992-07-09 2005-09-28 Ekc Technology, Inc. Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
JP2007165416A (ja) * 2005-12-09 2007-06-28 Fujifilm Corp 回路基板の製造方法及び回路基板
KR101286777B1 (ko) * 2007-10-17 2013-07-17 헨켈 코포레이션 박리액 조성물, 그것을 이용한 수지층의 박리 방법
US8357646B2 (en) * 2008-03-07 2013-01-22 Air Products And Chemicals, Inc. Stripper for dry film removal
CN102411269A (zh) * 2011-11-18 2012-04-11 西安东旺精细化学有限公司 光致抗蚀剂膜的剥离液组合物
JP2014157339A (ja) * 2013-02-18 2014-08-28 Lion Corp レジスト剥離剤組成物

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