JPWO2022014396A1 - - Google Patents

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Publication number
JPWO2022014396A1
JPWO2022014396A1 JP2022517272A JP2022517272A JPWO2022014396A1 JP WO2022014396 A1 JPWO2022014396 A1 JP WO2022014396A1 JP 2022517272 A JP2022517272 A JP 2022517272A JP 2022517272 A JP2022517272 A JP 2022517272A JP WO2022014396 A1 JPWO2022014396 A1 JP WO2022014396A1
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JP
Japan
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JP2022517272A
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JP7096956B2 (ja
JPWO2022014396A5 (ja
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Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D277/00Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
    • C07D277/02Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings
    • C07D277/20Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D277/32Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D277/56Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C227/00Preparation of compounds containing amino and carboxyl groups bound to the same carbon skeleton
    • C07C227/38Separation; Purification; Stabilisation; Use of additives
    • C07C227/40Separation; Purification
    • C07C227/42Crystallisation
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C51/00Preparation of carboxylic acids or their salts, halides or anhydrides
    • C07C51/42Separation; Purification; Stabilisation; Use of additives
    • C07C51/43Separation; Purification; Stabilisation; Use of additives by change of the physical state, e.g. crystallisation
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D223/00Heterocyclic compounds containing seven-membered rings having one nitrogen atom as the only ring hetero atom
    • C07D223/14Heterocyclic compounds containing seven-membered rings having one nitrogen atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D223/18Dibenzazepines; Hydrogenated dibenzazepines
    • C07D223/22Dibenz [b, f] azepines; Hydrogenated dibenz [b, f] azepines
    • C07D223/24Dibenz [b, f] azepines; Hydrogenated dibenz [b, f] azepines with hydrocarbon radicals, substituted by nitrogen atoms, attached to the ring nitrogen atom
    • C07D223/26Dibenz [b, f] azepines; Hydrogenated dibenz [b, f] azepines with hydrocarbon radicals, substituted by nitrogen atoms, attached to the ring nitrogen atom having a double bond between positions 10 and 11
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/54Organic compounds
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B7/00Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions
    • C30B7/02Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions by evaporation of the solvent
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B7/00Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions
    • C30B7/02Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions by evaporation of the solvent
    • C30B7/06Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions by evaporation of the solvent using non-aqueous solvents
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D9/00Crystallisation
    • B01D9/0018Evaporation of components of the mixture to be separated
    • B01D9/0031Evaporation of components of the mixture to be separated by heating
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07BGENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
    • C07B2200/00Indexing scheme relating to specific properties of organic compounds
    • C07B2200/13Crystalline forms, e.g. polymorphs
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00Systems containing only non-condensed rings
    • C07C2601/06Systems containing only non-condensed rings with a five-membered ring
    • C07C2601/08Systems containing only non-condensed rings with a five-membered ring the ring being saturated
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D277/00Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
    • C07D277/02Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings
    • C07D277/20Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D277/22Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
    • C07D277/30Radicals substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP2022517272A 2020-07-13 2021-07-06 精製方法 Active JP7096956B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020027266 2020-07-13
JPPCT/JP2020/027266 2020-07-13
PCT/JP2021/025389 WO2022014396A1 (ja) 2020-07-13 2021-07-06 精製方法

Publications (3)

Publication Number Publication Date
JPWO2022014396A1 true JPWO2022014396A1 (ja) 2022-01-20
JPWO2022014396A5 JPWO2022014396A5 (ja) 2022-06-27
JP7096956B2 JP7096956B2 (ja) 2022-07-06

Family

ID=79555315

Family Applications (4)

Application Number Title Priority Date Filing Date
JP2022517272A Active JP7096956B2 (ja) 2020-07-13 2021-07-06 精製方法
JP2022517273A Active JP7096957B2 (ja) 2020-07-13 2021-07-06 精製方法
JP2022517274A Active JP7096958B2 (ja) 2020-07-13 2021-07-06 精製方法
JP2022098548A Pending JP2022125073A (ja) 2020-07-13 2022-06-20 精製方法

Family Applications After (3)

Application Number Title Priority Date Filing Date
JP2022517273A Active JP7096957B2 (ja) 2020-07-13 2021-07-06 精製方法
JP2022517274A Active JP7096958B2 (ja) 2020-07-13 2021-07-06 精製方法
JP2022098548A Pending JP2022125073A (ja) 2020-07-13 2022-06-20 精製方法

Country Status (5)

Country Link
US (3) US20230150957A1 (ja)
EP (3) EP4180105A1 (ja)
JP (4) JP7096956B2 (ja)
CN (3) CN115315299B (ja)
WO (3) WO2022014397A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102485717B1 (ko) * 2017-09-01 2023-01-09 삼성전자주식회사 공기조화기

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003319800A (ja) * 2002-05-07 2003-11-11 Itochu Seito Kk 砂糖の製造方法
JP2005524595A (ja) * 2002-03-21 2005-08-18 バークシャー ラボラトリーズ,インコーポレイティド 物質及びシステムにおける結晶成長、結晶化、構造及び相をコントロールする方法
JP2009510163A (ja) * 2005-10-03 2009-03-12 マリンクロッド・インコーポレイテッド ヘミ酒石酸および酒石酸ゾルピデム多形の製造方法
JP2012529537A (ja) * 2009-06-10 2012-11-22 テバ ファーマシューティカル インダストリーズ リミティド フェブキソスタットの結晶形
WO2015053297A1 (ja) * 2013-10-08 2015-04-16 Meiji Seikaファルマ株式会社 ジアザビシクロオクタン誘導体の結晶とその製造法
JP2017512781A (ja) * 2014-03-19 2017-05-25 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se 溶液から物質を分離するための方法及びデバイス
WO2018034305A1 (ja) * 2016-08-19 2018-02-22 日本碍子株式会社 有機化合物の精製方法

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58181858A (ja) 1982-04-19 1983-10-24 Taiyo Sanso Kk ステンレス鋼の鍍金前処理法
GB2122602B (en) * 1982-06-07 1985-06-05 Hisamitsu Pharmaceutical Co Novel 2 3-dihydro-indene derivatives
JPH0744154B2 (ja) * 1987-12-16 1995-05-15 株式会社豊田中央研究所 光照射型低温mocvd方法および装置
JP3805533B2 (ja) * 1998-07-21 2006-08-02 東京瓦斯株式会社 同位体分離方法
AU3469800A (en) * 1999-07-06 2001-01-22 Bruce A. Garetz Method for using laser light to control crystal form
RU2160795C1 (ru) * 1999-07-07 2000-12-20 Уральский государственный технический университет Способ получения высокочистых веществ
JP2001247526A (ja) * 2000-03-06 2001-09-11 Toyobo Co Ltd 近赤外線吸収化合組成物および近赤外線吸収フィルター
EP1172646A1 (en) 2000-07-13 2002-01-16 Universiteit Leiden Screening crystallisation conditions of organic compounds
JP2004226277A (ja) * 2003-01-23 2004-08-12 Bios Ikagaku Kenkyusho:Kk 生体物質および化学物質の光学的測定方法および光学的測定装置
JP4099762B2 (ja) * 2003-03-10 2008-06-11 株式会社石井鐵工所 酒石酸塩の析出分離方法及びその方法を用いて得られた赤外線照射飲料
CN100417750C (zh) * 2006-05-23 2008-09-10 青岛大学 溶液法晶体快速生长装置
EP1887004A1 (en) * 2006-08-07 2008-02-13 Palau Pharma, S.A. Crystalline forms of (1R,2R)-7-Chloro-3-[2-(2,4-difluorophenyl)-2-hydroxy-1-methyl-3-(1H-1,2,4-triazol-1-yl)propyl]quinazolin-4(3H)-one
WO2008080821A1 (en) * 2006-12-28 2008-07-10 F. Hoffmann-La Roche Ag Crystalline forms glyt1
JP2013535438A (ja) * 2010-07-12 2013-09-12 ユン シン ファーマシューティカル インダストリアル カンパニー,リミティド トラマドールのジクロフェナク塩
CN102267957B (zh) * 2011-08-24 2013-04-24 山东齐都药业有限公司 非布司他a晶型的制备方法
JP2014189462A (ja) 2013-03-27 2014-10-06 Osaka Univ 結晶製造方法、準安定形結晶、医薬の製造方法および医薬
JP2014214299A (ja) * 2013-04-30 2014-11-17 旭硝子株式会社 近赤外線吸収粒子、その製造方法、分散液およびその物品
JP2017061582A (ja) * 2014-02-07 2017-03-30 国立研究開発法人産業技術総合研究所 蛍光体微粒子の製造方法、蛍光体薄膜、波長変換膜、波長変換デバイス及び太陽電池
JPWO2016133170A1 (ja) * 2015-02-20 2017-12-07 株式会社クラレ イオン交換膜
US20160289173A1 (en) * 2015-04-02 2016-10-06 Massachusetts Institute Of Technology Devices and methods for crystallizing a compound
GB2548342B (en) * 2016-03-10 2021-04-07 Rotam Agrochem Int Co Ltd A novel form of amicarbazone, a process for its preparation and use of the same
CN107216339B (zh) * 2016-03-22 2021-05-04 中国科学院上海药物研究所 一种dppiv抑制剂马来酸盐的多晶型及其制备方法
CN105753733B (zh) * 2016-04-15 2019-06-18 苏州晶云药物科技股份有限公司 Ahu377的晶型及其制备方法与用途
KR20200026871A (ko) * 2017-07-05 2020-03-11 엔지케이 인슐레이터 엘티디 적외선 처리 장치

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005524595A (ja) * 2002-03-21 2005-08-18 バークシャー ラボラトリーズ,インコーポレイティド 物質及びシステムにおける結晶成長、結晶化、構造及び相をコントロールする方法
JP2003319800A (ja) * 2002-05-07 2003-11-11 Itochu Seito Kk 砂糖の製造方法
JP2009510163A (ja) * 2005-10-03 2009-03-12 マリンクロッド・インコーポレイテッド ヘミ酒石酸および酒石酸ゾルピデム多形の製造方法
JP2012529537A (ja) * 2009-06-10 2012-11-22 テバ ファーマシューティカル インダストリーズ リミティド フェブキソスタットの結晶形
WO2015053297A1 (ja) * 2013-10-08 2015-04-16 Meiji Seikaファルマ株式会社 ジアザビシクロオクタン誘導体の結晶とその製造法
JP2017512781A (ja) * 2014-03-19 2017-05-25 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se 溶液から物質を分離するための方法及びデバイス
WO2018034305A1 (ja) * 2016-08-19 2018-02-22 日本碍子株式会社 有機化合物の精製方法

Also Published As

Publication number Publication date
CN115315297A (zh) 2022-11-08
EP4180105A1 (en) 2023-05-17
EP4180106A1 (en) 2023-05-17
US20230150957A1 (en) 2023-05-18
CN115315299B (zh) 2024-06-04
CN115315299A (zh) 2022-11-08
CN115315297B (zh) 2024-06-04
US20230167577A1 (en) 2023-06-01
WO2022014396A1 (ja) 2022-01-20
US20230150958A1 (en) 2023-05-18
JP2022125073A (ja) 2022-08-26
WO2022014397A1 (ja) 2022-01-20
JP7096956B2 (ja) 2022-07-06
CN115315298A (zh) 2022-11-08
JP7096957B2 (ja) 2022-07-06
WO2022014395A1 (ja) 2022-01-20
CN115315298B (zh) 2023-09-15
JPWO2022014395A1 (ja) 2022-01-20
JPWO2022014397A1 (ja) 2022-01-20
EP4180104A1 (en) 2023-05-17
JP7096958B2 (ja) 2022-07-06

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