JPWO2022004350A1 - - Google Patents

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Publication number
JPWO2022004350A1
JPWO2022004350A1 JP2022533813A JP2022533813A JPWO2022004350A1 JP WO2022004350 A1 JPWO2022004350 A1 JP WO2022004350A1 JP 2022533813 A JP2022533813 A JP 2022533813A JP 2022533813 A JP2022533813 A JP 2022533813A JP WO2022004350 A1 JPWO2022004350 A1 JP WO2022004350A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022533813A
Other languages
Japanese (ja)
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JPWO2022004350A5 (https=
JP7618677B2 (ja
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Publication of JPWO2022004350A1 publication Critical patent/JPWO2022004350A1/ja
Publication of JPWO2022004350A5 publication Critical patent/JPWO2022004350A5/ja
Application granted granted Critical
Publication of JP7618677B2 publication Critical patent/JP7618677B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/80—Etching

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2022533813A 2020-06-30 2021-06-15 マスクブランク、位相シフトマスク、位相シフトマスクの製造方法及び半導体デバイスの製造方法 Active JP7618677B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020112702 2020-06-30
JP2020112702 2020-06-30
PCT/JP2021/022631 WO2022004350A1 (ja) 2020-06-30 2021-06-15 マスクブランク、位相シフトマスク、位相シフトマスクの製造方法及び半導体デバイスの製造方法

Publications (3)

Publication Number Publication Date
JPWO2022004350A1 true JPWO2022004350A1 (https=) 2022-01-06
JPWO2022004350A5 JPWO2022004350A5 (https=) 2023-03-15
JP7618677B2 JP7618677B2 (ja) 2025-01-21

Family

ID=79315296

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022533813A Active JP7618677B2 (ja) 2020-06-30 2021-06-15 マスクブランク、位相シフトマスク、位相シフトマスクの製造方法及び半導体デバイスの製造方法

Country Status (6)

Country Link
US (1) US20230194973A1 (https=)
JP (1) JP7618677B2 (https=)
KR (1) KR20230029606A (https=)
CN (1) CN115769144B (https=)
TW (1) TWI902828B (https=)
WO (1) WO2022004350A1 (https=)

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06123961A (ja) 1992-10-12 1994-05-06 Hoya Corp 位相シフトマスク及び位相シフトマスクブランク並びに位相シフトマスクの製造方法
JP2003255513A (ja) * 2002-03-05 2003-09-10 Toppan Printing Co Ltd ハーフトーン型位相シフトマスクおよびブランク並びにパターン転写方法
JP2004085760A (ja) * 2002-08-26 2004-03-18 Toppan Printing Co Ltd ハーフトーン型位相シフトマスク用ブランク及びそれを用いたハーフトーン型位相シフトマスク、並びにパターン転写法
TWI480675B (zh) * 2004-03-31 2015-04-11 Shinetsu Chemical Co 半色調相移空白光罩，半色調相移光罩，以及圖案轉移方法
JP5165833B2 (ja) * 2005-02-04 2013-03-21 信越化学工業株式会社 フォトマスクブランク、フォトマスク、およびフォトマスクブランクの製造方法
JP2007279441A (ja) 2006-04-07 2007-10-25 Toshiba Corp ハーフトーン型位相シフトマスク及びその製造方法
JP2008310091A (ja) * 2007-06-15 2008-12-25 Shin Etsu Chem Co Ltd ハーフトーン型位相シフトマスク
JP6430155B2 (ja) * 2014-06-19 2018-11-28 Hoya株式会社 マスクブランク、位相シフトマスク、位相シフトマスクの製造方法および半導体デバイスの製造方法
JP6502143B2 (ja) * 2015-03-27 2019-04-17 Hoya株式会社 マスクブランク、位相シフトマスク、位相シフトマスクの製造方法および半導体デバイスの製造方法
US10481485B2 (en) * 2015-05-15 2019-11-19 Hoya Corporation Mask blank, transfer mask, method of manufacturing transfer mask and method of manufacturing semiconductor device
WO2018181891A1 (ja) * 2017-03-31 2018-10-04 凸版印刷株式会社 位相シフトマスクブランク、位相シフトマスク及び位相シフトマスクの製造方法
JP6505891B2 (ja) * 2018-03-02 2019-04-24 Hoya株式会社 マスクブランク、位相シフトマスクおよびこれらの製造方法
JP6938428B2 (ja) * 2018-05-30 2021-09-22 Hoya株式会社 マスクブランク、位相シフトマスクおよび半導体デバイスの製造方法
JP7109996B2 (ja) * 2018-05-30 2022-08-01 Hoya株式会社 マスクブランク、位相シフトマスクおよび半導体デバイスの製造方法
JP7179543B2 (ja) * 2018-09-12 2022-11-29 Hoya株式会社 マスクブランク、転写用マスクおよび半導体デバイスの製造方法

Also Published As

Publication number Publication date
TWI902828B (zh) 2025-11-01
JP7618677B2 (ja) 2025-01-21
US20230194973A1 (en) 2023-06-22
CN115769144A (zh) 2023-03-07
CN115769144B (zh) 2025-08-05
WO2022004350A1 (ja) 2022-01-06
KR20230029606A (ko) 2023-03-03
TW202217433A (zh) 2022-05-01

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