JPWO2021210052A5 - - Google Patents

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Publication number
JPWO2021210052A5
JPWO2021210052A5 JP2022514887A JP2022514887A JPWO2021210052A5 JP WO2021210052 A5 JPWO2021210052 A5 JP WO2021210052A5 JP 2022514887 A JP2022514887 A JP 2022514887A JP 2022514887 A JP2022514887 A JP 2022514887A JP WO2021210052 A5 JPWO2021210052 A5 JP WO2021210052A5
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JP
Japan
Prior art keywords
light
measuring device
measured
diffracted light
diffracted
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JP2022514887A
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English (en)
Japanese (ja)
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JP7468630B2 (ja
JPWO2021210052A1 (https=
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Priority claimed from PCT/JP2020/016332 external-priority patent/WO2021210052A1/ja
Publication of JPWO2021210052A1 publication Critical patent/JPWO2021210052A1/ja
Publication of JPWO2021210052A5 publication Critical patent/JPWO2021210052A5/ja
Priority to JP2024059315A priority Critical patent/JP2024095727A/ja
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Publication of JP7468630B2 publication Critical patent/JP7468630B2/ja
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JP2022514887A 2020-04-13 2020-04-13 計測装置、露光装置、および計測方法 Active JP7468630B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2024059315A JP2024095727A (ja) 2020-04-13 2024-04-02 光源装置、計測装置、露光装置、および計測方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2020/016332 WO2021210052A1 (ja) 2020-04-13 2020-04-13 計測装置、露光装置、および計測方法

Related Child Applications (1)

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JP2024059315A Division JP2024095727A (ja) 2020-04-13 2024-04-02 光源装置、計測装置、露光装置、および計測方法

Publications (3)

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JPWO2021210052A1 JPWO2021210052A1 (https=) 2021-10-21
JPWO2021210052A5 true JPWO2021210052A5 (https=) 2023-03-20
JP7468630B2 JP7468630B2 (ja) 2024-04-16

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ID=78084740

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JP2022514887A Active JP7468630B2 (ja) 2020-04-13 2020-04-13 計測装置、露光装置、および計測方法
JP2024059315A Ceased JP2024095727A (ja) 2020-04-13 2024-04-02 光源装置、計測装置、露光装置、および計測方法

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JP2024059315A Ceased JP2024095727A (ja) 2020-04-13 2024-04-02 光源装置、計測装置、露光装置、および計測方法

Country Status (7)

Country Link
US (1) US12345517B2 (https=)
EP (1) EP4137776A4 (https=)
JP (2) JP7468630B2 (https=)
KR (1) KR20220166806A (https=)
CN (1) CN115443399A (https=)
TW (1) TWI890772B (https=)
WO (1) WO2021210052A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7153942B2 (ja) * 2020-08-17 2022-10-17 ラトナ株式会社 情報処理装置、方法、コンピュータプログラム、及び、記録媒体
CN117836722A (zh) * 2021-08-20 2024-04-05 Asml荷兰有限公司 用于不均匀表面的补偿光学系统、量测系统、光刻设备及其方法
WO2023214197A1 (zh) * 2022-05-02 2023-11-09 刘正锋 应用光学新理论提升光学仪器分辨能力的方法及装置

Family Cites Families (22)

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Publication number Priority date Publication date Assignee Title
JPH0638390B2 (ja) * 1986-04-09 1994-05-18 株式会社日立製作所 投影式露光装置
JP2512873B2 (ja) * 1987-07-22 1996-07-03 株式会社ニコン 光束安定装置
JP3158544B2 (ja) * 1991-09-17 2001-04-23 株式会社ニコン 走査型位置検出装置
JP3216240B2 (ja) * 1992-06-04 2001-10-09 キヤノン株式会社 位置合わせ方法及びそれを用いた投影露光装置
US5706091A (en) * 1995-04-28 1998-01-06 Nikon Corporation Apparatus for detecting a mark pattern on a substrate
JPH0934134A (ja) * 1995-07-19 1997-02-07 Nikon Corp アライメント装置
JP3273409B2 (ja) * 1997-10-28 2002-04-08 キヤノン株式会社 投影露光装置
JP3368266B2 (ja) * 2001-04-02 2003-01-20 キヤノン株式会社 投影露光装置
DE10315086B4 (de) * 2003-04-02 2006-08-24 Infineon Technologies Ag Verfahren und Vorrichtung zum Ausrichten von Halbleiterwafern bei der Halbleiterherstellung
US6886937B2 (en) * 2003-06-20 2005-05-03 Vision - Ease Lens, Inc. Ophthalmic lens with graded interference coating
JP2005166785A (ja) * 2003-12-01 2005-06-23 Canon Inc 位置検出装置及び方法、並びに、露光装置
CN100463108C (zh) * 2004-04-23 2009-02-18 尼康股份有限公司 测量方法、测量装置、曝光方法及曝光装置
WO2014019846A2 (en) * 2012-07-30 2014-02-06 Asml Netherlands B.V. Position measuring apparatus, position measuring method, lithographic apparatus and device manufacturing method
EP2982949B1 (en) * 2012-10-05 2020-04-15 National University Corporation Kagawa University Spectroscopic measurement device
KR101855243B1 (ko) * 2013-08-07 2018-05-04 에이에스엠엘 네델란즈 비.브이. 메트롤로지 방법 및 장치, 리소그래피 시스템 및 디바이스 제조 방법
JP6426984B2 (ja) * 2014-11-18 2018-11-21 キヤノン株式会社 リソグラフィ装置および物品製造方法
JP6459082B2 (ja) * 2014-12-24 2019-01-30 株式会社ニコン 計測装置及び計測方法、露光装置及び露光方法、並びにデバイス製造方法
JP2017102265A (ja) 2015-12-01 2017-06-08 キヤノン株式会社 走査型顕微鏡
KR102106937B1 (ko) * 2016-02-19 2020-05-07 에이에스엠엘 네델란즈 비.브이. 구조체 측정 방법, 검사 장치, 리소그래피 시스템, 디바이스 제조 방법 및 그 안에 사용되는 파장-선택 필터
JP7152877B2 (ja) * 2017-06-15 2022-10-13 キヤノン株式会社 検出装置、リソグラフィー装置および物品製造方法
EP3470926A1 (en) * 2017-10-16 2019-04-17 ASML Netherlands B.V. Metrology apparatus, lithographic system, and method of measuring a structure
WO2019129468A1 (en) 2017-12-29 2019-07-04 Asml Netherlands B.V. Method of processing data, method of obtaining calibration data

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