JPWO2022043811A5 - - Google Patents
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- Publication number
- JPWO2022043811A5 JPWO2022043811A5 JP2022544876A JP2022544876A JPWO2022043811A5 JP WO2022043811 A5 JPWO2022043811 A5 JP WO2022043811A5 JP 2022544876 A JP2022544876 A JP 2022544876A JP 2022544876 A JP2022544876 A JP 2022544876A JP WO2022043811 A5 JPWO2022043811 A5 JP WO2022043811A5
- Authority
- JP
- Japan
- Prior art keywords
- insulator
- heat treatment
- depositing
- oxide
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2025197886A JP2026020276A (ja) | 2020-08-27 | 2025-11-19 | 半導体装置の作製方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020143897 | 2020-08-27 | ||
| JP2020143897 | 2020-08-27 | ||
| PCT/IB2021/057429 WO2022043811A1 (ja) | 2020-08-27 | 2021-08-12 | 半導体装置の作製方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025197886A Division JP2026020276A (ja) | 2020-08-27 | 2025-11-19 | 半導体装置の作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2022043811A1 JPWO2022043811A1 (https=) | 2022-03-03 |
| JPWO2022043811A5 true JPWO2022043811A5 (https=) | 2024-08-14 |
| JP7778703B2 JP7778703B2 (ja) | 2025-12-02 |
Family
ID=80354725
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022544876A Active JP7778703B2 (ja) | 2020-08-27 | 2021-08-12 | 半導体装置の作製方法 |
| JP2025197886A Pending JP2026020276A (ja) | 2020-08-27 | 2025-11-19 | 半導体装置の作製方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025197886A Pending JP2026020276A (ja) | 2020-08-27 | 2025-11-19 | 半導体装置の作製方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20240063028A1 (https=) |
| JP (2) | JP7778703B2 (https=) |
| KR (1) | KR20230056695A (https=) |
| CN (1) | CN115968502A (https=) |
| WO (1) | WO2022043811A1 (https=) |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101470811B1 (ko) * | 2009-09-16 | 2014-12-09 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 |
| KR101870119B1 (ko) | 2009-12-25 | 2018-06-25 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 |
| CN107947763B (zh) | 2010-08-06 | 2021-12-28 | 株式会社半导体能源研究所 | 半导体集成电路 |
| US9461126B2 (en) * | 2013-09-13 | 2016-10-04 | Semiconductor Energy Laboratory Co., Ltd. | Transistor, clocked inverter circuit, sequential circuit, and semiconductor device including sequential circuit |
| JP6985812B2 (ja) * | 2016-05-04 | 2021-12-22 | 株式会社半導体エネルギー研究所 | トランジスタの作製方法 |
| US11610997B2 (en) * | 2017-11-24 | 2023-03-21 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor material and semiconductor device having a metal element and nitrogen |
| JP7344869B2 (ja) * | 2018-06-29 | 2023-09-14 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
-
2021
- 2021-08-12 CN CN202180050368.7A patent/CN115968502A/zh active Pending
- 2021-08-12 KR KR1020237007853A patent/KR20230056695A/ko active Pending
- 2021-08-12 WO PCT/IB2021/057429 patent/WO2022043811A1/ja not_active Ceased
- 2021-08-12 JP JP2022544876A patent/JP7778703B2/ja active Active
- 2021-08-12 US US18/022,625 patent/US20240063028A1/en active Pending
-
2025
- 2025-11-19 JP JP2025197886A patent/JP2026020276A/ja active Pending
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