JP2023172703A - 洗浄方法 - Google Patents

洗浄方法 Download PDF

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Publication number
JP2023172703A
JP2023172703A JP2022084683A JP2022084683A JP2023172703A JP 2023172703 A JP2023172703 A JP 2023172703A JP 2022084683 A JP2022084683 A JP 2022084683A JP 2022084683 A JP2022084683 A JP 2022084683A JP 2023172703 A JP2023172703 A JP 2023172703A
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JP
Japan
Prior art keywords
component
mass
less
cleaning
resin mask
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Pending
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JP2022084683A
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Japanese (ja)
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JP2023172703A5 (https=
Inventor
晃平 山田
Kohei Yamada
勲 西
Isao Nishi
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Kao Corp
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Kao Corp
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Priority to JP2022084683A priority Critical patent/JP2023172703A/ja
Publication of JP2023172703A publication Critical patent/JP2023172703A/ja
Publication of JP2023172703A5 publication Critical patent/JP2023172703A5/ja
Pending legal-status Critical Current

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JP2022084683A 2022-05-24 2022-05-24 洗浄方法 Pending JP2023172703A (ja)

Priority Applications (1)

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JP2022084683A JP2023172703A (ja) 2022-05-24 2022-05-24 洗浄方法

Applications Claiming Priority (1)

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JP2022084683A JP2023172703A (ja) 2022-05-24 2022-05-24 洗浄方法

Publications (2)

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JP2023172703A true JP2023172703A (ja) 2023-12-06
JP2023172703A5 JP2023172703A5 (https=) 2025-03-04

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ID=89029277

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JP2022084683A Pending JP2023172703A (ja) 2022-05-24 2022-05-24 洗浄方法

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JP (1) JP2023172703A (https=)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06266119A (ja) * 1992-07-09 1994-09-22 Ekc Technol Inc 還元及び酸化電位を有する求核アミン化合物を含む洗浄剤
JP2007165416A (ja) * 2005-12-09 2007-06-28 Fujifilm Corp 回路基板の製造方法及び回路基板
WO2009051237A1 (ja) * 2007-10-17 2009-04-23 Henkel Corporation 剥離液組成物、それを用いた樹脂層の剥離方法
JP2009217267A (ja) * 2008-03-07 2009-09-24 Air Products & Chemicals Inc 乾燥膜の除去のための剥離剤
CN102411269A (zh) * 2011-11-18 2012-04-11 西安东旺精细化学有限公司 光致抗蚀剂膜的剥离液组合物
JP2014157339A (ja) * 2013-02-18 2014-08-28 Lion Corp レジスト剥離剤組成物

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06266119A (ja) * 1992-07-09 1994-09-22 Ekc Technol Inc 還元及び酸化電位を有する求核アミン化合物を含む洗浄剤
JP2007165416A (ja) * 2005-12-09 2007-06-28 Fujifilm Corp 回路基板の製造方法及び回路基板
WO2009051237A1 (ja) * 2007-10-17 2009-04-23 Henkel Corporation 剥離液組成物、それを用いた樹脂層の剥離方法
JP2009217267A (ja) * 2008-03-07 2009-09-24 Air Products & Chemicals Inc 乾燥膜の除去のための剥離剤
CN102411269A (zh) * 2011-11-18 2012-04-11 西安东旺精细化学有限公司 光致抗蚀剂膜的剥离液组合物
JP2014157339A (ja) * 2013-02-18 2014-08-28 Lion Corp レジスト剥離剤組成物

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